Photolithographic synthesis of high-density DNA probe arrays: Challenges and opportunities
Abstract
The continual need for increased manufacturing capacity in the production of GeneChip™ DNA probe arrays, and the expanding use of these arrays into new areas of application such as molecular medicine, has stimulated the development of new chemistries and production methods with higher efficiency and resolution. For current production methods based on contact photolithography, modifications in substrate materials and photoactivated synthesis reagents have provided significant improvements in array performance and information content (≥4×106 sequences∕cm2). An alternative next-generation manufacturing process is also in development, which utilizes photoacid generating polymer films, and automated projection lithography systems. This process has the ability to fabricate arrays with 1 micron feature pitch and smaller, providing an unprecedented sequence density of 108∕cm2 and greater.
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Photomask arrays have proven to generate high oligonucleotide densities but rely on a series of bespoke photolithographic masks for each set of desired sequences.
“To this end, photomask arrays have proven to generate high oligonucleotide densities;34 however, this technique relies on a series of bespoke photolithographic masks to synthesize a defined set of sequences, that is, masks must be created for each set of desired sequences.”
From Emerging Approaches to DNA Data Storage: Challenges and Prospects (2022) · cites this paper as [34]
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Emerging Approaches to DNA Data Storage: Challenges and Prospects
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- Authors
- Pawloski, A. R., McGall, G., Kuimelis, R. G., Barone, D., Cuppoletti, A., Ciccolella, P., Spence, E., Afroz, F., Bury, P., Chen, C., Chen, C., Pao, D., Le, M., McGee, B., Harkins, E., Savage, M., Narasimhan, S., Goldberg, M., Rava, R., & Fodor, S. P. A.
- Affiliations
- Affymetrix (United States) (US)
- Venue
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Publisher
- American Vacuum Society
- Published
- 2007-11-01
- Volume
- 25
- Issue
- 6
- Pages
- 2537-2546
- ISSN
- 1071-1023 (ISSN-L)
- 1520-8567
- OpenAlex
- W1985331764
- Cited by
- 15
- References
- 16
- Citations by year
- 2025: 2 · 2024: 1 · 2023: 1 · 2022: 1 · 2021: 1 · 2016: 1 · 2012: 1
- FWCI
- 1.58
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Life Sciences › Biochemistry, Genetics and Molecular Biology › Molecular Biology › Advanced Biosensing Techniques and Applications
- Life Sciences › Biochemistry, Genetics and Molecular Biology › Molecular Biology › Advanced biosensing and bioanalysis techniques
- Keywords
- photolithography, GeneChip, projection lithography, contact photolithography, substrate materials
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