Dry Etch Resistance of Organic Materials

Cited by (263)

Items 201–263 of 263

1. Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresists
   Panagiotis Argitis, Maria Vasilopoulou, Εvangelos Gogolides · 1998 · Microelectronic Engineering
2. Characteristics of selective PMMA etching for forming a PS mask
   M. Satake, T. Iwase, M. Kurihara · 2013 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
3. Recent Progress in New Acetal-based Resist for Electron Beam Lithography
   Takuma Hojo, Mitsuru Satô, Hiroshi Komano · 2003 · Journal of Photopolymer Science and Technology
4. Three-Dimensional Electronic Surfaces
   James C. Sturm, Pai-hui I. Hsu, Scott Miller · 2000 · MRS Proceedings
5. Durability to oxygen reactive ion etching enhanced by addition of synthesized bis(trimethylsilyl)phenyl-containing (meth)acrylates in ultraviolet nanoimprint lithography
   Shunya Ito, Hiroki Sato, Yuhei Tasaki · 2016 · Japanese Journal of Applied Physics
6. Developing Resist Images
   Wayne M. Moreau · 1988 · Springer eBooks
7. Block Copolymer Nanostructured Thin Films for Advanced Patterning
   Michelle A. Chavis, Evan L. Schwartz, Christopher Kemper Ober · 2011 · Wiley eBooks
8. Ultra rapid prediction of the durability of coatings for plastics using plasma erosion
   N. A. R. Falla · 1998 · Surface Coatings International
9. Study of the synthesis and characterization of methacrylate photoresists
   Shih-Chi Fu, Hsiou Wei Lin, Wei-Chen Chou · 2001 · Journal of Applied Polymer Science
10. Photoresists
    Carlton Grant Willson, M. D. Stewart · 2001 · Elsevier eBooks
11. Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene
    Yizhou Liu, Josua Markus, Han‐Hao Cheng, Paul V. Bernhardt, Andrew K. Whittaker, Idriss Blakey, Craig M. Williams · 2025 · Chemistry of Materials
12. Assisted Preparation of Waterborne Anti-etching Coating for Printed Circuit Board Photoresist Using Dibenzoyl Peroxide/Copper(II)-Phthalocyanine at Room Temperature
    Haoyang Xu, Wenzhe Li, Xin Wang · 2023 · ACS Applied Polymer Materials
13. Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching
    Shikhar Arvind, Roberto Fallica, Philippe Bézard · 2025 · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
14. Energy Quenching Effects on Dry-Etching Durability of Alicyclic-Aliphatic Copolymers and Polymer Blends Enhanced by Polymer-Chain Entanglement
    Masahito Kushida, Kenryou Kawamoto, Kieko Harada · 2005 · Japanese Journal of Applied Physics
15. Surface roughening of photoresist after change of the photon/radical and ion treatment sequence
    Yan Zhang, Takuya Takeuchi, Kenji Ishikawa · 2017 · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
16. High-carbon fullerene based spin-on organic hardmask
    Warren Montgomery, Alex P. G. Robinson, Guy Dawson · 2018
17. Oxygen plasma etching of hydrocarbon‐like polymers: Part II experimental validation
    Alexandre Bès, Min Koo, Thanh-Long Phan · 2018 · Plasma Processes and Polymers
18. Preparation and Characterization of a Triple Layered Au‐ PMMA‐PbSe Hybrid Nanocomposite: Manipulation of PMMA Spacer Layer by Oxygen Plasma Etching
    Wan‐Joong Kim, Jae Bong Choi, Sanghee Kim · 2015 · Bulletin of the Korean Chemical Society
19. Computer Simulation of Electron Scattering by Heavy Atoms Added into Resist for Dry-Etch Resistance Enhancement
    Shinya Hasegawa, Yoshisuke Iida · 1985 · IEEE Journal of Solid-State Circuits
20. Wet Clean Applications in Porous Low‐kPatterning Processes
    Quoc Toan Le, Guy Vereecke, Herbert Struyf · 2012
21. Spun-on carbon antireflective layer with etch resistance for deep and vacuum ultraviolet lithography processes
