Ober, Christopher K.

Reworkable Epoxies: Thermosets with Thermally Cleavable Groups for Controlled Network Breakdown

Yang, S., Chen, J.-S., Körner, H., Breiner, T., Ober, C. K., & Poliks, M. D. (1998) · Chemistry of Materials

Epoxy Resin Curing ProcessesPolymer composites and self-healing

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Metal–organic framework-inspired metal-containing clusters for high-resolution patterning

Xu, H., Sakai, K., Kasahara, K., Kosma, V., Yang, K., Herbol, H. C., Odent, J., Clancy, P., Giannelis, E. P., & Ober, C. K. (2018) · Chemistry of Materials

Advancements in Photolithography TechniquesMetal-Organic Frameworks: Synthesis and Applications

Cited by 129

Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning

Li, L., Chakrabarty, S., Spyrou, K., Ober, C. K., & Giannelis, E. P. (2015) · Chemistry of Materials

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 126

Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

Trikeriotis, M., Bae, W. J., Schwartz, E., Krysak, M., Lafferty, N., Xie, P., Smith, B., Zimmerman, P. A., Ober, C. K., & Giannelis, E. P. (2010) · SPIE Proceedings

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 78

Solubility studies of inorganic–organic hybrid nanoparticle photoresists with different surface functional groups

Li, L., Chakrabarty, S., Jiang, J., Zhang, B., Ober, C., & Giannelis, E. P. (2016) · Nanoscale

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 78

A new inorganic EUV resist with high-etch resistance

Trikeriotis, M., Krysak, M., Chung, Y. S., Ouyang, C., Cardineau, B., Brainard, R., Ober, C. K., Giannelis, E. P., & Cho, K. (2012) · SPIE Proceedings

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 75

Nanoparticle Photoresists from HfO2 and ZrO2 for EUV Patterning

Trikeriotis, M., Krysaki, M., Chung, Y. S., Ouyang, C., Cardineau, B., Brainard, R., Ober, C. K., Giannelis, E. P., & Cho, K. (2012) · Journal of Photopolymer Science and Technology

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 70

Metal Oxide Nanoparticle Photoresists for EUV Patterning

Jiang, J., Chakrabarty, S., Yu, M., & Ober, C. K. (2014) · Journal of Photopolymer Science and Technology

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 66

Acid-diffusion behaviour in organic thin films and its effect on patterning

Lee, J.-K., Chatzichristidi, M., Zakhidov, A. A., Hwang, H. S., Schwartz, E. L., Sha, J., Taylor, P. G., Fong, H. H., DeFranco, J. A., Murotani, E., et al. (2009) · Journal of Materials Chemistry

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 25

Advancing EUV Patterning: Innovations in Resist Platforms, Patterning Strategies, and Computational Approaches.

Biradar, M. R., Sagdic, G., Yuan, C., Marui, R., & Ober, C. K. (2026) · Chemical Reviews

Advancements in Photolithography TechniquesPhotopolymerization techniques and applications

Cited by 6