The DOI matches its Crossref record; 294 of the 304 references it cites were found in a registry or an index.
Material science and device physics in SiC technology for high-voltage power devices
Open accessAbstract
Power semiconductor devices are key components in power conversion systems. Silicon carbide (SiC) has received increasing attention as a wide-bandgap semiconductor suitable for high-voltage and low-loss power devices. Through recent progress in the crystal growth and process technology of SiC, the production of medium-voltage (600–1700 V) SiC Schottky barrier diodes (SBDs) and power metal–oxide–semiconductor field-effect transistors (MOSFETs) has started. However, basic understanding of the material properties, defect electronics, and the reliability of SiC devices is still poor. In this review paper, the features and present status of SiC power devices are briefly described. Then, several important aspects of the material science and device physics of SiC, such as impurity doping, extended and point defects, and the impact of such defects on device performance and reliability, are reviewed. Fundamental issues regarding SiC SBDs and power MOSFETs are also discussed.
Overview
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Claims other papers make about this one
Each is checked against this paper’s own text: does it say what the citing paper says it does?
The source backs part of the claim, not all of it — or backs it for a different population, condition or comparison.
In the citing paper
“To address these challenges, Wide-Bandgap (WBG) semiconductors, including silicon carbide (SiC) and gallium nitride (GaN), have emerged as materials that enable high-voltage, high-temperature, and high-speed switching owing to their Wide-Bandgap, nearly tenfold higher critical electric field, and superior thermal conductivity [1,2].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe source backs part of the claim, not all of it — or backs it for a different population, condition or comparison.
In the citing paper
“Accordingly, WBG semiconductors are positioned to overcome key constraints of Si technologies in electric vehicles, aerospace, and renewable energy [2,3].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe source backs part of the claim, not all of it — or backs it for a different population, condition or comparison.
In the citing paper
“SiC and GaN can operate under high-voltage and high-temperature conditions thanks to their Wide-Bandgaps (2.9-3.4 eV) and critical electric field strengths (2.2-4 MV cm -1 ), outperforming conventional Si in these regimes [2-5].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe source backs part of the claim, not all of it — or backs it for a different population, condition or comparison.
In the citing paper
“SiC exhibits high thermal conductivity (3.3-4.9 W cm -1 K -1 ; approximately 330-490 W m -1 K -1 ), enabling superior heat removal.”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe source backs part of the claim, not all of it — or backs it for a different population, condition or comparison.
In the citing paper
“For substrates, SiC (in GaNon-SiC) offers a significant thermal advantage, exhibiting high thermal conductivity of 3.3-4.9 W cm -1 K -1 (approximately 330-490 W m -1 K -1 ).”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measured
The source backs part of the claim, not all of it — or backs it for a different population, condition or comparison.
In the citing paper
“Among WBG materials, GaN poses greater thermalmanagement challenges than SiC due to its relatively low thermal conductivity [1,2,29].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe source backs part of the claim, not all of it — or backs it for a different population, condition or comparison.
In the citing paper
“While the advantages of WBG semiconductors such as SiC and GaN are well established, ensuring their long-term reliability and accurately forecasting their operational lifespan remain critical challenges [1,2,59].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe source backs part of the claim, not all of it — or backs it for a different population, condition or comparison.
In the citing paper
“while deep-level point defects (such as the Z1/2 and EH6/7 centers) act as carrier recombination centers that shorten carrier lifetime [2].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe source backs part of the claim, not all of it — or backs it for a different population, condition or comparison.
In the citing paper
“In SiC, BPDs and threading edge dislocations (TEDs) shorten carrier lifetime and raise leakage current [2], while gate-oxide traps and V th instability are additional concerns [2,64].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe cited source says what the claim attributes to it.
In the citing paper
“Of these, channel and JFET resistances dominate at lower voltage ratings, whereas the drift layer becomes the main contributor at higher voltages (above 3 kV) [2].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
The check wasn’t confident either way, so it gives no verdict — never disputed.
In the citing paper
“GaN's thermal conductivity decreases with temperature [2,6].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe check wasn’t confident either way, so it gives no verdict — never disputed.
In the citing paper
“whereas GaN faces challenges in thermal dissipation and reliability due to its lower thermal conductivity and heterojunction architecture [1,2].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe check wasn’t confident either way, so it gives no verdict — never disputed.
In the citing paper
“Silver-sintered joints provide excellent electrical/thermal conductivity and high-temperature stability but face electromigration (EM) and cost challenges [2,30-35].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe check wasn’t confident either way, so it gives no verdict — never disputed.
