Soft x-ray reduction lithography using multilayer mirrors

Cited by (271)

Items 201–271 of 271

1. Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: V. Optimum beam size
   Takahiro Kozawa · 2016 · Japanese Journal of Applied Physics
2. Thermal stability of Mo-based multilayer x-ray mirrors
   Yoshikazu Ishii, Hisataka Takenaka, Tomoaki Kawamura · 1994 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
3. At-wavelength metrology of 13 nm lithography imaging optics
   Zhengquan Tan, Alastair A. MacDowell, Bruno La Fontaine et al. · 1995 · Review of Scientific Instruments
4. Design and analysis of diffraction mirror optics for EUV projection lithography
   Hiroshi Fukuda, Tsuneo Terasawa · 1995 · Microelectronic Engineering
5. Angular dependency of off-axis illumination on 100-nm-width pattern printability for extreme ultraviolet lithography: Ru/Mo/Si reflector system
   In-Yong Kang, Yong‐Chae Chung, Jinho Ahn · 2004 · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
6. Image Simulation of Extreme Ultraviolet Lithography Optics: Effect of Multilayer Coatings
   Hiromasa Yamanashi, Masaaki Ito · 1996 · Japanese Journal of Applied Physics
7. X-Ray Projection Lithography Using a Fresnel Zone Plate
   Naoe Koyama, Haruo Tsuyuzaki, Kenichi Kuroda · 1995 · Japanese Journal of Applied Physics
8. Developing a Soft X-Ray Projection Lithography Tool
   Richard H. Stulen, Richard R. Freeman · 1991 · AT&T Technical Journal
9. Development of a laboratory extreme-ultraviolet lithography tool
   Sandia National Labs., Livermore, CA (USA), D Tichenor, USDOE, Washington, DC (United States) et al. · 1994
10. Project of X-Ray Optical Scheme of a Lithograph with a Transmissive Dynamic Mask and a Synchrotron Radiation Source
    И. В. Малышев, Н. И. Чхало, S. N. Yakunin · 2024 · Technical Physics
11. Variations in programmed phase defect size and its impact on defect detection signal intensity using at-wavelength inspection system
    Tsuyoshi Amano, Noriaki Takagi, Tsukasa Abe · 2015 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
12. The Influence of H2Plasma Treatment on LWR Mitigation: The Importance of EUV Photoresist Composition
    Peter De Schepper, Ziad El Otell, Alessandro Vaglio Pret · 2015 · Plasma Processes and Polymers
13. Tailoring of interfaces in amorphous silicon–germanium multilayers on the atomic scale by ultra-high gravity
    Yusuke Iguchi, Zoltán Erdélyi, G.A. Langer · 2013 · Philosophical Magazine Letters
14. Resistless patterning of a chlorine monolayer on a Si(0 0 1) surface with an electron beam
    Cheolho Jeon, Han‐Na Hwang, Hyun‐Joon Shin · 2011 · Applied Surface Science
15. EUV LITHOGRAPHY FOR SEMICONDUCTOR MANUFACTURING AND NANOFABRICATION
    Hiroo Kinoshita · 2007 · COSMOS
16. Overview of X-ray lithography at IBM using a compact storage ring
    J.R. Maldonado · 2002 · IEEE Particle Accelerator Conference
17. Evaluation of novel resist materials for EUV lithography
    Ichihiro Aratani, Shuji Matsunaga, Tsuyoshi Kajiyashiki · 2009 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
18. Resist material options for extreme ultraviolet lithography
    Takahiro Kozawa · 2015 · Advanced Optical Technologies
19. Theoretical study on sensitivity enhancement in energy-deficit region of chemically amplified resists used for extreme ultraviolet lithography
    Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani · 2017 · Japanese Journal of Applied Physics
