The DOI matches its Crossref record; 29 of the 29 references it cites were found in a registry or an index.
Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography
Open accessAbstract
The continuous shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical projection lithography process, generating circuit patterns that deviate significantly from the desired ones. Conventional resolution enhancement techniques (RETs) are facing critical challenges in compensating such increasingly severe distortion. In this paper, we adopt the approach of inverse lithography in the mask design, which is a branch of design methodology to treat it as an inverse mathematical problem. We focus on using pixel-based algorithms to design alternating phase-shifting masks with minimally distorted output, with the goal that the patterns generated should have high contrast and low dose sensitivity. This is achieved with a dynamic-programming-based initialization scheme to pre-assign phases to the layout when alternating phase-shifting masks are used. Pattern fidelity and worst case slopes are shown to improve with this initialization scheme, which are important for robustness considerations.
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Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149
Metadata
- Authors
- Chan, S. H., Wong, A. K., & Lam, E. Y.
- Affiliations
- University of Hong Kong (HK)
- Venue
- Optics Express
- Publisher
- Optica Publishing Group
- Published
- 2008-09-04
- Volume
- 16
- Issue
- 19
- Pages
- 14746
- ISSN
- 1094-4087 (ISSN-L)
- OpenAlex
- W2065950608
- Cited by
- 41
- References
- 29
- Citations by year
- 2026: 1 · 2024: 3 · 2023: 2 · 2022: 3 · 2021: 1 · 2020: 1 · 2014: 2 · 2013: 2 · 2012: 7
- FWCI
- 5.68
- Type
- journal article
- Language
- en
- Open access
- gold
- doi.org
- Locations
- Optics Express (publishedVersion)
- PubMed (publishedVersion)
- The HKU Scholars Hub (University of Hong Kong) (submittedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Advanced optical system design
- Physical Sciences › Engineering › Electrical and Electronic Engineering › VLSI and FPGA Design Techniques
- Keywords
- inverse lithography technology, phase-shifting masks, alternating phase-shifting masks, optical projection lithography, mask design, initialization scheme, dynamic programming, resolution enhancement techniques, pattern fidelity, dosage sensitivity, pattern distortion, inverse problems
- MeSH terms
- Algorithms, Image Interpretation, Computer-Assisted, Lasers, Lighting, Photography
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- Chan, S. H., Wong, A. K., & Lam, E. Y. (2008). Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography. Optics Express. https://doi.org/10.1364/oe.16.014746