In the citing paper
“GaN-on-Diamond can further reduce channel temperature owing to the diamond substrate's thermal conductivity exceeding 700 W m -1 K -1 , thereby enhancing both performance and lifetime [1,2,28,29].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe check wasn’t confident either way, so it gives no verdict — never disputed.
In the citing paper
“Copper-sintered joints offer comparable performance with improved EM resistance, though oxidation control and process windows remain nontrivial [1-3,31,36-38].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe check wasn’t confident either way, so it gives no verdict — never disputed.
In the citing paper
“In parallel, silver and copper microparticle sintering and transient liquid-phase bonding are recognized as reliable assembly approaches that combine excellent electrical/thermal conductivity with high-temperature stability [2,3,30] (Figure 2).”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe check wasn’t confident either way, so it gives no verdict — never disputed.
In the citing paper
“TBR is a significant component of the overall thermal resistance in GaN-on-SiC, where AlN nucleation and defect layers elevate interface resistance.”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measuredThe check wasn’t confident either way, so it gives no verdict — never disputed.
In the citing paper
“To mitigate TBR, surface-activated bonding (SAB) has emerged as a promising interface technology, enabling high-quality interfaces and thermal boundary conductance (TBC) values approaching 230 MW m -2 K -1 [1,2,39].”
From Thermal Management of Wide-Bandgap Power Semiconductors: Strategies and Challenges in SiC and GaN Power Devices (2025) · cites this paper as [2]
Experimental — accuracy not yet measured
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Citations
Cites
Physics of Semiconductor Devices
Sze, S. M., & Ng, K. K. (2006) · doi:10.1002/0470068329 · Cited by 14,627
Physics of Semiconductor Devices
Colinge, J.-P., & Colinge, C. (2002) · Kluwer Academic Publishers eBooks · doi:10.1007/b117561 · Cited by 14,074
Semiconductor Material and Device Characterization
SCHRODER, D. K. (2005) · Wiley eBooks · doi:10.1002/0471749095 · Cited by 7,472
Semiconductor Devices: Physics and Technology
Sze, S. M. (1985) · Cited by 4,098
Li, M., & Li, M. (2005) · Kluwer Academic Publishers eBooks · doi:10.1007/0-306-47622-3_5 · Cited by 3,973
Deep-level transient spectroscopy: A new method to characterize traps in semiconductors
Lang, D. V. (1974) · Journal of Applied Physics · doi:10.1063/1.1663719 · Cited by 3,741
Fundamentals of Power Semiconductor Devices
Baliga, B. J. (2008) · Springer eBooks · doi:10.1007/978-0-387-47314-7 · Cited by 2,241
Hull, D., & Bacon, D. J. (2011) · Materials Today · doi:10.1016/s1369-7021(11)70217-6 · Cited by 1,504
(2001) · Elsevier eBooks · doi:10.1016/b978-0-7506-4681-9.x5000-7 · Cited by 1,417
Principles of Power Electronics
Kassakian, J. G., Perreault, D. J., Verghese, G. C., & Schlecht, M. F. (2023) · Cambridge University Press eBooks · doi:10.1017/9781009023894 · Cited by 1,395
Research works printed but not linked: 16
- Dmitriev, 1983, Sov. Phys. Semicond., 17, 686
- Greulich-Weber, 1997, Phys. Status Solidi A, 162, 95, 10.1002/1521-396X(199707)162:1<95::AID-PSSA95>3.0.CO%3B2-X · DOI
- Schöner, 1996, Inst. Phys. Conf. Ser., 142, 493
- Sugiyama, 1996, Inst. Phys. Conf. Ser., 142, 489
- Larkin, 1997, Phys. Status Solidi B, 202, 305, 10.1002/1521-3951(199707)202:1<305::AID-PSSB305>3.0.CO%3B2-9 · DOI
- Glass, 1997, Phys. Status Solidi B, 202, 149, 10.1002/1521-3951(199707)202:1<149::AID-PSSB149>3.0.CO%3B2-M · DOI
