Dry Etch Resistance of Organic Materials

Cited by (263)

Items 101–200 of 263

1. Synthesis of Narrow Molecular Weight Distribution Norbornene-Lactone Functionalized Polymers by Nitroxide-Mediated Polymerization: Candidates for 193-nm Photoresist Materials
   Zi Wang, Milan Marić · 2014 · Polymers
2. Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: a beam system study of P4MS and PαMS
   D. Nest, T-Y Chung, Joseph J. Végh · 2010 · Journal of Physics D Applied Physics
3. Nanoimprint System for High Volume Semiconductor Manufacturing; Requirement for Resist Materials
   Toshiki Ito, Keiji Emoto, Tsuneo Takashima · 2016 · Journal of Photopolymer Science and Technology
4. Dichroic Plasmon Superstructures of Au Nanorods over Macroscopic Areas via Directed Self‐Assemblies of Diblock Copolymers
   Hee‐Jung Kang, Sung‐Soo Kim, Seong Il Yoo · 2019 · Advanced Materials Interfaces
5. A comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers
   E. Babich, Jurij R. Paraszczak, Michael Hatzakis · 1985 · Microelectronic Engineering
6. Resist design concepts for 193 nm lithography: Opportunities for innovation and invention
   Elsa Reichmanis, Omkaram Nalamasu, Francis M. Houlihan · 1997 · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
7. Functional flexible organic–inorganic hybrid polymer for two photon patterning of optical waveguides
   Sabine Bichler, Sonja Feldbacher, Rachel Woods · 2011 · Optical Materials
8. Influence of top layer geometries on the electronic properties of pentacene and diindenoperylene thin films
   M. Scharnberg, Rainer Adelung, Franz Faupel · 2008 · physica status solidi (a)
9. Fabrication of subwavelength structure for improvement in light-extraction efficiency of light-emitting devices using a self-assembled pattern of block copolymer
   Koji Asakawa, Akira Fujimoto · 2005 · Applied Optics
10. Application of quantitative structure property relationship to the design of high refractive index 193i resist
    Heping Liu, Idriss Blakey, Willard E. Conley · 2008 · Journal of Micro/Nanopatterning Materials and Metrology
11. Performance of a high resolution chemically amplified electron beam resist at various beam energies
    Dongxu Yang, Andreas Frommhold, Alexandra McClelland, J. Roth, Mark C. Rosamond, E. H. Linfield, Johann Osmond, Richard E. Palmer, Alex P. G. Robinson · 2016 · Microelectronic Engineering
12. Chain scission efficiency and reactive‐ion etch resistance of alternating copolymers of styrene and olefins trisubstituted or tetrasubstituted with electron‐withdrawing groups
    Hiroshi Itô, Claudia Hrusa, Henry Kingston Hall · 1986 · Journal of Polymer Science Part A Polymer Chemistry
13. Ar + bombardment of 193nm photoresist: Morphological effects
    E. Pargon, D. Nest, David B. Graves · 2007 · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
14. Resists for microlithography: Present status and recent research trends
    Kazuyuki Sugita, Nobuo Ueno · 1992 · Progress in Polymer Science
15. Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography
    Xue Cong, Siliang Zhang, Jiaxing Gao, Xuewen Cui, Yurui Wu, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li et al. · 2024 · ACS Omega
16. Towards Ordered Silicon Nanostructures through Self‐Assembling Mechanisms and Processes
    Rosaria A. Puglisi · 2015 · Journal of Nanomaterials
17. Synthesis of novel copolymer based on precipitation polymerization and its application in positive-tone photoresist
    Xiangfei Zheng, Changwei Ji, Qingtao Zeng · 2017 · Journal of Polymer Research
18. Suppression of 193-nm photoresist deformation by H2 addition to fluorocarbon plasma in via-hole etching
    Kazumasa Yonekura, Kazunori Yoshikawa, Yuji Fujiwara · 2006 · Thin Solid Films
19. Role of the dense amorphous carbon layer in photoresist etching
    Adam Pranda, Sandra A. Gutierrez Razo, Zuleykhan Tomova · 2017 · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
20. Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
