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Conduction Mechanism of Valence Change Resistive Switching Memory: A Survey

Open access
Lim, Ee, Ismail, Razali·2015·Electronics

Abstract

Resistive switching effect in transition metal oxide (TMO) based material is often associated with the valence change mechanism (VCM). Typical modeling of valence change resistive switching memory consists of three closely related phenomena, i.e., conductive filament (CF) geometry evolution, conduction mechanism and temperature dynamic evolution. It is widely agreed that the electrochemical reduction-oxidation (redox) process and oxygen vacancies migration plays an essential role in the CF forming and rupture process. However, the conduction mechanism of resistive switching memory varies considerably depending on the material used in the dielectric layer and selection of electrodes. Among the popular observations are the Poole-Frenkel emission, Schottky emission, space-charge-limited conduction (SCLC), trap-assisted tunneling (TAT) and hopping conduction. In this article, we will conduct a survey on several published valence change resistive switching memories with a particular interest in the I-V characteristic and the corresponding conduction mechanism.

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Metadata

Authors
Lim, E., & Ismail, R.
Venue
Electronics
Publisher
MDPI AG
Published
2015-09-09
Volume
4
Issue
3
Pages
586-613
ISSN
2079-9292 (ISSN-L)
OpenAlex
W1678748398
Cited by
829
References
6
FWCI
14.11
Type
journal article
Language
en
Open access
gold

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CoChat. (2026). Citation check: Conduction Mechanism of Valence Change Resistive Switching Memory: A Survey. https://app.cochat.ai/papers/10.3390/electronics4030586
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Lim, E., & Ismail, R. (2015). Conduction Mechanism of Valence Change Resistive Switching Memory: A Survey. Electronics. https://doi.org/10.3390/electronics4030586

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