The DOI matches its Crossref record; 17 of the 17 references it cites were found in a registry or an index.
Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects
Abstract
This article reviews recent experiments on the modification of thiol-derived self-assembling monolayers (SAMs) by electron and x-ray irradiation. Several complementary experimental techniques such as near-edge x-ray absorption fine structure spectroscopy, x-ray photoelectron spectroscopy and microscopy, and infrared reflection absorption spectroscopy were applied to gain a detailed knowledge on the nature and extent of irradiation-induced damage in these systems. The reaction of a SAM to electron and x-ray irradiation was found to be determined by the interplay of the damage/decomposition and cross-linking processes. Ways to adjust the balance between these two opposing effects by molecular engineering of the SAM constituents are demonstrated. The presented data provide the physical–chemical basis for electron-beam patterning of self-assembled monolayers to extend lithography down to the nanometer scale.
Overview
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Citations
Cites
Formation and Structure of Self-Assembled Monolayers
Ulman, A. (1996) · Chemical Reviews · doi:10.1021/cr9502357 · Cited by 7,906
Laibinis, P. E., Whitesides, G. M., Allara, D. L., Tao, Y. T., Parikh, A. N., & Nuzzo, R. G. (1991) · Journal of the American Chemical Society · doi:10.1021/ja00019a011 · Cited by 1,974
High Resolution XPS of Organic Polymers
Beamson, G., & Briggs, D. (1992) · Analytica Chimica Acta · Cited by 1,725
Strong, L., & Whitesides, G. M. (1988) · Langmuir · doi:10.1021/la00081a009 · Cited by 714
Carbon 1 s near-edge-absorption fine structure in graphite
Batson, P. E. (1993) · Physical Review B · doi:10.1103/physrevb.48.2608 · Cited by 454
Walczak, M. M., Chung, C., Stole, S. M., Widrig, C. A., & Porter, M. D. (1991) · Journal of the American Chemical Society · doi:10.1021/ja00007a004 · Cited by 383
Maoz, R., Cohen, S., & Sagiv, J. (1999) · Advanced Materials · doi:10.1002/(sici)1521-4095(199901)11:1<55::aid-adma55>3.0.co;2-8 · Cited by 253
Concentration-driven surface transition in the wetting of mixed alkanethiol monolayers on gold
Ulman, A., Evans, S. D., Shnidman, Y., Sharma, R., Eilers, J. E., & Chang, J. C. (1991) · Journal of the American Chemical Society · doi:10.1021/ja00005a004 · Cited by 178
Monolayer Damage in XPS Measurements As Evaluated by Independent Methods
Frydman, E., Cohen, H., Maoz, R., & Sagiv, J. (1997) · Langmuir · doi:10.1021/la962058q · Cited by 171
Zharnikov, M., Frey, S., Heister, K., & Grunze, M. (2000) · Langmuir · doi:10.1021/la991034r · Cited by 167
Self-citation
Cited by
XPS and NEXAFS studies of aliphatic and aromatic amine species on functionalized surfaces
Graf, N., Yegen, E., Gross, T., Lippitz, A., Weigel, W., Krakert, S., Terfort, A., & Unger, W. E. S. (2009) · Surface Science · doi:10.1016/j.susc.2009.07.029 · Cited by 481
Tackling orientation of metal-organic frameworks (MOFs): The quest to enhance MOF performance
Khalil, I. E., Fonseca, J., Reithofer, M. R., Eder, T., & Chin, J. M. (2023) · Coordination Chemistry Reviews · doi:10.1016/j.ccr.2023.215043 · Cited by 396
Chen, J.-K., & Chang, C.-J. (2014) · Materials · doi:10.3390/ma7020805 · Cited by 193
Metadata
- Authors
- Zharnikov, M., & Grunze, M.
- Venue
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Publisher
- American Vacuum Society
- Published
- 2002-09-01
- Volume
- 20
- Issue
- 5
- Pages
- 1793-1807
- ISSN
- 1071-1023 (ISSN-L)
- 1520-8567
- OpenAlex
- W2088253222
- Cited by
- 262
- References
- 17
- FWCI
- 16.83
- Type
- journal article
- Language
- en
- Open access
- closed
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
How to cite
Cite CoChat for the checks on this page, and the paper for its own findings.
- This page
- CoChat. (2026). Citation check: Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects. https://app.cochat.ai/papers/10.1116/1.1514665
- The paper
- Zharnikov, M., & Grunze, M. (2002). Modification of thiol-derived self-assembling monolayers by electron and x-ray irradiation: Scientific and lithographic aspects. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena. https://doi.org/10.1116/1.1514665
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.