The DOI matches its Crossref record; 21 of the 21 references it cites were found in a registry or an index.
Room-temperature deposition of amorphous titanium dioxide thin film with high refractive index by a filtered cathodic vacuum arc technique
Abstract
Amorphous titanium dioxide (TiO2) thin film has been prepared by a filtered cathodic vacuum arc technique at room temperature. It was concluded from the core level of Ti 2p 3/2 (458.3 eV) and O 1s (529.9 eV) and their deviation in binding energy (deltaBE = 71.6 eV) that only one of Ti oxidation states, Ti4+, existed in the film and the film was of ideal stoichiometry. The film possessed high transmittance, which can reach as high as that of a quartz substrate, especially in the visible range, owing to its optical bandgap of 3.2 eV. The high refractive index (2.56 at 550 nm) and low extinction coefficient (approximately 10(-4) at 550 nm) suggested that the film had a high packing density and a low scattering-center concentration. These good optical properties implied the film prepared by this technique was a promising candidate for optical application. Besides, the film was found to transform in the structure from amorphous to anatase crystalline when it was annealed at 300 degrees C, as evidenced by Raman and x-ray diffraction.
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“In contrast to the e-beam technique, magnetron sputtering can provide values higher than n = 2.24 at λ = 550 nm for TiO2 films, even at room temperature [150].”
From Metal Oxide Thin Films for Advanced Photonic Applications (2026) · cites this paper as [150]
Citations
Cites
Raman Spectra of TiO2, MgF2, ZnF2, FeF2, and MnF2
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Electronic structure of anatase TiO2 oxide
Sanjinés, R., Tang, H., Berger, H., Gozzo, F., Margaritondo, G., & Lévy, F. (1994) · Journal of Applied Physics · doi:10.1063/1.356190 · Cited by 767
dc reactive magnetron sputtering of titanium-structural and optical characterization of TiO2 films
Suhail, M. H., Rao, G. M., & Mohan, S. (1992) · Journal of Applied Physics · doi:10.1063/1.351264 · Cited by 297
Deposition and modification of titanium dioxide thin films by filtered arc deposition
Bendavid, A., Martin, P., & Takikawa, H. (2000) · Thin Solid Films · doi:10.1016/s0040-6090(99)00937-2 · Cited by 213
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Model for ion-assisted thin-film densification
Müller, K.-H. (1986) · Journal of Applied Physics · doi:10.1063/1.336960 · Cited by 193
Properties of titanium oxide film prepared by reactive cathodic vacuum arc deposition
Takikawa, H., Matsui, T., Sakakibara, T., et al. (1999) · Thin Solid Films · doi:10.1016/s0040-6090(99)00054-1 · Cited by 131
Carlson, T. F., & Griffin, G. L. (1986) · The Journal of Physical Chemistry · doi:10.1021/j100280a087 · Cited by 103
Short-range order in ultrathin film titanium dioxide studied by Raman spectroscopy
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Cited by
Metal Oxide Thin Films for Advanced Photonic Applications
Stîngescu, M.-L., Șopronyi, M.-A., Antohe, Ș., & Scărișoreanu, N.-D. (2026) · Crystals · doi:10.3390/cryst16030164 · Cited by 2
“In contrast to the e-beam technique, magnetron sputtering can provide values higher than n = 2.24 at λ = 550 nm for TiO 2 films, even at room temperature [150].”
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Metadata
- Authors
- Zhao, Z., Tay, B. K., & Yu, G.
- Affiliations
- Nanyang Technological University (SG)
- Venue
- Applied Optics
- Publisher
- Optica Publishing Group
- Published
- 2004-02-20
- Volume
- 43
- Issue
- 6
- Pages
- 1281
- ISSN
- 0003-6935 (ISSN-L)
- 1539-4522
- OpenAlex
- W2025805916
- Cited by
- 60
- References
- 21
- Citations by year
- 2026: 4 · 2025: 1 · 2024: 2 · 2023: 2 · 2021: 8 · 2019: 1 · 2018: 2 · 2017: 3 · 2015: 3 · 2014: 2 · 2013: 7 · 2012: 4
- FWCI
- 2.44
- Type
- journal article
- Language
- en
- Open access
- closed
- Licence
- doi.org/10.1364/OA_License_v1#VOR (vor)
- opg.optica.org/policies/opg-tdm-policy.json (tdm)
- Locations
- Applied Optics (publishedVersion)
- PubMed (publishedVersion)
- Topics
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
- Physical Sciences › Energy › Renewable Energy, Sustainability and the Environment › TiO2 Photocatalysis and Solar Cells
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Vacuum and Plasma Arcs
- Keywords
- amorphous TiO2, thin films, filtered cathodic vacuum arc, room-temperature deposition, high refractive index, optical band gap, optical transmittance, stoichiometry, anatase crystallization, annealing, optical coatings
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- CoChat. (2026). Citation check: Room-temperature deposition of amorphous titanium dioxide thin film with high refractive index by a filtered cathodic vacuum arc technique. https://app.cochat.ai/papers/10.1364/ao.43.001281
- The paper
- Zhao, Z., Tay, B. K., & Yu, G. (2004). Room-temperature deposition of amorphous titanium dioxide thin film with high refractive index by a filtered cathodic vacuum arc technique. Applied Optics. https://doi.org/10.1364/ao.43.001281
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