- Powell, 1997, Phys. Status Solidi B, 202, 529, 10.1002/1521-3951(199707)202:1<529::AID-PSSB529>3.0.CO%3B2-E · DOI
- Dalibor, 1997, Phys. Status Solidi A, 162, 199, 10.1002/1521-396X(199707)162:1<199::AID-PSSA199>3.0.CO%3B2-0 · DOI
- Itoh, 1996, Inst. Phys. Conf. Ser., 142, 685
- Itoh, 1997, Phys. Status Solidi A, 162, 389, 10.1002/1521-396X(199707)162:1<389::AID-PSSA389>3.0.CO%3B2-X · DOI
- Cooper, 1997, Phys. Status Solidi A, 162, 305, 10.1002/1521-396X(199707)162:1<305::AID-PSSA305>3.0.CO%3B2-7 · DOI
- Afanasev, 1997, Phys. Status Solidi A, 162, 321, 10.1002/1521-396X(199707)162:1<321::AID-PSSA321>3.0.CO%3B2-F · DOI
- Ouisse, 1997, Phys. Status Solidi A, 162, 339, 10.1002/1521-396X(199707)162:1<339::AID-PSSA339>3.0.CO%3B2-G · DOI
- Dhar, 2010, J. Appl. Phys., 108, 10.1063/1.3484043 · DOI
- Zetterling, 2002, 10.1049/PBEP002E · DOI
- Special Issue on Silicon Carbide Devices and Technology, 2008, IEEE Trans. Electron Devices, 55
Cited by
Sorted by citations
Items 701–800 of 1,000
Bakar, A., Hussain, S., Mustafa, G., Ahmad, R. A., Quader, A., Imran, M., & Shaaban, I. A. (2024) · Computational Condensed Matter · doi:10.1016/j.cocom.2024.e00911 · Cited by 4
1.43 kV 4H-SiC Lateral Junction Barrier Schottky Diode With High BFOM (390 MW/cm2)
Liu, L., Wang, J., Ren, N., Guo, Q. W., & Sheng, K. (2024) · IEEE Electron Device Letters · doi:10.1109/led.2024.3404041 · Cited by 4
Maitani, S., Sinmyo, R., Ishii, T., & Yoza, K. (2024) · Journal of Physics Communications · doi:10.1088/2399-6528/ad5410 · Cited by 4
Vertical-Channel Fin-SiC (VC Fin-SiC) With Partially Highly Doped JFET for 3.3-kV Applications
Suematsu, T., Suto, T., Watanabe, N., Mori, Y., Shimizu, H., Tanaka, Y., & Shima, A. (2024) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2024.3421181 · Cited by 4
Poly-SiC Characterization and Properties for SmartSiC™
Biard, H., Drouin, A., Schwarzenbach, W., Alassaad, K., Coeurdray, L., Chagneux, V., Coche, M., Ledrappier, S., Monnoye, S., Mank, H., et al. (2024) · Materials science forum · doi:10.4028/p-qdrkz7 · Cited by 4
Roccaforte, F., Vivona, M., Greco, G., Lyle, L. A. M., Sarkar, B., & Porter, L. M. (2024) · Elsevier eBooks · doi:10.1016/b978-0-323-96027-4.00033-4 · Cited by 4
Hara, M., Tanaka, H., Kaneko, M., & Kimoto, T. (2025) · Journal of Applied Physics · doi:10.1063/5.0258366 · Cited by 4
Self-citationDislocation analysis in p-type 4H-SiC: Etching morphologies and electronic properties
Tong, Z., Yang, Y., Huang, Y., Yang, D., & Pi, X. (2025) · Journal of Applied Physics · doi:10.1063/5.0228729 · Cited by 4
Matsuura, H. (2015) · Japanese Journal of Applied Physics · doi:10.7567/jjap.54.044301 · Cited by 4
Electrical Stability Impact of Gate Oxide in Channel Implanted SiC NMOS and PMOS Transistors
Idris, M. I., Weng, M. H., Chan, H. K., Murphy, A. E., Smith, D. A., Young, R. A. R., Ramsay, E. P., Clark, D. T., Wright, N. G., & Horsfall, A. B. (2017) · Materials science forum · doi:10.4028/www.scientific.net/msf.897.513 · Cited by 4
Jia, Y., Lv, H. L., Tang, X., Song, Q. W., Zhang, Y., & Zhang, Y. M. (2018) · Materials science forum · doi:10.4028/www.scientific.net/msf.924.449 · Cited by 4
Jia, Y., Lv, H., Tang, X.-Y., Han, C., Song, Q., Zhang, Y., Zhang, Y., Dimitrijev, S., & Han, J. (2018) · Journal of Crystal Growth · doi:10.1016/j.jcrysgro.2018.09.029 · Cited by 4
Doi, T., Takeuchi, W., Shibayama, S., Sakashita, M., Taoka, N., Nakatsuka, O., & Zaima, S. (2019) · Japanese Journal of Applied Physics · doi:10.7567/1347-4065/aafb54 · Cited by 4
Fabrication of 4H-SiC PiN diodes on substrate grown by HTCVD method
