Acid-diffusion behaviour in organic thin films and its effect on patterning
Abstract
Acid and its formation and placement is one of the most important aspects in the chemically amplified photolithographic process. The choice of photoacid generator (PAG) in the photolithographic patterning of acidic substrates, such as PEDOT:PSS, has consequences for the resolution and overall quality of the patterned image. In this study, an acid exchange and diffusion mechanism is proposed for the undesired decomposition of the unexposed photoresist layer containing ionic PAGs. The use of non-ionic PAGs has been shown to be a solution to this decomposition problem. In addition, the acidic nature of the PEDOT:PSS substrate is employed to produce patterned images of a cross-linkable light-emitting polymer. With further optimization and development, this is potentially a fast and simple method to introduce patterns in various organic electronic devices.
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Their low efficiencies in solution-processed solar cells can be explained on the basis of de-metallation of metallated porphyrins in solution and/or in acidic media.
“Their low e ffi ciencies in solution-processed solar cells can be explained on the basis of de-metallation of metallated porphyrins in solution and/or in acidic media.”
From Recent progress in porphyrin-based materials for organic solar cells (2018) · cites this paper as [116]
Cites
Poly(3,4-ethylenedioxythiophene) and Its Derivatives: Past, Present, and Future
Groenendaal, L., Jonas, F., Freitag, D., Pielartzik, H., & Reynolds, J. R. (2000) · Advanced Materials · doi:10.1002/(sici)1521-4095(200004)12:7 · Cited by 3,423 · see citing works
Scientific importance, properties and growing applications of poly(3,4-ethylenedioxythiophene)
Kirchmeyer, S., & Reuter, K. (2005) · Journal of Materials Chemistry · doi:10.1039/b417803n · Cited by 1,454 · see citing works
Huang, J., Miller, P. F., WILSON, J. S., deMello, A. J., de Mello, J. C., & Bradley, D. D. C. (2005) · Advanced Functional Materials · doi:10.1002/adfm.200400073 · Cited by 516 · see citing works
Chemical amplification in the design of dry developing resist materials
Itô, H., & Willson, C. G. (1983) · Polymer Engineering and Science · doi:10.1002/pen.760231807 · Cited by 463 · see citing works
Chemical Amplification Resists for Microlithography
Ito, H. (2005) · Advances in polymer science · doi:10.1007/b97574 · Cited by 434 · see citing works
Conductive modifications of polymers with polypyrroles and polythiophenes
Jonas, F., & Schrader, L. (1991) · Synthetic Metals · doi:10.1016/0379-6779(91)91506-6 · Cited by 383 · see citing works
PEDT/PSS for efficient hole-injection in hybrid organic light-emitting diodes
Elschner, A., Bruder, F., Heuer, H. W., Jonas, F., Karbach, A., Kirchmeyer, S., Thurm, S., & Wehrmann, R. (2000) · Synthetic Metals · doi:10.1016/s0379-6779(99)00328-8 · Cited by 219 · see citing works
Orthogonal Patterning of PEDOT:PSS for Organic Electronics using Hydrofluoroether Solvents
Taylor, P. G., Lee, J., Zakhidov, A. A., Chatzichristidi, M., Fong, H. H., DeFranco, J. A., Malliaras, G. G., & Ober, C. K. (2009) · Advanced Materials · doi:10.1002/adma.200803291 · Cited by 195 · see citing works
Self-citationProton Dynamics in Chemically Amplified Electron Beam Resists
Yamamoto, H., Kozawa, T., Nakano, A., Okamoto, K., Yamamoto, Y., Ando, T., Satô, M., Komano, H., & Tagawa, S. (2004) · Japanese Journal of Applied Physics · doi:10.1143/jjap.43.l848 · Cited by 169 · see citing works
Hinsberg, W. D., Houle, F. A., Sanchez, M. I., & Wallraff, G. M. (2001) · IBM Journal of Research and Development · doi:10.1147/rd.455.0667 · Cited by 120 · see citing works
Ito, H. (2003) · Journal of Polymer Science Part A Polymer Chemistry · doi:10.1002/pola.10963 · Cited by 119 · see citing works