    Hideo Hada, Taku Hirayama, Daiju Shiono · 2005 · Japanese Journal of Applied Physics
21. Silicon Patterning Using Self‐assembled PS‐ b ‐PAA Diblock Copolymer Masks for Black Silicon Fabrication via Plasma Etching
    Xin Zhang, Andrei B. Sushkov, Christopher Metting · 2012 · Plasma Processes and Polymers
22. Numerical investigation of depth profiling capabilities of helium and neon ions in ion microscopy
    Patrick Philipp, Lukasz Rzeznik, Tom Wirtz · 2016 · Beilstein Journal of Nanotechnology
23. High‐aspect‐ratio oxide etching using CF4/C6F12O plasma in an inductively coupled plasma etching system with low‐frequency bias power
    Jinhyuk Kim, Gilyoung Choi, Kwang‐Ho Kwon · 2022 · Plasma Processes and Polymers
24. Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
    F. Weilnboeck, Dominik Metzler, Niranjan Kumar · 2011 · Applied Physics Letters
25. The effect of direct PAG incorporation into the polymer main chain on reactive ion etch resistance of 193nm and EUV chemically amplified resists
    Cheng-Tsung Lee, Clifford L. Henderson, Mingxing Wang · 2008 · Microelectronic Engineering
26. Traversing the “Top-Down/Bottom-Up” Divide: Molecular-Scale Lithography of Self-Assembled Ribbons
    Jonas E. Jarvholm, Mohan Srinivasarao, Laren M. Tolbert · 2008 · Journal of the American Chemical Society
27. Oxygen ion-beam etch resistance of metal-free and organosilicon resist materials
    Hiroshi GOKAN, Y. Ohnishi, Kazuhide Saigo · 1983 · Microelectronic Engineering
28. Close-Packed Noncircular Nanodevice Pattern Generation by Self-Limiting Ion-Mill Process
    Vishal Parekh, Ariel Ruiz, Paul Ruchhoeft · 2007 · Nano Letters
29. Polymer pattern formation on SiO2 surfaces using surface monolayer initiated polymerization
    Xiaohua Chen, Laren M. Tolbert, Clifford L. Henderson · 2001 · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
30. Revolutionary and evolutionary resist design concepts for 193 nm lithography
    O. Nalamasu, Tom Wallow, Elsa Reichmanis et al. · 1997 · Microelectronic Engineering
31. Nano- and micro-fabrications of polystyrene having atactic and syndiotactic structures using focused ion beams lithography
    Akihiro Oshima, Satoshi Okubo, G. Isoyama · 2012 · Radiation Physics and Chemistry
32. Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching
    Andreas Frommhold, Richard Edward Palmer, Alex P. G. Robinson · 2013 · Journal of Micro/Nanopatterning Materials and Metrology
33. Environmentally Friendly Negative Resists Based on Acid‐Catalyzed Acetalization for 193‐nm Lithography
    Jin-Baek Kim, Ji‐Hyun Jang, Jong‐Sung Ko · 2003 · Macromolecular Rapid Communications
34. Chlorine-based inductively coupled plasma etching of GaAs wafer using tripodal paraffinic triptycene as an etching resist mask
    Akihiro Matsutani, Fumitaka Ishiwari, Yoshiaki Shoji · 2016 · Japanese Journal of Applied Physics
35. Unique polymers via radical diene cyclization: polyspironorbornanes and their application to 193 nm microlithography
    Robert P. Meagley, Dario Pasini, Linus Y. Park · 1999 · Chemical Communications
36. ArF Chemically Amplified Positive Resist Based on Alicyclic Lactone Polymer
    Katsumi Maeda, Kaichiro Nakano, Shigeyuki Iwasa · 2001 · Japanese Journal of Applied Physics
37. Highly selective etch gas chemistry design for precise DSAL dry development process
    Mitsuhiro Omura, Takahiro Imamura, Hiroshi M Yamamoto · 2014 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
38. Chemically amplified resists for high-resolution lithography
    С. А. Булгакова, M. M. Jons, А. Е. Пестов · 2013 · Russian Microelectronics
39. Safety-oriented photolithography of water-soluble resist using water-coating and water-developable processes for edible pharmaceutical polymer films
    Satoshi Takei · 2018 · Applied Physics Express
40. Enhancement of Dry-Etching Durabilities by Energy or Etchant Quenching
    1999 · Japanese Journal of Applied Physics