Tokuda, Y., Uehigashi, H., Murata, K., & Tsuchida, H. (2019) · Japanese Journal of Applied Physics · doi:10.7567/1347-4065/ab6419 · Cited by 4
Gate Current and Snapback of 4H-SiC Thyristors on N+ Substrate for Power-Switching Applications
Lee, H., Seok, O., Kim, T., & Ha, M.-W. (2020) · Electronics · doi:10.3390/electronics9020332 · Cited by 4
Monte Carlo simulations of electron transport in 4H-SiC using the DFT-calculated density of states
Woźny, J., Kovalchuk, A., Lisik, Z., Podgórski, J., Bugalski, P., Kubiak, A., & Ruta, Ł. (2021) · Journal of Computational Electronics · doi:10.1007/s10825-021-01658-y · Cited by 4
Probing the surface potential of SiO2/4H-SiC(0001) by terahertz emission spectroscopy
Nakanishi, H., Nishimura, T., Kawayama, I., Tonouchi, M., Hosoi, T., Shimura, T., & Watanabe, H. (2021) · Journal of Applied Physics · doi:10.1063/5.0058962 · Cited by 4
Shiojima, K., Kawasumi, Y., Horikiri, F., Narita, Y., Fukuhara, N., Mishima, T., & Shinohe, T. (2021) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/ac2917 · Cited by 4
Iguchi, H., Horita, M., & Suda, J. (2022) · Applied Physics Express · doi:10.35848/1882-0786/ac7433 · Cited by 4
Tanaka, H., Kimoto, T., & Mori, N. (2022) · Journal of Applied Physics · doi:10.1063/5.0090308 · Cited by 4
Self-citationLinear dependence of dislocation pattern size on the imprint width and scratch width on (0001) GaN
Ishikawa, Y., Sugawara, Y., Yao, Y., Takeda, H., Aida, H., & Tadatomo, K. (2022) · Journal of Physics D Applied Physics · doi:10.1088/1361-6463/ac96fd · Cited by 4
Zhu, S., Liu, T., Salemi, A., Jin, M., White, M. H., Sheridan, D. C., & Agarwal, A. K. (2022) · IEEE Workshop on Wide Bandgap Power Devices and Applications · doi:10.1109/wipda56483.2022.9955263 · Cited by 4
Murakami, Y., Nagamizo, S., Tanaka, H., & Mori, N. (2022) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/acaed2 · Cited by 4
Role of Ti and W in the Ni-based ohmic contacts to n-type 4H-SiC
Ge, N., Wan, C., Jin, Z.-P., & Xu, H. (2023) · Journal of Crystal Growth · doi:10.1016/j.jcrysgro.2023.127084 · Cited by 4
Photoluminescence (PL) Spectroscopy
Yoshikawa, M. (2023) · Springer eBooks · doi:10.1007/978-3-031-19722-2_3 · Cited by 4
Study of Atmospheric Pressure Plasma Temperature Based on Silicon Carbide Etching
Xu, S., Yuan, J., Zhou, J., Cheng, K., & Gan, H. (2023) · Micromachines · doi:10.3390/mi14050992 · Cited by 4
Weger, M., Biermeier, D., Feil, M. W., Cottom, J. P., Bockstedte, M., & Gregor Pobegen, A. (2023) · Materials science forum · doi:10.4028/p-050q7w · Cited by 4
Matacena, I., Maresca, L., Riccio, M., Irace, A., Breglio, G., & Daliento, S. (2023) · e-Prime - Advances in Electrical Engineering Electronics and Energy · doi:10.1016/j.prime.2023.100251 · Cited by 4
Abe, T., Yamagishi, Y., & Cho, Y. (2018) · Japanese Journal of Applied Physics · doi:10.7567/jjap.57.08nb12 · Cited by 4
Yamagishi, Y., & Cho, Y. (2018) · Microelectronics Reliability · doi:10.1016/j.microrel.2018.07.058 · Cited by 4
Satoh, T., & Usui, M. (2020) · Journal of Materials Science Materials in Electronics · doi:10.1007/s10854-020-03211-2 · Cited by 4
Doi, T., Shibayama, S., Sakashita, M., Kojima, K., Shimizu, M., & Nakatsuka, O. (2021) · Applied Physics Express · doi:10.35848/1882-0786/ac407f · Cited by 4
Kink Migration along 30° Si‐Core Partial Dislocations in 4H‐SiC
Yakimov, E. E., & Yakimov, E. B. (2022) · physica status solidi (a) · doi:10.1002/pssa.202200119 · Cited by 4
Lattice location of implanted transition metals in 3C–SiC
Costa, Â., Wahl, U., Correia, J. G., David-Bosne, E., Amorim, L. M., Augustyns, V., Silva, D. J., da Silva, M. R., Bharuth‐Ram, K., & Pereira, L. M. C. (2017) · Journal of Physics D Applied Physics · doi:10.1088/1361-6463/aa6878 · Cited by 4
