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Cited by 508

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Determination of pore size distribution in thin films by ellipsometric porosimetry

Baklanov, M. R., Mogilnikov, K. P., Polovinkin, V. G., Dultsev, F. N.·2000·Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

Abstract

We show that ellipsometric porosimetry can be used for the measurement of the pore size distribution in thin porous films deposited on top of any smooth solid substrate. In this method, in situ ellipsometry is used to determine the amount of adsorptive, which is adsorbed/condensed in the film. Changes in refractive index and film thickness are used to calculate the quantity of adsorptive present in the film. Room temperature porosimetry based on adsorption of vapor of organic solvents has been developed. In this article, a method of calculation of pore size distribution and results of measurements on mesoporous and microporous xerogel films is discussed. Examination of the validity of the Gurvitsch rule for various organic adsorptives (toluene, heptane, and carbon tetrachloride) is carried out to assess the reliability of measurements of pore size distributions by ellipsometric porosimetry.

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Metadata

Authors
Baklanov, M. R., Mogilnikov, K. P., Polovinkin, V. G., & Dultsev, F. N.
Venue
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Published
2000-05-01
Volume
18
Issue
3
Pages
1385-1391
ISSN
  • 1071-1023 (ISSN-L)
  • 1520-8567
OpenAlex
W2026219304
Cited by
508
References
1
FWCI
9.43
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Determination of pore size distribution in thin films by ellipsometric porosimetry. https://app.cochat.ai/papers/10.1116/1.591390
The paper
Baklanov, M. R., Mogilnikov, K. P., Polovinkin, V. G., & Dultsev, F. N. (2000). Determination of pore size distribution in thin films by ellipsometric porosimetry. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena. https://doi.org/10.1116/1.591390

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