    Yasuhiko Sato, Yasunobu Onishi, Yoshihiko Nakano · 2001 · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
22. Kinetics of Reactive Ion Etching of Polymers in an Oxygen Plasma: The Importance of Direct Reactive Ion Etching
    Sandra W. Graham, Christoph Steinbrüchel · 1993 · MRS Proceedings
23. Polymers, Photoresponsive (in Electronic Applications)
    Elsa Reichmanis, Omkaram Nalamasu, Francis M. Houlihan · 2003 · Elsevier eBooks
24. Photoresist for Water-developable Photolithography Process Using Plant-derived Hemicellulose
    Yuna Hachikubo, Sayaka Miura, Rio Yamagishi · 2024 · Journal of Photopolymer Science and Technology
25. The impact of polymer compositional homogeneity on lithography and defects
    Benjamin D. Naab, Jong Keun Park, Emad Aqad et al. · 2025
26. Impact of plasma vacuum ultraviolet photons on ultrathin resists for EUV lithography
    Shikhar Arvind, Roberto Fallica, Philippe Bézard · 2025
27. A Study on the High-Aspect-Ratio Oxide Etching Characteristics Using a Trifluoroiodomethane with a Low Global Warming Potential
    Gilyoung Choi · 2025 · JOURNAL OF CHEMICAL ENGINEERING OF JAPAN
28. Spin-on carbon using fullerene derivatives
    Andreas Frommhold, Alan G. Brown, T. Lada · 2014 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
29. Effect of photoacid generator additives on the dissolution behavior of bis-trifluoromethyl carbinol substituted polynorbornene
    Trevor Hoskins, Cody M. Berger, Peter J. Ludovice · 2004 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
30. High volume manufacturing of optical MEMS devices using biomass nano-patterning materials and ecofriendly developable lithography processes
    Satoshi Takei · 2018 · Environmental Effects on Light Propagation and Adaptive Systems
31. Chitosan as a water-based photoresist for DUV lithography
    Isabelle Servin, Alexandre Teolis, Arnaud F. Bazin et al. · 2023
32. Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching
    Yan Zhang, Masato Imamura, Kenji Ishikawa · 2018 · Japanese Journal of Applied Physics
33. Development of Spin-on Carbon Materials with High Planarization Performance for Multilayer Resist Process
    Keisuke Kawashima, Koji Inoue, Kenichi Fujii · 2020 · IEEE International Interconnect Technology Conference (IITC)
34. Subtractive Etching
    Wayne M. Moreau · 1988 · Springer eBooks
35. Poly (Ethylene Terephthalate) Films with Different Content of Acid-Base Functionalities. II. Gas Phase Analysis and Proposed Mechanisms
    Mariana Gheorghiu, Mihaela Cristina Pascu, Cornelia Vasile · 1998 · International Journal of Polymeric Materials
36. Depth Profile Analysis of Plasma-cured Multi Layer Resist
    Haruki Okumura, Takeshi Matsunobu, K. Matsuda et al. · 2006 · Journal of Photopolymer Science and Technology
37. Improvement of Dry Etching Resistance of Cyclized Polybutadiene Negative Resist by Vacuum Baking
    Toshio Shimizu Cornu · 1992 · Japanese Journal of Applied Physics
38. Imprint Lithography with Pressing at Room Temperature
    Takeshi Koide, Takashi Minemoto, Hideyuki Takakura · 2006 · Journal of The Electrochemical Society
39. Lithographic Resists
    William D. Hinsberg, Gregory M. Wallraff · 2005 · Kirk-Othmer Encyclopedia of Chemical Technology
40. Sensitivity of Polymer Units and Functional Groups Towards Exposure to Oxygen Plasma
    Jörg F. Friedrich, Jürgen Meichsner · 2022
41. PFAS free chemically amplified resists enabled by low activation energy hydrocarbon cage monomers