Comparative study on thermal robustness of GaN and AlGaN/GaN MOS devices with thin oxide interlayers
Nozaki, M., Terashima, D., Yamada, T., Yoshigoe, A., Hosoi, T., Shimura, T., & Watanabe, H. (2019) · Japanese Journal of Applied Physics · doi:10.7567/1347-4065/ab0ad2 · Cited by 4
Annealing-Induced Changes in the Nature of Point Defects in Sublimation-Grown Cubic Silicon Carbide
Schöler, M., Brecht, C., & Wellmann, P. J. (2019) · Materials · doi:10.3390/ma12152487 · Cited by 4
Oxide Traps Probed by Transient Capacitance Measurements on Lateral SiO2/4H-SiC MOSFETs
Fiorenza, P., Iucolano, F., Saggio, M., & Roccaforte, F. (2018) · Materials science forum · doi:10.4028/www.scientific.net/msf.924.285 · Cited by 4
Intrinsic and Extrinsic Electrically Active Point Defects in SiC
Großner, U., Grillenberger, J., Woerle, J., Bathen, M. E., & Müting, J. (2021) · doi:10.1002/9783527824724.ch6 · Cited by 4
Fu, H.-S., Li, Q., Zhai, D., Wang, Y., & Lu, J. (2024) · Journal of Applied Physics · doi:10.1063/5.0238784 · Cited by 3
Numerical Simulation Analysis of Laser Ultrasonic Detection of Defects in Silicon Carbide
Yin, Y. Q., Xia, J., Nie, H., Yao, B., Sun, D., Ma, L., Li, R., Li, Z., & Zhang, B. (2025) · Crystals · doi:10.3390/cryst15020125 · Cited by 3
Zhang, Y., Tang, X.-Y., Yuan, H., Guo, J., Yang, H., Zhou, Y., Du, F., Liu, K., Zhang, Z., Wang, C., et al. (2025) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2025.3556053 · Cited by 3
Ultra-Low Specific on-Resistance Ldmos With Both Super Junction And Super Field Plate Techniques
Wang, X., Kan, H., Guo, H., Li, Y., & Zhang, C. (2025) · International Conference on Mechatronics, Robotics, and Artificial Intelligence (MRAI) · doi:10.1109/mrai65197.2025.11135628 · Cited by 3
Cheng, M., Jiang, X., Zhang, H., Pi, X., Yang, D., & Deng, T. (2025) · Applied Physics Letters · doi:10.1063/5.0298852 · Cited by 3
Reliability Analysis for Commercial SiC MOSFETs in Single Pulse and Repetitive Surge Current Test
Wu, H., Jiang, C., Guo, Q. W., Ren, N., Zhu, Z., Wu, B., & Qi, X. (2020) · Prognostics and System Health Management Conference · doi:10.1109/phm-jinan48558.2020.00093 · Cited by 3
3D structures for silicon carbide transistors utilising Al 2 O 3 as a gate dielectric
Idris, M. I., & Horsfall, A. B. (2021) · Materials Science in Semiconductor Processing · doi:10.1016/j.mssp.2021.105727 · Cited by 3
500 °C high-temperature reliability of Ni/Nb ohmic contact on n-type 4H-SiC
Cuong, V. V., Sato, T., Miyazaki, T., Meguro, T., Ishikawa, S., Maeda, T., Sezaki, H., & Kuroki, S.-I. (2021) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/ac4391 · Cited by 3
Reliable WBG Devices Packaging by Forming Nano-Gradient Structures on Silver-Plated Substrates
Zhang, B., Zhao, Z., Liu, Y., Ma, H., Shi, C., & Mei, Y. (2024) · IEEE Transactions on Components Packaging and Manufacturing Technology · doi:10.1109/tcpmt.2024.3394526 · Cited by 3
Gu, N., Yang, J., & Song, H. (2024) · Materials Science in Semiconductor Processing · doi:10.1016/j.mssp.2024.108962 · Cited by 3
Generating stacking faults in 4H–SiC junction transistor by indentation and forward biasing
Zhang, T., & Kitai, A. H. (2024) · AIP Advances · doi:10.1063/5.0234657 · Cited by 3
X-Ray Performance of SiC NPN Radiation Detector
Wang, J., Zhou, L., Chen, L., Zhang, S., Wang, F., Fan, T., Chen, Z., Bai, S., & Ouyang, X. (2024) · Micromachines · doi:10.3390/mi16010002 · Cited by 3
Arrizabalaga, A., Álvarez, G., Tonicello, F., Fernández, A., & Massetti, S. (2025) · IEEE Transactions on Aerospace and Electronic Systems · doi:10.1109/taes.2025.3557768 · Cited by 3
