Optical Properties and Mechanical Stress in SiO2/Nb2O5 Multilayers
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A multilayer structure with stress-controlled reflection based on the SiO2/Nb2O5 pair using rf magnetron sputtering uses SiO2 (n = 1.48) and Nb2O5 (n = 2.33).
“Within the framework of micromechanical elements, Richter et al. [42] demonstrate a multilayer structure with stress-controlled reflection based on the SiO2/Nb2O5 pair using rf magnetron sputtering for the low-refractive target material and reactive sputtering in an oxygen pressure for the high-refractive target material. Prior to fabricating the multilayer structure, they investigated various”
From Metal Oxide Thin Films for Advanced Photonic Applications (2026) · cites this paper as [42]
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Yuan, Z.-S., Jhang, J.-M., Yu, P.-H., Jiang, C.-M., Huang, Y.-C., Wu, Y.-L., Lin, J.-J., & Yang, C.-F. (2020) · Vacuum · doi:10.1016/j.vacuum.2020.109782 · Cited by 12 · see citing works
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Metal Oxide Thin Films for Advanced Photonic Applications
Stîngescu, M.-L., Șopronyi, M.-A., Antohe, Ș., & Scărișoreanu, N.-D. (2026) · Crystals · doi:10.3390/cryst16030164 · Cited by 2 · see citing works
- Authors
- Richter, F., Kupfer, H., Schlott, P., Gessner, T., & Kaufmann, C.
- Affiliations
- Chemnitz University of Technology (DE)
- Corresponding author
- Richter, F
- ORCID
- Richter, F
- Venue
- Thin Solid Films
- Publisher
- Elsevier BV
- Published
- 2001-06
- Volume
- 389
- Issue
- 1-2
- Pages
- 278-283
- ISSN
- 0040-6090 (ISSN-L)
- OpenAlex
- W2092504928
- Cited by
- 73
- References
- 13
- Citations by year
- 2025: 5 · 2024: 2 · 2023: 3 · 2022: 4 · 2021: 3 · 2020: 4 · 2019: 2 · 2018: 3 · 2017: 2 · 2016: 5 · 2015: 3 · 2014: 3 · 2013: 5 · 2012: 2
- FWCI
- 1.36
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Thin Solid Films (publishedVersion)
- Funders
- Deutsche Forschungsgemeinschaft
- Topics
- Physical Sciences › Materials Science › Surfaces, Coatings and Films › Optical Coatings and Gratings
- Physical Sciences › Engineering › Mechanics of Materials › Metal and Thin Film Mechanics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced MEMS and NEMS Technologies
- Keywords
- optical thin films, film stress, stress compensation, magnetron sputtering, reactive sputtering, niobium oxide, silica, chromium underlayer, substrate bias voltage, sputtering pressure, reflectivity, compressive stress
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