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Cited by 6Optical Coatings and GratingsAdvancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Physics and technology development of multilayer EUV reflective optics

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Louis, Eric·2022
DOI 10.3990/1.9789090271637
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Abstract

The work described in this thesis is part of the FOM Industrial Partnership Programme I10 ('XMO') and I23 ('CP3E') which have been, respectively still are carried out under contract with Carl Zeiss SMT GmbH, Oberkochen, and ASML, Veldhoven, and the 'Stichting voor Fundamenteel Onderzoek der Materie (FOM)', the latter being

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  • Reflective components with efficiency up to ~70% are routinely achieved owing to multilayer coatings.

    “Owing to multilayer coatings, reflective components with efficiency up to ~70% are routinely achieved 20-22 .”

    From Extreme ultraviolet lithography (2024) · cites this paper as [22]

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  180. Louis, E., Bijkerk, F., Shmaenok, L., Voorma, H.J., van der Wiel, M.J., Schlatmann, R., Ver- hoeven, J., van der Drift, E.W.J.M., Romijn, J., Rousseeuw, B.A.C., Voß, F., Désor, R. and Nikolaus, B. "Soft x-ray projection lithography using a high repetition rate laser-induced x-ray source for sub-100 nanometer lithography processes." Microelectronic Engineering 21 (1993) 67-70 The author contributed significantly to the following journal publications and con- ference proceedings:
  181. Van den Boogaard, A.J.R., van Goor, F., Louis, E. and Bijkerk, F. "Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection." Optics Letters 37 (2) (2012) 160-162
  182. Makhotkin, I., Zoethout, E., Louis, E., Yakunin, S.N., Muellender, S. and Bijkerk, F. "Wave- length selection for multilayer coatings for the lithography generation beyond EUVL." Proc. SPIE Advanced Lithography SPIE 8322, (2012)
  183. Van den Boogaard, A.J.R., Louis, E., Zoethout, E., Goldberg, K.A. and Bijkerk, F. "Characteri- zation of Mo/Si multilayer growth on stepped topographies." Journal of Vacuum Science and Technology B 29 (5) (2011)
  184. Loch, R.A., Dubrouil, A., Sobierajski, R., Descamps, D., Fabre, B., Lidon, P., Van de Kruijs, R.W.E., Boekhout, F., Gullikson, E.M., Gaudin, J., Louis, E., Bijkerk, F., Mével, E., Petit, S., Constant, E. and Mairesse, Y. "Phase characterization of the reflection on an extreme UV mul- tilayer: comparison between attosecond metrology and standing wave measurements." Optics Letters 36 (17) (2011)
  185. Van den Boogaard, A.J.R., Louis, E., Zoethout, E., Müllender, S. and Bijkerk, F. "Surface mor- phology of Kr+-polished amorphous Si layers." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 28 (4) (2010) 552-558
  186. Van den Boogaard, A.J.R., Louis, E., Goldberg, K.A., Mochi, I. and Bijkerk, F. "EUV-multilayers on grating-like topographies." Proc. SPIE Advanced Lithography, 7636 (2010)
  187. Van den Boogaard, A.J.R., Louis, E., van Goor, F. and Bijkerk, F. "Optical Element for full spectral purity from IR-generated EUV light sources." Proc. SPIE Advanced Lithography 7271 (2009)
  188. Tsarfati, T., Zoethout, E., Louis, E., van de Kruijs, R.W.E., Yakshin, A., Muellender, S. and Bijkerk, F. "Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the Extreme UV." Proc. SPIE Advanced Lithography 7271 (2009)
  189. Chen, J., Louis, E., Bijkerk, F., Lee, C.J., Wormeester, H., Kunze, R., Schmidt, H., Schneider, D. and Moors, R. "Ellipsometric and surface acoustic wave sensing of carbon contamination of EUV optics." Proc. SPIE Advanced Lithography 7271 (2009)
