EUV multilayer optics
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Cites
Henke, B. L., Gullikson, E. M., & Davis, J. C. (1993) · Atomic Data and Nuclear Data Tables · doi:10.1006/adnd.1993.1013 · Cited by 6,313 · see citing works
Design of grazing-incidence multilayer supermirrors for hard-x-ray reflectors
Joensen, K. D., Voutov, P., Szentgyorgyi, A. H., et al. (1995) · Applied Optics · doi:10.1364/ao.34.007935 · Cited by 127 · see citing works
Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma
Bergmann, K., Schriever, G., Rosier, O., et al. (1999) · Applied Optics · doi:10.1364/ao.38.005413 · Cited by 99 · see citing works
Kozhevnikov, I. V., Bukreeva, I., & Ziegler, E. (2001) · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · doi:10.1016/s0168-9002(00)01079-2 · Cited by 97 · see citing works
Supermirror-based beam devices
Böni, P. (1997) · Physica B Condensed Matter · doi:10.1016/s0921-4526(96)01255-0 · Cited by 54 · see citing works
Depth-graded multilayer X-ray optics with broad angular response
Wang, Z., Cao, J., & Michette, A. G. (2000) · Optics Communications · doi:10.1016/s0030-4018(00)00576-9 · Cited by 32 · see citing works
X-ray multilayer mirrors with an extended angular range
Protopopov, V., & Kal’nov, V. A. (1998) · Optics Communications · doi:10.1016/s0030-4018(98)00498-2 · Cited by 29 · see citing works
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Photoelectric Effect at Ultrahigh Intensities
Sorokin, A. A., Bobashev, S. V., Feigl, T., Tiedtke, K., Wabnitz, H., & Richter, M. (2007) · Physical Review Letters · doi:10.1103/physrevlett.99.213002 · Cited by 262 · see citing works
Self-citationExtreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149 · see citing works
- Authors
- Feigl, T., Yulin, S., Benoit, N., & Kaiser, N.
- Affiliations
- Fraunhofer Institute for Applied Optics and Precision Engineering (DE)
- Corresponding author
- Feigl, Torsten
- ORCID
- Kaiser, Norbert
- Venue
- Microelectronic Engineering
- Publisher
- Elsevier BV
- Published
- 2006-04
- Volume
- 83
- Issue
- 4-9
- Pages
- 703-706
- ISSN
- 0167-9317 (ISSN-L)
- OpenAlex
- W2029409541
- Cited by
- 61
- References
- 7
- Citations by year
- 2026: 2 · 2025: 2 · 2024: 3 · 2023: 6 · 2021: 4 · 2019: 1 · 2018: 2 · 2017: 3 · 2016: 5 · 2015: 6 · 2014: 4 · 2013: 3 · 2012: 4
- FWCI
- 2.70
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Microelectronic Engineering (publishedVersion)
- Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft) (submittedVersion)
- Fraunhofer-Publica (Fraunhofer-Gesellschaft) (submittedVersion)
- Funders
- Bundesministerium für Bildung und Forschung
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advancements in Photolithography Techniques
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
- Physical Sciences › Physics and Astronomy › Radiation › Advanced X-ray Imaging Techniques
- Keywords
- EUV lithography, magnetron sputtering
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