The Effect of Ar+ Ion Bombardment on SiO2 Aerogel Film
Open accessAbstract
Ar+ ion bombardment on SiO2 aerogel films was introduced to investigate the physical collision effect of oxygen plasma treatment on the films. The changes of internal surface adsorbing species and microstructure in the films were analyzed through the treatments. Through chemically inert Ar+ ion bombarding treatment, internal surface organic groups were partially removed. A slight increase in surface particle size was observed, which results from the condensation of SiO2 particles due to the elimination of internal surface adsorbing organics. According to the increase in the accelerating voltage of Ar+ ion, the reduction of film thickness became larger than that observed with oxygen plasma treatment. The film thickness is maintained uniform with varying the treatment time and this confirms that there is no measurable etching happened within our treatment conditions. From these it is confirmed that a collapse of 3-dimensional network structure of SiO2 aerogel film was happened though Ar+ ion bombarding treatment.
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Characteristics of material surface, gas species, RF power, and gas pressure affect the performance of plasma treatment.
“The characteristics of the material’s surface, gas species, radiofrequency (RF) power, and gas pressure all affect the performance of the process [81,82].”
From Silica Aerogels as a Promising Vehicle for Effective Water Splitting for Hydrogen Production (2025) · cites this paper as [81]
The Introduction (p. 2) describes adsorbed species on SiO2 aerogel surfaces, and Results and Discussion (p. 3) contrasts the effects of oxygen plasma and Ar+ bombardment. That supports a role for surface characteristics and treatment species in this specific setting, but the paper does not establish that RF power or gas pressure affect performance. The 250 W value in Experimental (p. 2) refers to the XPS radiation source, not plasma-treatment RF power. (LLM, conf=0.85)
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Cites
Sol-gel transition in simple silicates
Brinker, C. J., KEEFER, K. D., Schaefer, D. W., & Ashley, C. S. (1982) · Journal of Non-Crystalline Solids · doi:10.1016/0022-3093(82)90245-9 · Cited by 663 · see citing works
SiO 2 aerogel film as a novel intermetal dielectric
Jo, M., Park, H., Kim, D. J., et al. (1997) · Journal of Applied Physics · doi:10.1063/1.365902 · Cited by 96 · see citing works
Self-citationProcess Integration and Manufacturasility Issues for High Performance Multilevel Interconnect
Jeng, S.-P., Havemann, R., & Chang, M.-C. (1994) · MRS Proceedings · doi:10.1557/proc-337-25 · Cited by 48 · see citing works
Park, H., Kwon, K., Lee, J.-L., et al. (1994) · Journal of Applied Physics · doi:10.1063/1.357294 · Cited by 41 · see citing works
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Research works printed but not linked: 3
- [1]S. P. Jeng, R. H. Havemann and M. C. Chang: Proc. Mater. Res. Soc. Symp. 25 (1994) 337.
- [6]T. Homma and Y. Murao: Proc. ISMIC Conf. 101 (1992) 65.
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Silica Aerogels as a Promising Vehicle for Effective Water Splitting for Hydrogen Production
Vadanagekar, A., Lapcik, L., Kvitek, L., & Lapcikova, B. (2025) · Molecules · doi:10.3390/molecules30061212 · Cited by 4 · see citing works
The role of vacuum ultraviolet in H2 plasma treatment on SiO2 aerogel film
Jung, S.-B., Park, H.-H., & Kim, H. (2003) · Applied Surface Science · doi:10.1016/s0169-4332(03)00508-7 · Cited by 4 · see citing works
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- Authors
- Kim, H.-R., & Park, H.-H.
- Affiliations
- Yonsei University (KR)
- ORCID
- Park, Hyung-Ho
- Venue
- Japanese Journal of Applied Physics
- Publisher
- IOP Publishing
- Published
- 1998-12-01
- Volume
- 37
- Issue
- 12S
- Pages
- 6955
- ISSN
- 0021-4922 (ISSN-L)
- 1347-4065
- OpenAlex
- W2091142934
- Cited by
- 14
- References
- 4
- Citations by year
- 2025: 1 · 2021: 1
- FWCI
- 0.23
- Type
- journal article
- Language
- en
- Open access
- bronze
- doi.org
- Licence
- Locations
- Japanese Journal of Applied Physics (publishedVersion)
- Topics
- Physical Sciences › Chemistry › Spectroscopy › Aerogels and thermal insulation
- Physical Sciences › Engineering › Computational Mechanics › Ion-surface interactions and analysis
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Plasma Diagnostics and Applications
- Keywords
- argon ion bombardment, oxygen plasma treatment, film thickness reduction, film microstructure
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