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Cited by 262

The DOI matches its Crossref record; 17 of the 17 references it cites were found in a registry or an index.

Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects

Zharnikov, M., Grunze, M.·2002·Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

Abstract

This article reviews recent experiments on the modification of thiol-derived self-assembling monolayers (SAMs) by electron and x-ray irradiation. Several complementary experimental techniques such as near-edge x-ray absorption fine structure spectroscopy, x-ray photoelectron spectroscopy and microscopy, and infrared reflection absorption spectroscopy were applied to gain a detailed knowledge on the nature and extent of irradiation-induced damage in these systems. The reaction of a SAM to electron and x-ray irradiation was found to be determined by the interplay of the damage/decomposition and cross-linking processes. Ways to adjust the balance between these two opposing effects by molecular engineering of the SAM constituents are demonstrated. The presented data provide the physical–chemical basis for electron-beam patterning of self-assembled monolayers to extend lithography down to the nanometer scale.

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Metadata

Authors
Zharnikov, M., & Grunze, M.
Venue
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Published
2002-09-01
Volume
20
Issue
5
Pages
1793-1807
ISSN
  • 1071-1023 (ISSN-L)
  • 1520-8567
OpenAlex
W2088253222
Cited by
262
References
17
FWCI
16.83
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects. https://app.cochat.ai/papers/10.1116/1.1514665
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Zharnikov, M., & Grunze, M. (2002). Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena. https://doi.org/10.1116/1.1514665

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