Stéphan, O., Schottland, P., Gall, P.-Y. L., Chevrot, C., Mariet, C., & Carrier, M. (1998) · Journal of Electroanalytical Chemistry · doi:10.1016/s0022-0728(97)00548-2 · Cited by 115 · see citing works
Acid catalyst mobility in resist resins
Stewart, M. D., Tran, H. V., Schmid, G. M., Stachowiak, T. B., Becker, D. J., & Willson, C. G. (2002) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1523027 · Cited by 106 · see citing works
Houle, F. A., Hinsberg, W. D., Morrison, M., Sanchez, M. I., Wallraff, G. M., Larson, C. E., & Hoffnagle, J. A. (2000) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1303753 · Cited by 89 · see citing works
Chemical amplification resists: History and development within IBM
Ito, H. (2000) · IBM Journal of Research and Development · doi:10.1147/rd.441.0119 · Cited by 88 · see citing works
Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography
Chang, S. W., Ayothi, R., Bratton, D., Yang, D., Felix, N. M., Cao, H. B., Deng, H., & Ober, C. K. (2006) · Journal of Materials Chemistry · doi:10.1039/b514065j · Cited by 86 · see citing works
Self-citationDirect Measurement of the Reaction Front in Chemically Amplified Photoresists
Lin, E. K., Soles, C. L., Goldfarb, D. L., Trinque, B. C., Burns, S. D., Jones, R. L., Lenhart, J. L., Angelopoulos, M., Willson, C. G., Satija, S. K., et al. (2002) · Science · doi:10.1126/science.1072092 · Cited by 77 · see citing works
Sonmez, G., Schottland, P., & Reynolds, J. R. (2005) · Synthetic Metals · doi:10.1016/j.synthmet.2005.07.335 · Cited by 64 · see citing works
Study of resolution limits due to intrinsic bias in chemically amplified photoresists
Postnikov, S. V., Stewart, M. D., Tran, H. V., Nierode, M. A., Medeiros, D. R., Cao, T., Byers, J. D., Webber, S. E., & Willson, C. G. (1999) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.591007 · Cited by 61 · see citing works
Chia, P., Chua, L., Sivaramakrishnan, S., Zhuo, J., Zhao, L. ‐., Sim, W., Yeo, Y., & Ho, P. K. (2007) · Advanced Materials · doi:10.1002/adma.200700086 · Cited by 58 · see citing works
Kozawa, T., & Tagawa, S. (2006) · Journal of Applied Physics · doi:10.1063/1.2173689 · Cited by 52 · see citing works
Hwang, H. S., Zakhidov, A. A., Lee, J., André, X., DeFranco, J. A., Fong, H. H., Holmes, A. B., Malliaras, G. G., & Ober, C. K. (2008) · Journal of Materials Chemistry · doi:10.1039/b802713g · Cited by 50 · see citing works
Self-citationHigh‐Resolution Patterning of Molecular Glasses Using Supercritical Carbon Dioxide
Felix, N. M., Tsuchiya, K., & Ober, C. K. (2006) · Advanced Materials · doi:10.1002/adma.200501802 · Cited by 44 · see citing works
Self-citationHoule, F. A., Hinsberg, W. D., Sanchez, M. I., & Hoffnagle, J. A. (2002) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1475985 · Cited by 42 · see citing works
A study of acid diffusion in chemically amplified deep ultraviolet resist
Itani, T., Yoshino, H., Hashimoto, S., Yamana, M., Samoto, N., & Kasama, K. (1996) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.588580 · Cited by 40 · see citing works
On the cleavage process of the N-trifluoromethylsulfonyloxy-1,8-naphthalimide photoacid generator
Malval, J., Morlet‐Savary, F., Allonas, X., Fouassier, J., Suzuki, S., Takahara, S., & Yamaoka, T. (2007) · Chemical Physics Letters · doi:10.1016/j.cplett.2007.06.082 · Cited by 39 · see citing works
Vogt, B. D., Kang, S., Prabhu, V. M., Lin, E. K., Satija, S. K., Turnquest, K. L., & Wu, W.-L. (2006) · Macromolecules · doi:10.1021/ma061209l · Cited by 35 · see citing works
Vogt, B. D., Kang, S., Prabhu, V. M., Rao, A. K., Lin, E. K., Wu, W.-L., Satija, S. K., & Turnquest, K. L. (2007) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2429675 · Cited by 34 · see citing works
Iwashima, C., Imai, G., Okamura, H., Tsunooka, M., & Shirai, M. (2003) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.16.91 · Cited by 30 · see citing works
Dissolution Kinetics and PAG Interaction of Phenolic Resins in Chemically Amplified Resists.