Zhang, H., Nie, M., Dong, Q., Liu, H., Pengfei, J., Li, Z., & Fang, Y. (2025) · Micromachines · doi:10.3390/mi16111192 · Cited by 3
Rao, G. P., Saritha, B., Lenka, T. R., Lenka, T. R., & Nguyen, H. P. T. (2025) · Micro and Nanostructures · doi:10.1016/j.micrna.2025.208412 · Cited by 3
Effect of a halogen-based precursor on dopant incorporation in 3C-SiC film epitaxy
Negri, M., Bosi, M., Orsi, D., Rimoldi, T., Attolini, G., Buffagni, E., Ferrari, C., Cristofolini, L., & Salviati, G. (2017) · Journal of Materials Science · doi:10.1007/s10853-017-1164-9 · Cited by 3
Preparation of Ni Nano-particle by Rotary Chemical Vapor Deposition
Nakakura, S., Katsui, H., & Goto, T. (2017) · Journal of the Japan Society of Powder and Powder Metallurgy · doi:10.2497/jjspm.64.677 · Cited by 3
Sharma, Y. (2018) · InTech eBooks · doi:10.5772/intechopen.79487 · Cited by 3
Tokuda, Y., Kamata, I., Hoshino, N., & Tsuchida, H. (2019) · Japanese Journal of Applied Physics · doi:10.7567/1347-4065/ab4fac · Cited by 3
Ma, G., Zhang, Y., Li, H., Liu, C., Qi, C., Wei, Y., Wang, T., Dong, S., & Huo, M. (2019) · IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) · doi:10.1109/ipfa47161.2019.8984862 · Cited by 3
Effects of Basal Plane Defects on the Performance of Voltage Source Converters
Lachichi, A., Mawby, P., & Ran, L. (2019) · IEEE Workshop on Wide Bandgap Power Devices and Applications · doi:10.1109/wipda46397.2019.8998796 · Cited by 3
Challenges in Extremely Low Specific On-Resistance with SiC SJ-VMOSFETs
Masuda, T., Saito, Y., Hatayama, T., Michikoshi, H., Mikamura, Y., & Harada, S. (2020) · Materials science forum · doi:10.4028/www.scientific.net/msf.1004.758 · Cited by 3
Dependence of humidity-stress impact on passivation film for edge termination area in 4H-SiC diodes
Matsushima, H., Mori, Y., Shima, A., & Iwamuro, N. (2020) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/abb719 · Cited by 3
Song, J., Ohta, A., Hoshii, T., Wakabayashi, H., Tsutsui, K., & Kakushima, K. (2021) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/abdf7c · Cited by 3
Yamasue, K., & Cho, Y. (2021) · Microelectronics Reliability · doi:10.1016/j.microrel.2021.114284 · Cited by 3
The Origin and Formation Mechanism of an Inclined Line‐like Defect in 4H‐SiC Epilayers
Karhu, R., Ghezellou, M., & Ul‐Hassan, J. (2022) · physica status solidi (b) · doi:10.1002/pssb.202100512 · Cited by 3
Suo, H., Eto, K., Osawa, H., Kato, T., & Okumura, H. (2022) · Journal of Crystal Growth · doi:10.1016/j.jcrysgro.2022.126876 · Cited by 3
Komatsu, N., Ohmoto, M., Uemoto, M., & Ono, T. (2022) · Journal of Applied Physics · doi:10.1063/5.0102472 · Cited by 3
Demonstration of an 1200V/20A 4H-SiC Multi-Step Trenched Junction Barrier Schottky Diode
Yuan, J., Guo, F., Wang, K., Liu, N., Wu, C., & Yang, B. (2023) · China International Forum on Solid State Lighting & International Forum on Wide Bandgap Semiconductors China (SSLChina: IFWS) · doi:10.1109/sslchinaifws57942.2023.10071062 · Cited by 3
Li, L., He, S., Ruan, H., He, S., & Guo, D. (2023) · Surfaces and Interfaces · doi:10.1016/j.surfin.2023.103201 · Cited by 3
Yuan, J., Cheng, Z., Guo, F., Wang, K., Chen, W., Wu, Y., Xin, G., & Wang, Z. (2023) · Asia Power and Electrical Technology Conference (APET) · doi:10.1109/apet59977.2023.10489037 · Cited by 3
Jiang, J., Hu, S., Shi, Y., Cheng, L., He, Z., Xiao, Q., Zeng, W. L., Wu, H., & Hui, C. (2023) · International Conference on Electronic Packaging Technology (ICEPT) · doi:10.1109/icept59018.2023.10491949 · Cited by 3
