Cited by 16Optical Coatings and GratingsPhotonic Crystals and ApplicationsPhotonic and Optical Devices

High-Performance SiO2-SiNx Distributed Bragg Reflectors Fabricated by Ion-Assisted Reactive Magnetron Sputtering

Open access
Jiang, Yu, You, Daoming, Cao, Yingchun, Guo, Wentao, Tan, Manqing·2024·Vacuum

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Crossref · 10.1016/j.vacuum.2023.112775

Cites

56 of 56 references verified0 citation errors · 0 not checkable

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  • Silicon dioxide (SiO2) is the most commonly used material to fabricate dielectric mirrors.

    “The most commonly used material to fabricate dielectric mirrors is silicon dioxide (SiO2).”

    From Metal Oxide Thin Films for Advanced Photonic Applications (2026) · cites this paper as [33]

  • The SiO2/TiO2 pair offers the largest optical contrast, making it suitable for high-reflectance dielectric mirrors with a smaller number of pairs and sharper stopbands.

    “However, the pair SiO2/TiO2 offers the largest optical contrast, rendering it perfect for high-reflectance dielectric mirrors with a smaller number of pairs and sharper stopbands.”

    From Metal Oxide Thin Films for Advanced Photonic Applications (2026) · cites this paper as [33]

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Authors
Jiang, Y., You, D., Cao, Y., Guo, W., & Tan, M.
Affiliations
Chinese Academy of Sciences (CN)
Corresponding author
  • Guo, Wentao
  • Tan, Manqing
Venue
Vacuum
Publisher
Elsevier BV
Published
2024-02
Volume
220
Pages
112775
ISSN
0042-207X (ISSN-L)
OpenAlex
W4388572935
Cited by
15
References
56
Citations by year
2026: 5 · 2025: 4 · 2024: 6
FWCI
1.04
Type
journal article
Language
en
Open access
Locations
  • Vacuum (publishedVersion)
  • SSRN Electronic Journal (acceptedVersion)
Funders
Youth Innovation Promotion Association of the Chinese Academy of Sciences (2021108)
Topics
  • Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
  • Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Photonic Crystals and Applications
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Photonic and Optical Devices
Keywords
distributed Bragg reflector, silica, silicon nitride, optical thin films, surface roughness, residual stress, stopband bandwidth, amorphous films

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