Itô, H., Alexander, D.-F., & Breyta, G. (1997) · Journal of Photopolymer Science and Technology · doi:10.2494/photopolymer.10.397 · Cited by 27 · see citing works
Photoacid bulkiness effect on dissolution kinetics in chemically amplified deep ultraviolet resists
Itani, T., Yoshino, H., Fujimoto, M., & Kasama, K. (1995) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.588315 · Cited by 27 · see citing works
Acid–base reactions in a positive tone chemically amplified photoresist and their effect on imaging
Houle, F. A., Hinsberg, W. D., & Sanchez, M. I. (2004) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1688351 · Cited by 25 · see citing works
Effect of Coulomb interaction and pKa on acid diffusion in chemically amplified resists
Shi, X. (1999) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.590562 · Cited by 20 · see citing works
A study of dissolution characteristics and acid diffusion in chemically amplified DUV resist
Itani, T., Hashimoto, S., Yamana, M., Samoto, N., & Kasama, K. (1998) · Microelectronic Engineering · doi:10.1016/s0167-9317(98)00084-7 · Cited by 18 · see citing works
Raptis, I., Grella, L., Argits, P., Gentili, M., Glezos, N., & Petrocco, G. (1996) · Microelectronic Engineering · doi:10.1016/0167-9317(95)00249-9 · Cited by 16 · see citing works
Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness
Yamamoto, H., Kozawa, T., Saeki, A., Okamoto, K., Tagawa, S., Ohmori, K., Satô, M., & Komano, H. (2007) · Japanese Journal of Applied Physics · doi:10.1143/jjap.46.6187 · Cited by 15 · see citing works
Croffie, E. H., Yuan, L., Cheng, M., Neureuther, A. R., Houlihan, F. M., Cirelli, R., Watson, P. G., Nalamasu, O., & Gabor, A. H. (2000) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.1324636 · Cited by 12 · see citing works
La, Y., Insik-In, Park, S., Meagley, R. P., Leolukman, M., Gopalan, P., & Nealey, P. F. (2007) · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · doi:10.1116/1.2800330 · Cited by 11 · see citing works
Acid and base diffusion in chemically amplified DUV resists
Itani, T., Yoshino, H., Hashimoto, S., Yamana, M., Samoto, N., & Kasama, K. (1997) · Microelectronic Engineering · doi:10.1016/s0167-9317(96)00176-1 · Cited by 11 · see citing works
Acid Diffusion Length Corresponding to Post Exposure Bake Time and Temperature
Park, J.-B., Kim, S.-H., Kim, S., Cho, J.-H., & Oh, H.-K. (2007) · Japanese Journal of Applied Physics · doi:10.1143/jjap.46.28 · Cited by 8 · see citing works
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- Authors
- Lee, J.-K., Chatzichristidi, M., Zakhidov, A. A., Hwang, H. S., Schwartz, E. L., Sha, J., Taylor, P. G., Fong, H. H., DeFranco, J. A., Murotani, E., Wong, W. W. H., Malliaras, G. G., & Ober, C. K.
- Affiliations
- Cornell University (US)
- The University of Melbourne (AU)
- Corresponding author
- Ober, Christopher K.
- ORCID
- Venue
- Journal of Materials Chemistry
- Publisher
- Royal Society of Chemistry (RSC)
- Published
- 2009
- Volume
- 19
- Issue
- 19
- Pages
- 2986
- ISSN
- 0959-9428 (ISSN-L)
- 1364-5501
- OpenAlex
- W1996442083
- Cited by
- 25
- References
- 40
- Citations by year
- 2025: 6 · 2024: 1 · 2023: 1 · 2021: 1 · 2018: 1 · 2017: 1 · 2016: 1 · 2014: 3 · 2013: 2 · 2012: 2
- FWCI
- 2.12
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Journal of Materials Chemistry (publishedVersion)
- Cambridge University Engineering Department Publications Database (submittedVersion)
- Funders
- National Science Foundation
- Australian Government
- Deutscher Akademischer Austauschdienst
- State Government of Victoria
- Australian Research Council
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Chemistry › Organic Chemistry › Photopolymerization techniques and applications
- Physical Sciences › Engineering › Biomedical Engineering › Nanofabrication and Lithography Techniques
- Keywords
- acid diffusion, photoacid generator, chemically amplified resists, PEDOT:PSS, organic thin films, light-emitting polymers, crosslinking, organic electronic devices, photolithography
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