Mechanical Stress Effects on 4H-Silicon Carbide Power Diodes
Sugiura, T., Yamashita, K., & Nakano, N. (2024) · IEEE Open Journal of Power Electronics · doi:10.1109/ojpel.2024.3400291 · Cited by 4
A Comparison between Different Post Grinding Processes on 4H-SiC Wafers
Cafra, B., Grasso, A., Piluso, N., & Severino, A. (2024) · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · doi:10.4028/p-7pdovr · Cited by 3
Fujimoto, H., Kobayashi, T., & Watanabe, H. (2024) · Applied Physics Express · doi:10.35848/1882-0786/ad918f · Cited by 3
Shi, J.-K., Wang, Y., Fei, X.-X., Sun, B., Song, Y., Liu, Y., & Zhang, W. (2024) · IEEE Access · doi:10.1109/access.2024.3524391 · Cited by 3
Carrier lifetime killer in 4H-SiC: carrier capture path via carbon vacancies
Jiang, X., Huang, Y., Wang, R., Pi, X., Yang, D., & Deng, T. (2025) · Journal of Materials Chemistry C · doi:10.1039/d4tc04558k · Cited by 3
Jiang, Y., Lei, S., Zhou, Z., Hung, C.-H., & Li, Z. (2025) · Surfaces and Interfaces · doi:10.1016/j.surfin.2025.105949 · Cited by 4
Impact of Processing Parameters on Ti Schottky Contacts on 4H-SiC
Vivona, M., Bellocchi, G., Puglisi, V., Bongiorno, C., Adamo, S., Giannazzo, F., Rascunà, S., & Roccaforte, F. (2025) · Materials · doi:10.3390/ma18071447 · Cited by 3
Fiorenza, P., Zignale, M., Maira, G., Fontana, E., Bottari, C., Adamo, S., Carbone, B., Alessandrino, M. S., Russo, A., Panasci, S. E., et al. (2025) · Materials Science in Semiconductor Processing · doi:10.1016/j.mssp.2025.109575 · Cited by 3
Maeda, N., Kaneko, M., Tanaka, H., & Kimoto, T. (2025) · APL Electronic Devices · doi:10.1063/5.0254971 · Cited by 3
Self-citationLi, D., Lv, X., Wang, Q., Xiaolei, W., Sun, G., Xu, S., Han, S., Li, L., & 邹广田 (2025) · Applied Surface Science · doi:10.1016/j.apsusc.2025.163361 · Cited by 3
Wang, P., Li, Y., Xu, L., Li, Y., Hou, P., Wang, J., Wang, J., Yu, L., Li, Z., & Jin, R. (2025) · Vacuum · doi:10.1016/j.vacuum.2025.114405 · Cited by 3
Liu, R., Song, C., Lu, Z., Guan, K., Wang, X., Cao, P. J., Yang, X., & Bai, L. (2025) · Journal of the American Ceramic Society · doi:10.1111/jace.20616 · Cited by 3
Thermo-mechanical analysis on 10 kV SiC-MOSFETs to improve the reliability of solder layers
Takahashi, M., Sun, Z., Watanabe, A., Omura, I., Munk‐Nielsen, S., & Jørgensen, A. B. (2025) · Microelectronics Reliability · doi:10.1016/j.microrel.2025.115826 · Cited by 3
Nitriding characteristics of 4H-SiC irradiated with remote nitrogen plasmas
Shimabayashi, M., Kurihara, K., Horikawa, Y., & Sasaki, K. (2016) · Japanese Journal of Applied Physics · doi:10.7567/jjap.55.036503 · Cited by 3
Sato, T., Orai, Y., Suzuki, Y., Ito, H., Isshiki, T., Fukui, M., Nakamura, K., & Schamp, C. T. (2017) · Journal of Electron Microscopy · doi:10.1093/jmicro/dfx022 · Cited by 3
DFT simulation of stacking faults defects in 4H-SiC
Woźny, J., Kovalchuk, A., Lisik, Z., Podgórski, J., Bugalski, P., Kubiak, A., & Ruta, Ł. (2018) · International Conference on Perspective Technologies and Methods in MEMS Design · doi:10.1109/memstech.2018.8365703 · Cited by 3
Gu, Y., Shi, L., Luo, J., Li, S., & Wang, L. (2021) · physica status solidi (RRL) - Rapid Research Letters · doi:10.1002/pssr.202100458 · Cited by 3
Wang, L., Dhar, S., Feldman, L. C., & Kuroda, M. A. (2021) · physica status solidi (b) · doi:10.1002/pssb.202100224 · Cited by 3
Doi, T., Shibayama, S., Sakashita, M., Taoka, N., Shimizu, M., & Nakatsuka, O. (2021) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/ac4555 · Cited by 3
Valletta, A., Roccaforte, F., Magna, A. L., Fortunato, G., & Fiorenza, P. (2022) · Semiconductor Science and Technology · doi:10.1088/1361-6641/ac773c · Cited by 3
