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Growth of GaN by ECR-assisted MBE

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Moustakas, T.D., Lei, T., Molnar, R.J.·1993·Physica B: Condensed Matter

Abstract

High-quality GaN films have been grown on a variety of substrates by electron cyclotron resonance microwave plasma-assisted molecular beam epitaxy (ECR-MBE). The films were grown in two steps. First, a GaN-buffer was grown at low temperature and then the rest of the film was grown at higher temperatures. We found that this method of growth leads to a relatively small two-dimensional nucleation rate (∼20 nuclei/μm2 h) and high lateral growth rate (100 times faster than the vertical growth rate). This type of quasi-layer-by-layer growth results in a smooth surface morphology to within 100 Å. Growth on Si(1 0 0) leads to single-crystalline GaN films having the zinc-blende structure. Growth on Si(1 1 1) leads to GaN films having the wurtzitic structure with a large concentration of stacking faults. The crystallographic orientation and the surface morphology of GaN films on sapphire depends on the orientation of sapphire. To this date, the best films were grown on the basal plane of sapphire.

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Metadata

Authors
Moustakas, T. D., Lei, T., & Molnar, R. J.
Venue
Physica B: Condensed Matter
Publisher
Elsevier BV
Published
1993-04
Volume
185
Issue
1-4
Pages
36-49
ISSN
0921-4526 (ISSN-L)
OpenAlex
W2060125404
Cited by
238
References
1
FWCI
9.66
Type
journal article
Language
en
Open access
hybrid

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CoChat. (2026). Citation check: Growth of GaN by ECR-assisted MBE. https://app.cochat.ai/papers/10.1016/0921-4526(93)90213-p
The paper
Moustakas, T. D., Lei, T., & Molnar, R. J. (1993). Growth of GaN by ECR-assisted MBE. Physica B: Condensed Matter. https://doi.org/10.1016/0921-4526(93)90213-p

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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