The DOI matches its Crossref record; 14 of the 14 references it cites were found in a registry or an index.
Improvement of electrical properties of surfactant-templated mesoporous silica thin films by plasma treatment
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Highly polarizable species are responsible for the observed loss of electrical characteristics, such as leakage current density and dielectric constant.
“The highly polarizable species described were shown to be responsible for the observed loss of electrical characteristics, such as leakage current density and dielectric constant [83,84].”
From Silica Aerogels as a Promising Vehicle for Effective Water Splitting for Hydrogen Production (2025) · cites this paper as [83]
Citations
Cites
(1990) · Elsevier eBooks · doi:10.1016/c2009-0-22386-5 · Cited by 3,311
Evaporation-Induced Self-Assembly: Nanostructures Made Easy
Brinker, C. J., Lu, Y., Sellinger, A., & Fan, H. (1999) · Advanced Materials · doi:10.1002/(sici)1521-4095(199905)11:7 · Cited by 2,112
Innocenzi, P., Falcaro, P., Grosso, D., & Babonneau, F. (2003) · The Journal of Physical Chemistry B · doi:10.1021/jp026609z · Cited by 237
Sakamoto, Y., Dı́az, I., Terasaki, O., Zhao, D., Pérez‐Pariente, J., Kim, J. M., & Stucky, G. D. (2002) · The Journal of Physical Chemistry B · doi:10.1021/jp014094q · Cited by 169
High-field electron trapping in SiO2
Solomon, P. M. (1977) · Journal of Applied Physics · doi:10.1063/1.324253 · Cited by 110
Structural Characterization of Mesoporous Organosilica Films for Ultralow-k Dielectrics
de Theije, F. K., Balkenende, R., Verheijen, M. A., Baklanov, M. R., Mogilnikov, K. P., & Furukawa, Y. (2003) · The Journal of Physical Chemistry B · doi:10.1021/jp027701y · Cited by 109
Transmission infrared study of acid-catalyzed sol-gel silica coatings during room ambient drying
Parrill, T. M. (1992) · Journal of materials research/Pratt's guide to venture capital sources · doi:10.1557/jmr.1992.2230 · Cited by 81
Chen, J. Y., Pan, F., Cho, A. T., Chao, K. J., Tsai, T. G., Wu, B., Yang, C., & Li, C. (2003) · Journal of The Electrochemical Society · doi:10.1149/1.1573200 · Cited by 37
Leakage current and dielectric breakdown behavior in annealed SiO2 aerogel films
Jo, M., & Park, H. (1998) · Applied Physics Letters · doi:10.1063/1.121065 · Cited by 30
Self-citationEffect of O 2 plasma treatment on the properties of SiO 2 aerogel film
Kim, H.-R., Park, H., Hyun, S., & Yeom, G. Y. (1998) · Thin Solid Films · doi:10.1016/s0040-6090(98)01044-x · Cited by 18
Self-citationKim, J.-J., Park, H.-H., & Hyun, S.-H. (2000) · Thin Solid Films · doi:10.1016/s0040-6090(00)01295-5 · Cited by 18
Self-citationPlasma Treatments of Molecularly Templated Nanoporous Silica Films
Cho, A. T., Tsai, T. G., Yang, C., Chao, K. J., & Pan, F. (2001) · Electrochemical and Solid-State Letters · doi:10.1149/1.1354698 · Cited by 18
Control of surface residual OH polar bonds in SiO2 aerogel film by silylation
Jung, S.-B., & Park, H. (2002) · Thin Solid Films · doi:10.1016/s0040-6090(02)00835-0 · Cited by 16
Self-citationInvestigation of silicon oxide films prepared by room-temperature ion plating
Yeh, C., Chen, T., Fan, C.-L., & Kao, J. (1998) · Journal of Applied Physics · doi:10.1063/1.366801 · Cited by 13
Flagged first, then by citations
Research works printed but not linked: 1
- Chiang, 1999, Solid State Technol., 10, 42
Cited by
Sorted by citations
Zhang, X., Wu, W., Wang, J., Liu, C., & Qian, S. (2008) · Journal of materials research/Pratt's guide to venture capital sources · doi:10.1557/jmr.2008.0028 · Cited by 18
Silica Aerogels as a Promising Vehicle for Effective Water Splitting for Hydrogen Production
Vadanagekar, A., Lapcik, L., Kvitek, L., & Lapcikova, B. (2025) · Molecules · doi:10.3390/molecules30061212 · Cited by 4
Metadata
- Authors
- Jung, S.-B., & Park, H.-H.
- Affiliations
- Yonsei University (KR)
- Corresponding author
- Park, Hyung-Ho
- ORCID
- Park, Hyung-Ho
- Venue
- Thin Solid Films
- Publisher
- Elsevier BV
- Published
- 2006-05
- Volume
- 506-507
- Pages
- 360-363
- ISSN
- 0040-6090 (ISSN-L)
- OpenAlex
- W2003814914
- Cited by
- 2
- References
- 14
- Citations by year
- 2025: 1
- FWCI
- 0.20
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Thin Solid Films (publishedVersion)
- Topics
- Physical Sciences › Materials Science › Materials Chemistry › Mesoporous Materials and Catalysis
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Semiconductor materials and devices
- Physical Sciences › Materials Science › Electronic, Optical and Magnetic Materials › Copper Interconnects and Reliability
- Keywords
- mesoporous silica films, surfactant templating, plasma treatment, low-k dielectrics, electrical properties, current density, pore ordering, ion bombardment, hydrogen plasma, oxygen plasma, argon plasma, structural defects
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Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
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