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Cited by 1,355

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A reliable approach to charge-pumping measurements in MOS transistors

Groeseneken, G., Maes, H.E., Beltran, N., De Keersmaecker, R.F.·1984·IEEE Transactions on Electron Devices

Abstract

A new and accurate approach to charge-pumping measurements for the determination of the Si-SiO2interface state density directly on MOS transistors is presented. By a careful analysis of the different processes of emission of electrons towards the conduction band and of holes towards the valence band, depending on the charge state of the interface, all the previously ill-understood phenomena can be explained and the deviations from the simple charge-pumping theory can be accounted for. The presence of a geometric component in some transistor configurations is illustrated and the influence of trapping time constants is discussed. Furthermore, based on this insight, a new technique is developed for the determination of the energy distribution of interface states in small-area transistors, without requiring the knowledge of the surface potential dependence on gate voltage.

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Crossref · 10.1109/t-ed.1984.21472

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Metadata

Authors
Groeseneken, G., Maes, H. E., Beltran, N., & De Keersmaecker, R. F.
Venue
IEEE Transactions on Electron Devices
Published
1984-01
Volume
31
Issue
1
Pages
42-53
ISSN
  • 0018-9383 (ISSN-L)
  • 1557-9646
OpenAlex
W2078482863
Cited by
1,355
References
0
FWCI
11.33
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: A reliable approach to charge-pumping measurements in MOS transistors. https://app.cochat.ai/papers/10.1109/t-ed.1984.21472
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Groeseneken, G., Maes, H. E., Beltran, N., & De Keersmaecker, R. F. (1984). A reliable approach to charge-pumping measurements in MOS transistors. IEEE Transactions on Electron Devices. https://doi.org/10.1109/t-ed.1984.21472

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