Mechanophotopatterning on a Photoresponsive Elastomer
Abstract
Photopatterning of a photoreversible covalent elastomeric network under mechanical strain, or mechanophotopatterning, provides a facile approach to fabricate complex topographical features using elementary irradiation schemes. A photoresponsive material is deformed in two dimensions and irradiated through a mask, resulting in a transparent material with topography that reflects the concentric rings of the mask.
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- Authors
- Kloxin, C. J., Scott, T. F., Park, H. Y., & Bowman, C. N.
- Affiliations
- University of Colorado Boulder (US)
- Corresponding author
- Bowman, Christopher N.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2011-03
- Volume
- 23
- Issue
- 17
- Pages
- 1977-1981
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W2024277096
- Cited by
- 140
- References
- 20
- Citations by year
- 2026: 4 · 2025: 2 · 2024: 8 · 2023: 9 · 2022: 11 · 2021: 8 · 2020: 9 · 2019: 18 · 2018: 14 · 2017: 9 · 2016: 9 · 2015: 7 · 2014: 14 · 2013: 9 · 2012: 7
- FWCI
- 18.12
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Advanced Materials (publishedVersion)
- PubMed (publishedVersion)
- Funders
- National Science Foundation
- National Institutes of Health
- National Institute of Dental and Craniofacial Research (NIDCR DE 10959)
- Division of Chemical, Bioengineering, Environmental, and Transport Systems
- Topics
- Physical Sciences › Engineering › Mechanical Engineering › Advanced Materials and Mechanics
- Physical Sciences › Materials Science › Polymers and Plastics › Polymer composites and self-healing
- Physical Sciences › Chemistry › Organic Chemistry › Photopolymerization techniques and applications
- Keywords
- mechanical strain, photopatterning, surface topography, transparent materials
- MeSH terms
- Engineering, Light, Surface Properties, Elastomers, Mechanical Phenomena
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