Cited by 55Silicon Carbide Semiconductor TechnologiesSilicon and Solar Cell TechnologiesGaN-based semiconductor devices and materials

The DOI matches its Crossref record; 8 of the 8 references it cites were found in a registry or an index.

Analysis of Degradation Phenomena in Bipolar Degradation Screening Process for SiC-MOSFETs

Ishigaki, Takashi, Murata, Tatsunori, Kinoshita, Koyo, Morikawa, Takahiro, Oda, Tetsuo, Fujita, Ryuusei, Konishi, Kumiko, Mori, Yuki, Shima, Akio·2019·2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)

Abstract

We have developed a 3.3 kV ultra-high power density SiC power module, which was realized by fulfilment with only SiC-MOSFETs. As a countermeasure for bipolar degradation issues related to body diodes in the MOSFET structure, a high throughput screening process has been introduced. In the screening process, over 10000 chips of 3.3 kV SiC-MOSFET were evaluated. The large amount of data firstly reveals the probability distribution of the degradation phenomena and enables us to study the relationship with defect densities of the state-of-the-art SiC wafers. Furthermore, origins of the degradation were investigated by teardown analysis. The degradation is caused by the expansion or generation of bar-shaped stacking faults. It was identified that their origins are pre-existing bar-shaped stacking faults in a SiC epi-layer, a basal plane dislocation in a SiC substrate, or a closed micropipe.

Overview

Integrity signals

Registry

Crossref · 10.1109/ispsd.2019.8757598

Cites

8 of 8 references verified0 citation errors · 0 not checkable

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This paper’s full text isn’t openly available, so its claims and self-check weren’t run. The registry and citation checks still apply.

Claims other papers make about this one

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  • Third quadrant conduction and forward bias expand the basal plane and create a triangular-shaped stacking fault within the drift region.

    “The third quadrant conduction and forward bias expand the basal plane and create a triangularshaped stacking fault within the drift region [39], [55]-[57].”

Citations

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Research works printed but not linked: 1

  1. terasawa, 2018, Development of Lightweight Traction Systems to Reduce Energy Consumption, Hitachi Review, 67, 38

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Metadata

Authors
Ishigaki, T., Murata, T., Kinoshita, K., Morikawa, T., Oda, T., Fujita, R., Konishi, K., Mori, Y., & Shima, A.
Affiliations
Hitachi (Japan) (JP)
Venue
2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)
Publisher
IEEE
Published
2019-05
Pages
259-262
ISSN
1063-6854 (ISSN-L)
OpenAlex
W2960540394
Cited by
55
References
8
Citations by year
2026: 6 · 2025: 10 · 2024: 7 · 2023: 12 · 2022: 7 · 2021: 5 · 2020: 7 · 2019: 1
FWCI
7.96
Type
conference paper
Language
en
Open access
closed
Locations
IEEE International Symposium on Power Semiconductor Devices and ICs/Proceedings of the International Symposium on Power Semiconductor Devices & ICs/Proceedings of the ... International Symposium on Power Semiconductor Devices & ICs/Proceedings of the ... International Symposium on Power Semiconductor Devices and ICs (publishedVersion)
Topics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon and Solar Cell Technologies
  • Physical Sciences › Physics and Astronomy › Condensed Matter Physics › GaN-based semiconductor devices and materials
Keywords
SiC MOSFET, bipolar degradation, body diode, stacking faults, SiC wafers, basal plane dislocations, SiC power modules

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