41. Healing surface roughness of lithographic nanopatterns through sub-10 nm aqueous-dispersible polymeric particles with excellent dry etch durability
    Zhen Jiang, Han‐Hao Cheng, Idriss Blakey · 2018 · Molecular Systems Design & Engineering
42. Reactive ion etching of selected polymers in O2 and in CF4/O2
    Browne Hand, Timothy J. H. Long, Bernard C. Dems · 1993 · Journal of Applied Polymer Science
43. Molecular design and biosynthesis of biodegradable polyesters
    Kumar Sudesh, Yoshiharu Doi · 2000 · Polymers for Advanced Technologies
44. Polymer Sequence Alters Sensitivity and Resolution in Chemically Amplified Polypeptoid Photoresists
    Cameron P. Adams, Carolyn Henein, Xiangxi Meng, Chenyun Yuan, Javier Read de Alaniz, Christopher Kemper Ober, Rachel A. Segalman · 2025 · ACS Macro Letters
45. Poly(2‐vinylnaphthalene)‐block‐poly(acrylic acid) Block Copolymer: Self‐Assembled Pattern Formation, Alignment, and Transfer into Silicon via Plasma Etching
    Xin Zhang, Christopher Metting, Robert M. Briber · 2011 · Macromolecular Chemistry and Physics
46. Graphene-Based Etch Resist for Semiconductor Device Fabrication
    Sang Won Kim, Minsu Seol, Yeonchoo Cho et al. · 2020 · ACS Applied Nano Materials
47. Polymers
    Vijay Kumar, Manu Pallapa, Pouya Rezai, P.R. Selvaganapathy · 2015 · Elsevier eBooks
48. Investigations of the Adhesion of Maleic Anhydride/Cyclic Olefin Alternating Copolymers to Silicon Substrates: Improved Materials for 193 nm Lithography
    Anthony J. Pasquale, Timothy E. Long, Hoa Truong · 2002 · The Journal of Adhesion
49. Alicyclic photoresists for CO2-based next-generation microlithography: A tribute to James E. McGrath
    Mary Kate Boggiano, David G. Vellenga, Ruben Carbonell · 2006 · Polymer
50. Synthesis and evaluation of methyl methacrylate copolymers and terpolymers as electron beam resists. II. Methyl methacrylate copolymers and terpolymers containing aromatic rings
    Ivan Gitsov, Olga G. Todorova · 1992 · Journal of Applied Polymer Science
51. Fabrication technique of a nonlinear optical structure using optical polymeric films by direct electron-beam irradiation
    Hideki Nakayama, H. Fujimura, Chikara Egami · 1998 · Applied Optics
52. Fluorinated Chemically Amplified Dissolution Inhibitors for 157 nm Nanolithography
    Zachary M. Fresco, Nicolas Bensel, Itai Suez · 2003 · Journal of Photopolymer Science and Technology
53. Review on interfacial bonding enhancement of inorganic thin film on polymer substrate by ion and plasma source
    Ruo Xuen Lim, Meow Siang Khor, Kuan Yew Cheong · 2023 · International Journal of Adhesion and Adhesives
54. EUVL compatible LER solutions using functional block copolymers
    Han‐Hao Cheng, Imelda Keen, Anguang Yu, Ya‐Mi Chuang, Idriss Blakey, Kevin S. Jack, Michael J. Leeson, Todd R. Younkin, Andrew K. Whittaker · 2012 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
55. Polybenzoxazole/graphene nanocomposite for etching hardmask
    S.W. Shin, Jong Seon Kim, Seon Joon Kim · 2019 · Journal of Industrial and Engineering Chemistry
56. Dry-Etching Durability of Copolymers and Polymer Blends of Vinylnaphthalene or α-Methylstyrene with Methyl Methacrylate
    Masahito Kushida, Yoshiaki Imaizumi, Kieko Harada · 1995 · Japanese Journal of Applied Physics
57. Enhancing the dry etch resistance of polymethyl methacrylate patterned with electron beam lithography
    Daniel J. Carbaugh, Sneha G. Pandya, Jason T. Wright, Savaş Kaya, Faiz Rahman · 2017 · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
58. Visualization of organic/inorganic hybridization of UV-cured films with trimethylaluminum by scanning transmission electron microscopy and energy dispersive x-ray spectroscopy
    Masaru Nakagawa, Takuya Uehara, Yuki Ozaki · 2018 · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
59. UV Characteristics and Performance as Positive-Working Deep, Mid, and Near UV Resists of Phenyl Isopropenyl Ketone Copolymers
    Kazuyuki Sugita, Nobuo Ueno, Kieko Harada · 1993 · Polymer Journal
