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A brief review of atomic layer deposition: from fundamentals to applications
Open accessAbstract
Atomic layer deposition (ALD) is a vapor phase technique capable of producing thin films of a variety of materials. Based on sequential, self-limiting reactions, ALD offers exceptional conformality on high-aspect ratio structures, thickness control at the Angstrom level, and tunable film composition. With these advantages, ALD has emerged as a powerful tool for many industrial and research applications. In this review, we provide a brief introduction to ALD and highlight select applications, including Cu(In,Ga)Se 2 solar cell devices, high-k transistors, and solid oxide fuel cells. These examples are chosen to illustrate the variety of technologies that are impacted by ALD, the range of materials that ALD can deposit – from metal oxides such as Zn 1− x Sn x O y , ZrO 2 , Y 2 O 3 , to noble metals such as Pt – and the way in which the unique features of ALD can enable new levels of performance and deeper fundamental understanding to be achieved.
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Cited by
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
Mackus, A. J. M., Merkx, M. J. M., & Kessels, W. M. M. (2019) · Chemistry of Materials · doi:10.1021/acs.chemmater.8b03454 · Cited by 426
Metal organic frameworks as precursors for the manufacture of advanced catalytic materials
Oar-Arteta, L., Wezendonk, T., Sun, X., Kapteijn, F., & Gascon, J. (2017) · Materials Chemistry Frontiers · doi:10.1039/c7qm00007c · Cited by 361
Creating Highly Active Atomic Layer Deposited NiO Electrocatalysts for the Oxygen Evolution Reaction
Nardi, K. L., Yang, N., Dickens, C. F., Strickler, A. L., & Bent, S. F. (2015) · Advanced Energy Materials · doi:10.1002/aenm.201500412 · Cited by 277
Self-citationLeng, C. Z., & Losego, M. D. (2017) · Materials Horizons · doi:10.1039/c7mh00196g · Cited by 224
Onn, T., Küngas, R., Fornasiero, P., Huang, K., & Gorte, R. (2018) · Inorganics · doi:10.3390/inorganics6010034 · Cited by 111
Metadata
- Authors
- Johnson, R. W., Hultqvist, A., & Bent, S. F.
- Venue
- Materials Today
- Publisher
- Elsevier BV
- Published
- 2014-06
- Volume
- 17
- Issue
- 5
- Pages
- 236-246
- ISSN
- 1369-7021 (ISSN-L)
- OpenAlex
- W2023603575
- Cited by
- 1,996
- References
- 0
- FWCI
- 43.33
- Type
- journal article
- Language
- en
- Open access
- hybrid
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- Johnson, R. W., Hultqvist, A., & Bent, S. F. (2014). A brief review of atomic layer deposition: from fundamentals to applications. Materials Today. https://doi.org/10.1016/j.mattod.2014.04.026
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