Thermal conductivity of thin films: Measurements and understanding
Abstract
Several techniques are reviewed with which thermal conductivity and phonon scattering can be measured in films of thicknesses ranging from angstroms to millimeters. Recent experimental results are compared critically with previous measurements. It is shown that phonons are very sensitive probes of the structural perfection of the films.
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The thermal conductivity of a 25 μm-thick film of a-Si:H prepared on an Al substrate was measured using a line 5 μm wide.
“For example, the thermal conductivity of a 25 μm-thick film of a-Si:H prepared on an Al substrate was measured using a line 5 μm wide.8”
From Thermal conductivity measurement from 30 to 750 K: the 3ω method (1990) · cites this paper as [8]
The ability to test the 3ω method at the surface of a bulk sample with a known thermal conductivity adds to the reliability of data on evaporated thin films.
“My ability to test the 3ω method at the surface of a bulk sample with a known thermal conductivity adds to the reliability of data on evaporated thin films. 7,8”
From Thermal conductivity measurement from 30 to 750 K: the 3ω method (1990) · cites this paper as [8]
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Thermal conductivity measurement from 30 to 750 K: the 3ω method
Cahill, D. G. (1990) · Review of Scientific Instruments · doi:10.1063/1.1141498 · Cited by 1,928 · see citing works
Self-citation3 omega method for specific heat and thermal conductivity measurements
Lu, L., Yi, W., & Zhang, D. L. (2002) · arXiv · doi:10.48550/arxiv.quant-ph/0202038 · Cited by 447 · see citing works
Thermal conductance of metal–diamond interfaces at high pressure
Hohensee, G. T., Wilson, R. B., & Cahill, D. G. (2015) · Nature Communications · doi:10.1038/ncomms7578 · Cited by 197 · see citing works
Self-citationExperimental Techniques for Thin-Film Thermal Conductivity Characterization
Borca-Tasciuc, T., & Chen, G. (2006) · Physics of Solids and Liquids · doi:10.1007/0-387-26017-x_9 · Cited by 23 · see citing works
- Authors
- Cahill, D. G., Fischer, H. E., Klitsner, T., Swartz, E. T., & Pohl, R. O.
- Affiliations
- Cornell University (US)
- Venue
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- Publisher
- American Vacuum Society
- Published
- 1989-05-01
- Volume
- 7
- Issue
- 3
- Pages
- 1259-1266
- ISSN
- 0734-2101 (ISSN-L)
- 1520-8559
- OpenAlex
- W1972680534
- Cited by
- 321
- References
- 0
- Citations by year
- 2026: 5 · 2025: 8 · 2024: 8 · 2023: 11 · 2022: 10 · 2021: 17 · 2020: 15 · 2019: 14 · 2018: 19 · 2017: 13 · 2016: 19 · 2015: 20 · 2014: 11 · 2013: 5 · 2012: 11
- FWCI
- 4.21
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (publishedVersion)
- Funders
- Semiconductor Research Corporation
- Topics
- Physical Sciences › Materials Science › Materials Chemistry › Thermal properties of materials
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Surface and Thin Film Phenomena
- Physical Sciences › Engineering › Mechanics of Materials › Metal and Thin Film Mechanics
- Keywords
- thermal conductivity, thin films, phonon scattering, phonons, structural perfection
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