20. Study of electron beam and extreme ultraviolet resist utilizing polarity change and radical crosslinking
    Satoshi Enomoto, Kohei Machida, Takumi Yoshino · 2018
21. The Early Days of R&D on EUV Lithography and Future Expectations
    Tsuneyuki Haga · 2018 · Journal of Photopolymer Science and Technology
22. EUV Lithography
    Stefan Wurm · 2014
23. EUV Lithography and Exposure Tool.
    Katsuhiko Murakami, Shinji Okazaki · 2003 · プラズマ・核融合学会誌
24. Soft X-ray Projection Imaging using 32:1 Schwarzschild Optics
    Hiroshi Nagata, Masayuki Ohtani, Katsuhiko Murakami · 1993
25. Physics of Hot Dense Plasmas
    David T. Attwood, Anne E. Sakdinawat · 2016 · Cambridge University Press eBooks
26. Resist Investigation Method using ab initio MO Calculation on basis of Approximation Molecular Model
    Shohei Nagata, Shota Niihara, Tetsuo Harada · 2017 · Journal of Photopolymer Science and Technology
27. Simulation of Mixing at Mo/Si Interfaces
    David B. Boercker, Wm. Lowell Morgan · 1992
28. Litho/mask strategies for 32-nm half-pitch and beyond: using established and adventurous tools/technologies to improve cost and imaging performance
    Burn J. Lin · 2009 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
29. Silicon microstructure fabricated by laser micro-patterning method combined with wet etching process
    Tetsuo Oishi, Masahiro Goto, Yuriy Pihosh · 2004 · Applied Surface Science
30. Design and analysis of a fast, two-mirror soft-x-ray microscope
    David L. Shealy, C. Wang, W. Jiang · 1992 · NASA Technical Reports Server (NASA)
31. High Resolution Soft-X-Ray Projection Imaging
    O. R. Wood, John E. Bjorkholm, Jeffrey Bokor et al. · 1991
32. Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas
    Sandia National Labs., Albuquerque, NM (United States), G Kubiak, USDOE, Washington, DC (United States) · 1995
33. Extreme Ultraviolet Lithography
    M. Besacier, C. Constancias, Jean Yves Robic · 2013
34. Low Energy Xe+ Ion Beam Machining of the Ultralow Expansion Glass Substrates for Aspherical Extreme Ultraviolet Lithography Projection Optics
    Hironori Endo, Junya Yamada, S.A. Pahlovy · 2011 · Japanese Journal of Applied Physics
35. Effect of Laser Fluence on the Growth of Mo Films Prepared by a Pulsed Laser Deposition Method
    Jie Hong Lei · 2013 · Applied Mechanics and Materials
36. Preface to the Special Issue for Extreme Ultraviolet Lithography Light Source Development
    K. Toyoda · 2004 · The Review of Laser Engineering
37. The Photopolymer Science and Technology Award
    Hiroo Kinoshita · 2014 · Journal of Photopolymer Science and Technology
38. Tungsten/carbon masks in x-ray projection lithography
    Gabriele Messina, Anna Maria Paoletti, Saveria Santangelo · 1994 · Microelectronic Engineering
39. Development of Wide Ion Beam Profile Measurement Method for a Period-by-Period Extreme Ultraviolet Multilayer Milling System
    Aki Tosaka, Yu Sakai, Toshihide Tsuru · 2010 · Japanese Journal of Applied Physics
40. Experiments in projection lithography using soft x-rays
    John E. Bjorkholm, Jeffrey Bokor, Ludwig Eichner et al. · 1991 · Microelectronic Engineering
41. Final Report 1993: Ultra-High Resolution Water Window X-Ray Microscope Optical Design and Analysis Purchase Order No. H-13006D
    David L. Shealy, C. Wang · 1993 · NASA Technical Reports Server (NASA)
42. Throughput estimate of an X-ray projection lithography system
    Masaaki Itou, Tsuneo Terasawa, Shigeo Moriyama · 1991
43. Local area mask patterning of extreme ultraviolet lithography reticles for native defect analysis
    Adam Lyons · 2013
44. Present Status and Future Problems of Extreme Ultraviolet Lithography
    Hiroo Kinoshita · 2007 · The Review of Laser Engineering
45. Extreme Ultra Violet (EUV) Light Source for Future High Volume Manufacturing of Semiconductor
    Hakaru Mizoguchi, Taku Yamazaki, Takashi Saitoh · 2015 · The Journal of the Institute of Electrical Engineers of Japan