60. Status and future of DUV photoresists for the semiconductor industry
    James W. Thackeray · 1998 · Microelectronic Engineering
61. Ag-Diffusion in the Organic Semiconductor Diindenoperylene
    M. Scharnberg, Jingping Hu, Jörn Kanzow · 2005 · Defect and diffusion forum/Diffusion and defect data, solid state data. Part A, Defect and diffusion forum
62. Energy Quenching Effects on Dry-Etching Durability of Copolymers and Polymer Blends of Vinylnaphthalene or α-Methyl Styrene with Methyl Methacrylate
    Masahito Kushida, Y Yoshida, Kieko Harada · 1998 · Japanese Journal of Applied Physics
63. Material Characterization Required for Designing Satellites from Fiber-Reinforced Polymers
    Esha Esha, Joachim M. Hausmann · 2023 · Journal of Composites Science
64. Evaluating spin-on carbon materials at low temperatures for high wiggling resistance
    Michael Weigand, Vandana N. Krishnamurthy, Yubao Wang · 2013 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
65. Novel Diamantane Polymer Platform for Resist Applications
    Murirathna Padmanaban, Srinivasan Chakrapani, Guanyang Lin et al. · 2007 · Journal of Photopolymer Science and Technology
66. Differences in erosion mechanism and selectivity between Ti and TiN in fluorocarbon plasmas for dielectric etch
    F. Weilnboeck, Elliot A. J. Bartis, Sivan Shachar · 2012 · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
67. Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists
    Arpan P. Mahorowala, David R. Medeiros · 2001 · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
68. Molecular Design of o-Nitrobenzyl Phenol Ether for Photo-deprotection Resist; Challenge to half-pitch 22nm using Near-field Lithography
    Toshiki Ito, Akira Terao, Yasuhisa Inao · 2007 · Journal of Photopolymer Science and Technology
69. Patterning Challenges in Microelectronics
    Sébastien Barnola, N. Possémé, S. Landis · 2017 · Elsevier eBooks
70. Etch considerations for directed self-assembly patterning using capacitively coupled plasma
    Vinayak Rastogi, Peter L. G. Ventzek, Alok Ranjan · 2018 · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
71. Perpendicular SiO2 cylinders fabricated from a self-assembled block copolymer as an adaptable platform
    Yuri Yamada, Kota Ito, Atsushi Miura · 2018 · European Polymer Journal
72. Ion Bombardment-Induced Nanoarchitectonics on Polyetheretherketone Surfaces for Enhanced Nanoporous Bioactive Implants
    Teresa Aditya, Andrea Mesa Restrepo, Ana Civantos, Ming Kit Cheng, Camilo Jaramillo, Viviana M. Posada, Zachariah Koyn, Jean Paul Allain · 2023 · ACS Applied Bio Materials
73. Enhancing the dry-etch durability of photoresist masks: A review of the main approaches
    С. В. Зеленцов, Nadezda V. Zelentsova, A. N. Kolesov · 2007 · Russian Microelectronics
74. Pattern Transfer of Nanomasks Based on Diblock Copolymers Self-Assembling through Reactive Ion Etching
    Cristina Garozzo, Corrado Bongiorno, Antonino La Magna · 2012 · ECS Journal of Solid State Science and Technology
75. Experimental and Numerical Study of Submonolayer Sputter Deposition of Polystyrene Fragments on Silver for the Storing Matter Technique
    Canan Turgut, Godhuli Sinha, Lotta Mether · 2014 · Analytical Chemistry
76. Optical and electrical characterizations of a single step ion beam milling mesa devices of chloride passivated PbS colloidal quantum dots based film
    Elad Hechster, Arthur Shapiro, Efrat Lifshitz · 2016 · AIP Advances
77. Carbon Nanotubes as Etching Masks for the Formation of Polymer Nanostructures
    Woongbin Yim, S. J. Park, Sung Yong Han · 2017 · ACS Applied Materials & Interfaces
78. Synthesis and self-assembly of high-χ poly(4-tertbutylstyrene)-block-poly(2-hydroxyethylmethacrylate)
    Caleb L. Breaux, Brandon L. Sharp, Peter J. Ludovice, Clifford L. Henderson, Haibo Li, Bing Li, Mark O. Neisser · 2019 · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