    Liu, Yizhou, Summersgill, Matthew D., Cheng, Han-Hao, Chow, Sharon, Im, Elijah, Du, Yining, Xing, Hui, Houston, Sevan D., Nielsen, Brian, Whittaker, Andrew K. et al. · 2026 · Chemical Science
42. Sputter deposited carbon tested as RIE intermediate for HSQ and its CMP reversed patterns
    Falco C. M. J. M. van Delft, Eric van den Heuvel, Frank van der Kruis · 2009 · Microelectronic Engineering
43. Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching
    Andreas Frommhold, Richard Edward Palmer, Alex P. G. Robinson · 2013 · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
44. Improvement of ArF Photo Resist Pattern by VUV Cure
    H. MIYATAKE, T. Ito · 2007 · IEICE Transactions on Electronics
45. Fullerene-Incorporated Nanocomposite Resist System for Nanolithograpy
    T. Ishii, H. Nozawa, Eiichi Kuramochi · 1999 · MRS Proceedings
46. Polymer Resist Technology in Lithography
    Ramakrishnan Ayothi, Brian P. Osborn · 2017 · CRC Press eBooks
47. Fabrication of large array of uniform metal nanostructures by use of soft sphere lithography and plasma etching
    Shaili Sett, Meneka Banik, Rabibrata Mukherjee · 2017 · AIP conference proceedings
48. Lithography resists
    Amandine Jouve, Michael May, Isabelle Servin · 2013
49. Evolution of lithographic materials enabling the semiconductor industry
    James W. Thackeray, Chengbai Xu, James F. Cameron · 2019
50. Improvement study of Mitsui SOC materials for multilayer lithography process
    Keisuke Kawashima, Koji Inoue, Kenichi Fujii · 2019
51. Nanotechnological Manufacturing: Nanostructured Polymers Designed for Plasma/Energetic Beam Templating of Materials
    Gottlieb S. Oehrlein, R. J. Phaneuf, David B. Graves · 2006
52. Lithographic Resists
    William D. Hinsberg, Gregory M. Wallraff, ROBERT DAY ALLEN · 2002 · Encyclopedia of Polymer Science and Technology
53. Lithographic Resists
    W. Hinsberg, G. M. Wallraff, R. D. Allen · 2000 · Kirk-Othmer Encyclopedia of Chemical Technology
54. Directed Self-Assembly of High-χ Block Copolymers for Advanced Patterning Applications
    Gabriela Alva · 2016
55. Nanomachining regular noble metal/ceramic structures for catalytic applications
    Hai Le The · 2019
56. Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process
    Paule Durin, Olha Sysova, Alexandre Téolis, Stéphane Trombotto, Samar Hajjar‐Garreau, Thierry Delair, Isabelle Servin, N. Rochat, Raluca Tiron, Corinne Gablin et al. · 2023 · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
57. Hybrid Silicon-Organic Methacrylate Monomers and Hyperbranched Polymers that Override the Ohnishi Parameter for Oxygen Plasma Etch Resistance
    Claire Hartmann‐Thompson, Elizabeth Lilygren, Adunya Mekonnen · 2024 · ACS Applied Polymer Materials
58. Recent Developments in the Artificial Weathering of Coatings Using Plasma Erosion
    N. A. R. Falla · 1987 · Springer eBooks
59. Si content in methacrylamide-containing A- b -(B- r -C) block copolymers and its impact on reactive ion etching properties
    Christopher Eom, Kyunghyeon Lee, Gordon S. W. Craig · 2025 · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
60. Modélisation de la gravure profonde du silicium en plasmas fluorés : étude du procédé BOSCH : simulations et calibration expérimentale
    Guillaume Le Dain · 2018
61. Plasma etching of high-χ block copolymers
    Maria Gabriela Gusmão Cacho · 2021
62. Fully dry-processed positive-tone electron beam lithography using myo-inositol
    R J E Smith, A. Scherer · 2026 · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
63. Photoresists for Miniaturization of Semiconductor Devices
    Masashi Yamamoto · 2026 · Springer eBooks