46. Design and Analysis of Multi-Mirror Soft X-Ray Projection Lithography Systems
    David L. Shealy, Cheng Wang, V. K. Viswanathan · 1991
47. Development of element technologies for EUVL
    Hiroo Kinoshita, Takeo Watanabe, Tetsuo Harada · 2015 · Advanced Optical Technologies
48. Laser-Impact Metal Droplet EUV Source
    H. Mizoguchi, Junichi Fujimoto · 2014 · Elsevier eBooks
49. Deposition, characterization, patterning and mechanistic study of inorganic resists for next-generation nanolithography
    Feixiang Luo · 2016
50. Evolution of Lithography and Development Status of EUV Lithography
    Shinji Okazaki · 2010 · The Review of Laser Engineering
51. Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method
    Takashi Satō, Takeo Watanabe, Hiroto Kudo · 2017 · International Conference on Extreme Ultraviolet Lithography
52. Development of absorption-coefficient-measurement method of EUV resist by direct-resist coating on a photodiode
    Shota Niihara, Tetsuo Harada, Takeo Watanabe · 2018 · International Conference on Extreme Ultraviolet Lithography
53. Characterization of extreme ultraviolet lithography photoresists using advanced metrology and fitting techniques
    Genevieve A. Kane · 2014
54. Thermal stability of Mo-based multilayer soft x-ray mirrors
    Hisataka Takenaka, Tomoaki Kawamura, Yoshikazu Ishii · 1994 · Elsevier eBooks
55. Special Issue on Innovative Progress in Solid-State and Fiber Lasers for Industrial Applications
    Hakaru Mizoguchi, Takashi Matsunaga, Takashi Saitou · 2013 · The Review of Laser Engineering
56. Preface to the Topical Papers on the Development of Laser-Driven XUV~X-ray Sources Dedicated for Industrial Applications
    Hiroaki Nishimura · 2014 · The Review of Laser Engineering
57. Photolithography and Photoresist
    Hiroto Kudo · 2014 · Springer eBooks
58. リソグラフィ技術
    信次 岡崎 · 2003 · Electrochemistry
59. Low Energy Xe+Ion Beam Machining of the Ultralow Expansion Glass Substrates for Aspherical Extreme Ultraviolet Lithography Projection Optics
    Hironori Endo, Junya Yamada, S.A. Pahlovy · 2011 · Japanese Journal of Applied Physics
60. Imaging of EUV Lithographic Masks with Programmed Substrate Defects
    K. B. Nguyen, David T. Attwood, Tsutomu Mizota · 1994
61. At-Wavelength Metrology of EUV Cameras using Lateral-Shearing Interferometry
    Zhuopeng Tan, Alastair A. MacDowell, Bruno La Fontaine et al. · 1994
62. Schwarzchild microscope for carbon Kα radiation
    Katsuhiko Murakami, Hiroshi Nakamura, Tetsuya Oshino · 1992
63. Development and Characterization of a 10x Schwarzschild System for Soft-X-Ray Projection Lithography
    Daniel A. Tichenor, Glenn D. Kubiak, Marcin Malinowski et al. · 1993
64. Проект рентгенооптической схемы литографа с динамической маской пропускающего типа и синхротронным источником излучения
    И.В. Малышев, Н.И. Чхало, С.Н. Якунин · 2023 · Журнал технической физики
65. The Photopolymer Science and Technology Award
    Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada · 2023 · Journal of Photopolymer Science and Technology
66. Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers
    Kyohei Imai, Bunta Inoue, Yoshihiko Hirai · 2024 · Journal of Photopolymer Science and Technology
67. Development of an EUV irradiation tool in hydrogen atmosphere to evaluate EUV mask absorber durability
    Hayato Ishida, Shinji Yamakawa, Tetsuo Harada · 2025 · Japanese Journal of Applied Physics
68. Photoresist Materials
    Takeo Watanabe · 2025 · Springer handbooks
69. Large Language Model-Based Hierarchical Framework for Emerging Trends in Extreme Ultraviolet Research
    Sung Tae Yoo, Seonho Kim, Jae-Min Lee · 2025
70. Microscope X dans la fenêtre de l’eau : conception, miroirs à revêtements multicouches et métrologie associée
    Catherine Burcklen · 2017
71. Resists in modern lithography: from deep ultraviolet to X-rays
    Д. В. Петрова, M. M. Dzhons, Н. И. Чхало · 2026 · Russian Chemical Reviews