Luchinin, V. V., Игоревна, Г. С., Михайлович, П. В., Panov, M. F., Smirnov, A. N., Kirilenko, D. A., Semenova, T. F., Sklizkova, V. P., Gofman, I. V., Светличный, В. М., et al. (2017) · Japanese Journal of Applied Physics · doi:10.7567/jjap.56.06gh08 · Cited by 3
Direct drive of a buck converter by delta-sigma modulation at 13.56-MHz sampling
Sadanda, Y., Okuda, T., & Hikihara, T. (2017) · IEEE ... Workshop on Control and Modeling for Power Electronics · doi:10.1109/compel.2017.8013413 · Cited by 3
Lattice sites of ion-implanted Mn, Fe and Ni in 6H-SiC
Costa, Â., Wahl, U., Correia, J. G., David-Bosne, E., Amorim, L. M., Augustyns, V., Silva, D. J., da Silva, M. R., & Pereira, L. M. C. (2017) · Semiconductor Science and Technology · doi:10.1088/1361-6641/aa9f08 · Cited by 3
Effect of zinc particle mixing on properties of copper–nanoparticle/bismuth–tin solder hybrid joints
Satoh, T., & Usui, M. (2018) · Journal of Materials Science Materials in Electronics · doi:10.1007/s10854-018-0175-x · Cited by 3
Maeda, T., Chi, X., Tanaka, H., Horita, M., Suda, J., & Kimoto, T. (2019) · Japanese Journal of Applied Physics · doi:10.7567/1347-4065/ab3873 · Cited by 3
Self-citationOn the origin of drain current transients and subthreshold sweep hysteresis in 4H-SiC MOSFETs
Rasinger, F., Hauck, M., Rescher, G., Aichinger, T., Weber, H. B., Krieger, M., & Gregor Pobegen, A. (2019) · Applied Physics Letters · doi:10.1063/1.5117829 · Cited by 3
Low on-resistance 1.2 kV 4H-SiC power MOSFET with Ron, sp of 3.4 mΩ·cm2
Liu, Q., Wang, Q., Liu, H., Fei, C., Li, S., Huang, R., & Bai, S. (2020) · Journal of Semiconductors · doi:10.1088/1674-4926/41/6/062801 · Cited by 3
Yang, T., & Kita, K. (2021) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/ac4357 · Cited by 3
First principles calculation of strain effects on the density of interface states in 4H-SiC
Wan, C., Li, B., Zhu, H., Xu, H., & Ye, T. (2023) · Journal of Crystal Growth · doi:10.1016/j.jcrysgro.2023.127085 · Cited by 3
Investigation on Single Pulse Avalanche Failure of 3.3kV planar-SiC power MOSFETs
Chen, H., Wang, J., Dong, R., Yao, J., & Liang, S. (2023) · IEEE PELS Students and Young Professionals Symposium (SYPS) · doi:10.1109/syps59767.2023.10268224 · Cited by 3
Metadata
- Authors
- Kimoto, T.
- Affiliations
- Kyoto University (JP)
- Corresponding author
- Kimoto, Tsunenobu
- ORCID
- Kimoto, Tsunenobu
- Venue
- Japanese Journal of Applied Physics
- Publisher
- IOP Publishing
- Published
- 2015-03-23
- Volume
- 54
- Issue
- 4
- Pages
- 040103
- ISSN
- 0021-4922 (ISSN-L)
- 1347-4065
- OpenAlex
- W2092874501
- Cited by
- 1,176
- References
- 304
- Citations by year
- 2026: 112 · 2025: 129 · 2024: 132 · 2023: 104 · 2022: 113 · 2021: 115 · 2020: 104 · 2019: 116 · 2018: 109 · 2017: 76 · 2016: 51 · 2015: 14
- FWCI
- 40.18
- Type
- journal article
- Language
- en
- Open access
- bronze
- doi.org
- Licence
- Locations
- Japanese Journal of Applied Physics (publishedVersion)
- Funders
- Kwansei Gakuin University
- Soochow University
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Silicon Carbide Semiconductor Technologies
- Physical Sciences › Physics and Astronomy › Condensed Matter Physics › GaN-based semiconductor devices and materials
- Physical Sciences › Materials Science › Electronic, Optical and Magnetic Materials › Ga2O3 and related materials
- Keywords
- silicon carbide, wide bandgap semiconductors, high-voltage power devices, Schottky diodes, SiC MOSFET, impurity doping, point defects, extended defects, device reliability, power semiconductor devices
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review