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Cited by 33Skin Protection and AgingPhotochromic and Fluorescence ChemistryPhotopolymerization techniques and applications

Sunscreen Photostability

Bonda, Craig A., Lott, Dennis·2016·Principles and Practice of Photoprotection
DOI 10.1007/978-3-319-29382-0_14
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Crossref · 10.1007/978-3-319-29382-0_14

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34 of 34 references verified0 citation errors · 0 not checkable

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  • EHMC undergoes E-to-Z photoisomerisation after UV exposure at 290-320 nm.

    “In 1999, Tarras-Wahlberg et al. verified by high-performance liquid chromatography (HPLC) analysis that samples of 21 previously irradiated with UVR (λ = 290–320 nm) showed the presence of an additional band associated with the Z isomer of the UV filter, confirming the conversion between E and Z isomers after UV exposure (Figure 3) [28,30].”

    From UV Filters: Challenges and Prospects (2022) · cites this paper as [28]

  • UV irradiation can promote keto-enol isomerisation of avobenzone and fragmentation into radicals that can form reactive by-products.

    “It was verified that UV irradiation can promote the keto-enol isomerisation of 11 (Figure 2 (1)), and the fragmentation into two radicals (Figure 2 (2)), which after could form a phenacyl and benzoyl radicals that could generate reactive by-products, through reaction with others UV filters or fragments [28,30].”

    From UV Filters: Challenges and Prospects (2022) · cites this paper as [28]

  • Benzophenone and dibenzoylmethane derivatives are possibly the most toxic UV filters due to aromatic ketones not easily recognised by human metabolic enzymes, inducing toxic and allergic reactions, and due to photoisomerisation forming toxic reactive photodegradation products.

    “Possibly, the most toxic UV filters are mentioned to be the benzophenone and dibenzoylmethane derivatives due to the presence of aromatic ketones, which are not easily recognised by metabolic enzymes in humans, thus inducing toxic and allergic reactions [18], and also because of the photoisomerisation process leading to the formation of toxic and reactive photodegradation products [28].”

    From UV Filters: Challenges and Prospects (2022) · cites this paper as [28]

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Authors
Bonda, C. A., & Lott, D.
Corresponding author
Bonda, Craig A.
Venue
Principles and Practice of Photoprotection
Publisher
Springer International Publishing
Published
2016
Pages
247-273
DOI
10.1007/978-3-319-29382-0_14
OpenAlex
W3153812694
Cited by
33
References
34
Citations by year
2026: 1 · 2025: 4 · 2024: 6 · 2023: 5 · 2022: 4 · 2021: 4 · 2020: 1 · 2019: 1 · 2018: 1 · 2017: 2 · 2016: 1 · 2014: 2 · 2012: 1
FWCI
7.96
Type
book chapter
Language
en
Open access
closed
Licence
www.springer.com/tdm (unspecified)
Locations
Springer eBooks (publishedVersion)
Topics
  • Health Sciences › Medicine › Dermatology › Skin Protection and Aging
  • Physical Sciences › Materials Science › Materials Chemistry › Photochromic and Fluorescence Chemistry
  • Physical Sciences › Chemistry › Organic Chemistry › Photopolymerization techniques and applications
Keywords
photolability, ultraviolet radiation, UV filters, avobenzone, UVA filters, photostabilizers, photochemistry, photostability testing

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