High-Performance SiO2-SiNx Distributed Bragg Reflectors Fabricated by Ion-Assisted Reactive Magnetron Sputtering
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Silicon dioxide (SiO2) is the most commonly used material to fabricate dielectric mirrors.
“The most commonly used material to fabricate dielectric mirrors is silicon dioxide (SiO2).”
From Metal Oxide Thin Films for Advanced Photonic Applications (2026) · cites this paper as [33]
The SiO2/TiO2 pair offers the largest optical contrast, making it suitable for high-reflectance dielectric mirrors with a smaller number of pairs and sharper stopbands.
“However, the pair SiO2/TiO2 offers the largest optical contrast, rendering it perfect for high-reflectance dielectric mirrors with a smaller number of pairs and sharper stopbands.”
From Metal Oxide Thin Films for Advanced Photonic Applications (2026) · cites this paper as [33]
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- Authors
- Jiang, Y., You, D., Cao, Y., Guo, W., & Tan, M.
- Affiliations
- Chinese Academy of Sciences (CN)
- Corresponding author
- Guo, Wentao
- Tan, Manqing
- Venue
- Vacuum
- Publisher
- Elsevier BV
- Published
- 2024-02
- Volume
- 220
- Pages
- 112775
- ISSN
- 0042-207X (ISSN-L)
- OpenAlex
- W4388572935
- Cited by
- 15
- References
- 56
- Citations by year
- 2026: 5 · 2025: 4 · 2024: 6
- FWCI
- 1.04
- Type
- journal article
- Language
- en
- Open access
- green
- doi.org
- Licence
- Locations
- Vacuum (publishedVersion)
- SSRN Electronic Journal (acceptedVersion)
- Funders
- Youth Innovation Promotion Association of the Chinese Academy of Sciences (2021108)
- Topics
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Photonic Crystals and Applications
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Photonic and Optical Devices
- Keywords
- distributed Bragg reflector, silica, silicon nitride, optical thin films, surface roughness, residual stress, stopband bandwidth, amorphous films
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