Kinoshita, H.

Soft x-ray reduction lithography using multilayer mirrors

Kinoshita, H., Kurihara, K., Ishii, Y., & Torii, Y. (1989) · Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 270

History of extreme ultraviolet lithography

Kinoshita, H. (2005) · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 25

A step-and-repeat x-ray exposure system for 0.5 μm pattern replication

Hayasaka, T., Ishihara, S., Kinoshita, H., & Takeuchi, N. (1985) · Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 15

Study of Dill's B parameter measurement of EUV resist

Sekiguchi, A., Matsumoto, Y., Harada, T., Watanabe, T., & Kinoshita, H. (2015) · SPIE Proceedings

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 10