79. Interaction of long‐lived reactive species from cold atmospheric pressure plasma with polymers: Role of macromolecular structure and deep modification of aromatic polymers
    Pingshan Luan, Gottlieb S. Oehrlein · 2019 · Plasma Processes and Polymers
80. Plasma etch properties of organic BARCs
    Runhui Huang, Michael Weigand · 2008 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
81. Effect of a deprotection group on acrylic photoresist
    Shih-Chi Fu, K. H. Hsieh, L. A. Wang · 1999 · Journal of Polymer Research
82. High Selective Plasma Etching of PMMA to PS
    Kazuma Shimomukai, Hiroaki Kawata, Masaaki Yasuda · 2015 · Journal of Photopolymer Science and Technology
83. Photoresists and Advanced Patterning
    Cliff Henderson · 2012 · Elsevier eBooks
84. Improvement of the wiggling profile of spin-on carbon hard mask by H2 plasma treatment
    M. Tadokoro, Kazumasa Yonekura, Kazunori Yoshikawa · 2008 · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
85. Thermolysis of Polymethacrylates for 193 nm Resist
    Toshiyuki Ogata, Kohei Kasai, Shogo Matsumaru · 2006 · Journal of Photopolymer Science and Technology
86. Selective Laser Ablation in Resists and Block Copolymers for High Resolution Lithographic Patterning
    Deirdre L. Olynick, Pradeep N. Perera, Adam M. Schwartzberg et al. · 2015 · Journal of Photopolymer Science and Technology
87. First Demonstration of Single-Mode Polymer Optical Waveguides with Circular Cores for Fiber-to-Waveguide Coupling in 3D Glass Photonic Interposers
    Rui Zhang, Fuhan Liu, Venky Sundaram, Rao Tummala · 2017 · IEEE Electronic Components and Technology Conference (ECTC)
88. Fullerene Nanocomposite Resists for Nanolithography
    T. Ishii, Kiyotaka Shigehara · 2009 · Springer eBooks
89. Synthesis of well-defined norbornene–lactone-functionalized polymers via ATRP
    Takuma Miyazaki, Boyong Xue, Kazufumi Kohno · 2009 · Polymer Bulletin
90. Polymers of norbornenyl‐4‐phenol: Dissolution rate characteristics, positive tone photo‐patterning, and polymer properties
    Paul J. Evans, Chad Brick, Andrew Bell · 2017 · Journal of Applied Polymer Science
91. Hybrid dendritic-linear graft copolymers: Steric considerations in ?coupling to? approach
    Archana Desai, Nathan Atkinson, Felix Rivera, Wayne Devonport, Ian D. Rees, Steven E. Branz, Craig J. Hawker · 2000 · Journal of Polymer Science Part A Polymer Chemistry
92. Dry development for a directed self-assembly lithography hole-shrink process using CO/H2 plasma
    Mitsuhiro Omura, Tsubasa Imamura, Hiroshi M Yamamoto · 2015 · Journal of Micro/Nanopatterning Materials and Metrology
93. Lithographic Resists
    William D. Hinsberg, Gregory M. Wallraff · 2012 · Encyclopedia of Polymer Science and Technology
94. Characterization of a new polarity switching negative tone e-beam resist for 14nm and 10nm logic node mask fabrication and beyond
    Tom Faure, Amy E. Zweber, Luisa D. Bozano et al. · 2014 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
95. Design considerations for ultraviolet-nanoimprint lithography resists
    Kazuyuki Usuki, Satoshi Wakamatsu, Tadashi Oomatsu · 2012 · Journal of Micro/Nanopatterning Materials and Metrology
96. Effect of oxygen plasma treatments on the structural and optical properties of polyimide films
    Ahmed A. Atta, Sobhia M. El-Sayed · 2015 · Journal of Engineering and Technology
97. Advanced Lithography
    Alberto Roncaglia · 2022 · Springer handbooks
98. Etching Efficiency of Polymethacrylates for Monochromatic Low Energy Ion Beams
    Shu Seki, Satoshi Kawachi, Seiichi Tagawa · 2005 · Journal of Photopolymer Science and Technology
99. Synthesis and characterization of chiral polyacrylates and their applications as positive tone photoresists
    Hsien‐Jung Hung, Po‐Chih Yang, Jui‐Hsiang Liu · 2008 · Journal of Applied Polymer Science
100. Novel electron beam resist material using hydrophilic protecting group
     Satoshi Saito, Tetsuro Nakasugi · 2005 · Microelectronic Engineering