The DOI matches its Crossref record; 3 of the 3 references it cites were found in a registry or an index.
120 nm resolution and 55 nm structure size in STED-lithography
Open accessAbstract
Two-photon direct laser writing (DLW) lithography is limited in the achievable structure size as well as in structure resolution. Adding stimulated emission depletion (STED) to DLW allowed overcoming both restrictions. We now push both to new limits. Using visible light for two-photon DLW (780 nm) and STED (532 nm), we obtain lateral structure sizes of 55 nm, a Sparrow limit of around 100 nm and we present two clearly separated lines spaced only 120 nm apart. The photo-resist used in these experiments is a mixture of tri- and tetra-acrylates and 7-Diethylamino-3-thenoylcoumarin as a photo-starter which can be readily quenched via STED.
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Cites
Finer features for functional microdevices
Kawata, S., Sun, H.-B., Tanaka, T., & Takada, K. (2001) · Nature · doi:10.1038/35089130 · Cited by 2,871
Three-dimensional microfabrication with two-photon-absorbed photopolymerization
Maruo, S., Nakamura, O., & Kawata, S. (1997) · Optics Letters · doi:10.1364/ol.22.000132 · Cited by 1,952
Three-dimensional optical data storage in refractive media by two-photon point excitation
Strickler, J. H., & Webb, W. W. (1991) · Optics Letters · doi:10.1364/ol.16.001780 · Cited by 627
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Metadata
- Authors
- Wollhofen, R., Katzmann, J., Hrelescu, C., Jacak, J., & Klar, T. A.
- Venue
- Optics Express
- Publisher
- Optica Publishing Group
- Published
- 2013-04-25
- Volume
- 21
- Issue
- 9
- Pages
- 10831
- ISSN
- 1094-4087 (ISSN-L)
- OpenAlex
- W2048905346
- Cited by
- 192
- References
- 3
- FWCI
- 7.97
- Type
- journal article
- Language
- en
- Open access
- gold
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- Wollhofen, R., Katzmann, J., Hrelescu, C., Jacak, J., & Klar, T. A. (2013). 120 nm resolution and 55 nm structure size in STED-lithography. Optics Express. https://doi.org/10.1364/oe.21.010831
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