The DOI matches its Crossref record; 2 of the 2 references it cites were found in a registry or an index.
Wavelength considerations in soft-x-ray projection lithography
Abstract
The choice of the operational wavelength for a soft-x-ray projection lithography system affects a wide variety of system parameters such as optical design, sources, resists, and multilayer mirrors. Several system constraints limit the choice for the operational wavelength. In particular, optical imaging requirements place an upper limit and throughput issues place a lower limit on the wavelength selection. We have determined that there are several discrete wavelength regions between 10 and 25 nm that satisfy the system-imposed constraints of high resolution, large depth of focus, and high throughput.
Overview
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
Citations
Cites
Resolution limits of optical lithography
Okazaki, S. (1991) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.585650 · Cited by 161
Andrews, D., & Wilson, M. N. (1989) · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · doi:10.1116/1.584485 · Cited by 4
Cited by
Sorted by citations
Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149
Metadata
- Authors
- Hawryluk, A. M., & Ceglio, N. M.
- Affiliations
- Lawrence Livermore National Laboratory (US)
- Venue
- Applied Optics
- Publisher
- Optica Publishing Group
- Published
- 1993-12-01
- Volume
- 32
- Issue
- 34
- Pages
- 7062
- ISSN
- 0003-6935 (ISSN-L)
- 1539-4522
- OpenAlex
- W2153896914
- Cited by
- 35
- References
- 2
- Citations by year
- 2024: 1 · 2021: 1 · 2018: 1 · 2017: 1 · 2014: 3 · 2013: 2 · 2012: 3
- FWCI
- 3.96
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Applied Optics (publishedVersion)
- PubMed (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Physics and Astronomy › Radiation › Advanced X-ray Imaging Techniques
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Advanced optical system design
- Keywords
- soft x-ray projection lithography, wavelength selection, optical design, multilayer mirrors, X-ray sources, X-ray resist, depth of focus, image resolution, throughput, EUV lithography
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