  190. Van den Boogaard, A.J.R., Louis, E., Zoethout, E., Alonso van der Westen, S. and Bijkerk, F. "Smoothing Properties of Single-and multilayer coatings, a method to smoothen substrates." Proc. SPIE Emerging Lithograpic Technologies 6921, (2008)
  191. Nedelcu, I., van de Kruijs, R.W.E., Yakshin, A., Louis, E., Muellender, S. and Bijkerk, F. "Sub- strate recovery layers for EUVL optics: effects on multilayer reflectivity and surface rough- ness." Proc. SPIE EUV Optics 6517 (2007)
  192. Zoethout, E., Suter, P., van de Kruijs, R.W.E., Yakshin, A.E., Louis, E., Bijkerk, F., Enkisch, H. and Muellender, S. "Subatomic Accuracy in EUVL Multilayer Coatings." Proc. SPIE Emerging Lithographic Technologies 5374 (2004)
  193. Koster, N., Mertens, B., Jansen, R., van de Runstraat, A., Stietz, F., Wedowski, M., Meiling, H., Klein, R., Gottwald, A., Scholze, F., Visser, M., Kurt, R., Zalm, P., Louis, E. and Yakshin, A.E. "Molecular contamination mitigation in EUVL by environmental control." Microelectronic Engineering 61-62 (2002) pp. 65-76
  194. Abdali, S., Gerward, L., Yakshin, A.E., Louis, E. and Bijkerk, F. "Determination of Crystalliza- Publications tion as a Function of Mo layer thickness in Mo/Si multilayers." Materials Research Bulletin 37 (2002) 279-289
  195. Stuik, R., Louis, E., Yakshin, A.E., Gorts, P.C., Maas, E.L.G., Bijkerk, F., Schmitz, D., Scholze, F., Ulm, G. and Haidl, M. "Peak and Integrated reflectivity, wavelength and gamma optimiza- tion of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography." Journal of Vacuum Science & Technology B 17 (6) (1999) 2998-3002
  196. Voorma, H.-J., Louis, E., Koster, N.B. and Bijkerk, F. "Temperature induced diffusion in Mo/Si multilayer mirrors." Journal of Applied Physics 83 (9) (1998) 4700-4708
  197. Voorma, H.-J., Louis, E., Koster, N.B., Bijkerk, F., Zijlstra, T., de Groot, L.E.M., Rousseeuw, B.A.C., Romijn, J., van der Drift, E.W.J.M. and Friedrich, J. "Fabrication and analysis of Ex- treme Ultra-violet reflection masks with patterned W/C absorber bi-layers." Journal of Vacuum Science & Technology B 15 (2) (1997) 293-298
  198. Voorma, H.J., Louis, E., Bijkerk, F. and Abdali, S. "Angular and energy dependence of ion bom- bardment of Mo/Si multilayers." Journal of Applied Physics 82 (4) (1997) 1876-1881
  199. Voorma, H.-J., Louis, E., Koster, N.B., Bijkerk, F. and Spiller, E. "Characterization of multilay- ers by Fourier analysis of x-ray reflectivity." Journal of Applied Physics 81 (9) (1997)
  200. Shmaenok, L.A., Yu.Ya. Platonov, Salashchenko, N.N., Sorokin, A.A., Simanovskii, D.M., Gol- ubev, A.V., Belik, V.P., Bobashev, S.V., Bijkerk, F., Louis, E., Meijer, F.G., Etlicher, B. and Grudsky, A.Y. "Multilayer EUV/x-ray polychromators for plasma diagnostics." Journal of Elec- tron Spectroscopy and Related Phenomena 80 (1996) 259-262

200 of 207 shown

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Authors
Louis, E.
Corresponding author
Louis, Eric
Publisher
University Library/University of Twente
Published
2012-11-23
DOI
10.3990/1.9789090271637
OpenAlex
W99709937
Cited by
6
References
0
Citations by year
2024: 1 · 2020: 1 · 2018: 2 · 2014: 1 · 2013: 1
Type
dissertation
Language
en
Open access
Locations
  • DIFFER: Publications (submittedVersion, other-oa)
  • University of Twente Research Information (submittedVersion, other-oa)
Funders
Nederlandse Organisatie voor Wetenschappelijk Onderzoek
Topics
  • Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
  • Physical Sciences › Physics and Astronomy › Radiation › Advanced X-ray Imaging Techniques
Keywords
extreme ultraviolet optics, EUV mirrors, multilayer films, EUV lithography

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