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Cited by 226

The DOI matches its Crossref record; 14 of the 14 references it cites were found in a registry or an index.

Epitaxial Heterostructures of Ultrathin Topological Insulator Nanoplate and Graphene

Dang, Wenhui, Peng, Hailin, Li, Hui, Wang, Pu, Liu, Zhongfan·2010·Nano Letters

Abstract

The authors present a van der Waals epitaxy of high-quality ultrathin nanoplates of topological insulator Bi(2)Se(3) on a pristine graphene substrate using a simple vapor-phase deposition method. Sub-10-nm-thick nanoplates of layered Bi(2)Se(3) with defined orientations can be epitaxially grown on a few-layer pristine graphene substrate. We show the evolution of Raman spectra with the number of Bi(2)Se(3) layers on few-layer graphene. Bi(2)Se(3) nanoplates with a thickness of three quintuple-layers (3-QL) exhibit the strongest Raman intensity. Strain effects in the Bi(2)Se(3)/graphene nanoplate heterostructures is also studied by Raman spectroscopy. 1-QL and 2-QL Bi(2)Se(3) nanoplates experience tensile stress, consistent with compressive stress in single-layer and bilayer graphene substrates. Our results suggest an approach for the synthesis of epitaxial heterostructures that consist of an ultrathin topological insulator and graphene, which may be a new direction for electronic and spintronic applications.

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Metadata

Authors
Dang, W., Peng, H., Li, H., Wang, P., & Liu, Z.
Venue
Nano Letters
Published
2010-07-12
Volume
10
Issue
8
Pages
2870-2876
ISSN
  • 1530-6984 (ISSN-L)
  • 1530-6992
OpenAlex
W2083984050
Cited by
226
References
14
FWCI
7.72
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Epitaxial Heterostructures of Ultrathin Topological Insulator Nanoplate and Graphene. https://app.cochat.ai/papers/10.1021/nl100938e
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Dang, W., Peng, H., Li, H., Wang, P., & Liu, Z. (2010). Epitaxial Heterostructures of Ultrathin Topological Insulator Nanoplate and Graphene. Nano Letters. https://doi.org/10.1021/nl100938e

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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