High Reflectance Dielectric Distributed Bragg Reflectors for near Ultra-Violet Planar Microcavities: SiO2/HfO2 versus SiO2/SiNx
Abstract
SiO2/SiNx and SiO2/HfO2 distributed Bragg reflectors for the ultra-violet (λ = 360 nm–380 nm) are compared through their structural and optical properties. The SiO2/HfO2 system exhibits a lower interface roughness, higher reflectance, larger stop band, and lower penetration depth than SiO2/SiNx. A cavity quality factor of 3700 at about 360 nm is measured on a passive SiO2/HfO2-based planar microcavity. Compared with values obtained in the literature for the near UV range, the latter is rather large. Micro-reflectance measurements have been performed on a series of passive microcavities with increasing cavity thickness to determine the residual absorption in the SiO2 and HfO2 layers. Absorption coefficients of 30 (k = 0.86 × 10−4) and 160 cm−1 (k = 4.59 × 10−4) near λ ∼ 360 nm have been extracted for SiO2 and HfO2, respectively. Transfer-matrix simulations taking into account the residual absorption show that microcavity quality factors up to 8000 can be expected at 360–380 nm with this material system. Such values are well-suited for the fabrication of UV-vertical cavity surface emitting lasers or microcavity polariton lasers operating at room temperature.
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Réveret et al. employed a SiO2/HfO2-based Bragg stack in a planar microcavity using ion beam-assisted electron-gun vacuum evaporation; they obtained reflective coatings with a small number of pairs over a 60×60 mm2 surface with uniformity smaller than 4%, high reflectivity, broader PBG, and lower penetration depth.
“Réveret et al. [246] employed a SiO2/HfO2based Bragg stack in a planar microcavity using ion beam-assisted electron-gun vacuum evaporation. They obtained reflective coatings with a small number of pairs over a 60 × 60 mm 2 surface with a uniformity smaller than 4%, a high reflectivity, a broader PBG, and a lower penetration depth (LDBR), which are beneficial for achieving an efficient planar micro”
From Metal Oxide Thin Films for Advanced Photonic Applications (2026) · cites this paper as [246]
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- Authors
- Réveret, F., Bignet, L., Zhigang, W., Lafosse, X., Patriarche, G., Disseix, P., Médard, F., Mihailovic, M., Leymarie, J., Zúñiga-Pérez, J., & Bouchoule, S.
- Affiliations
- Centre National de la Recherche Scientifique (FR)
- ORCID
- Venue
- Journal of Applied Physics
- Publisher
- AIP Publishing
- Published
- 2016-09-02
- Volume
- 120
- Issue
- 9
- ISSN
- 0021-8979 (ISSN-L)
- 1089-7550
- OpenAlex
- W2517439863
- Cited by
- 12
- References
- 54
- Citations by year
- 2026: 2 · 2025: 4 · 2023: 3 · 2021: 1 · 2020: 1 · 2018: 1
- FWCI
- 0.15
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Journal of Applied Physics (publishedVersion)
- Funders
- Agence Nationale de la Recherche (ANR-11-LABX-0014, ANR-11-BS03-0012)
- LabEx GANEX
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Photonic and Optical Devices
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Photonic Crystals and Applications
- Keywords
- distributed Bragg reflector, planar microcavities, near-ultraviolet, high reflectivity, cavity quality factor, interface roughness, penetration depth, residual absorption, stop band
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