The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.
Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)
Abstract
We investigate poly(methylmethacrylate) (PMMA) development processing with cold developers (4–10 °C) for its effect on resolution, resist residue, and pattern quality of sub-10 nm electron beam lithography (EBL). We find that low-temperature development results in higher EBL resolution and improved feature quality. PMMA trenches of 4–8 nm are obtained reproducibly at 30 kV using cold development. Fabrication of single-particle-width Au nanoparticle lines was performed by lift-off. We discuss key factors for formation of PMMA trenches at the sub-10 nm scale.
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Lent, C. S., Tougaw, P. D., Porod, W., & Bernstein, G. H. (1993) · Nanotechnology · doi:10.1088/0957-4484/4/1/004 · Cited by 1,793
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Cited by
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Cheng, J. Y., Ross, C. A., Smith, H. I., & Thomas, E. L. (2006) · Advanced Materials · doi:10.1002/adma.200502651 · Cited by 695
Resolution Limits of Electron-Beam Lithography toward the Atomic Scale
Manfrinato, V. R., Zhang, L., Su, D., Duan, H., Hobbs, R. G., Stach, E. A., & Berggren, K. K. (2013) · Nano Letters · doi:10.1021/nl304715p · Cited by 451
Rahman, F., Carbaugh, D. J., Wright, J. T., Rajan, P., Pandya, S. G., & Kaya, S. (2020) · Microelectronic Engineering · doi:10.1016/j.mee.2020.111238 · Cited by 79
Photolithography with polymethyl methacrylate (PMMA)
Carbaugh, D. J., Wright, J. T., Parthiban, R., & Rahman, F. (2016) · Semiconductor Science and Technology · doi:10.1088/0268-1242/31/2/025010 · Cited by 43
Metadata
- Authors
- Hu, W. (., Sarveswaran, K., Lieberman, M., & Bernstein, G. H.
- Venue
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Publisher
- American Vacuum Society
- Published
- 2004-06-30
- Volume
- 22
- Issue
- 4
- Pages
- 1711-1716
- ISSN
- 1071-1023 (ISSN-L)
- 1520-8567
- OpenAlex
- W1974207245
- Cited by
- 242
- References
- 1
- FWCI
- 6.87
- Type
- journal article
- Language
- en
- Open access
- closed
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- Hu, W. (., Sarveswaran, K., Lieberman, M., & Bernstein, G. H. (2004). Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate). Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena. https://doi.org/10.1116/1.1763897
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Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
