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Intrinsic Electronic Transport Properties of High-Quality Monolayer and Bilayer MoS2

Baugher, Britton W. H., Churchill, Hugh O. H., Yang, Yafang, Jarillo-Herrero, Pablo·2013·Nano Letters

Abstract

We report electronic transport measurements of devices based on monolayers and bilayers of the transition-metal dichalcogenide MoS2. Through a combination of in situ vacuum annealing and electrostatic gating we obtained ohmic contact to the MoS2 down to 4 K at high carrier densities. At lower carrier densities, low-temperature four probe transport measurements show a metal-insulator transition in both monolayer and bilayer samples. In the metallic regime, the high-temperature behavior of the mobility showed strong temperature dependence consistent with phonon-dominated transport. At low temperature, intrinsic field-effect mobilities approaching 1000 cm(2)/(V·s) were observed for both monolayer and bilayer devices. Mobilities extracted from Hall effect measurements were several times lower and showed a strong dependence on density, likely caused by screening of charged impurity scattering at higher densities.

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Metadata

Authors
Baugher, B. W. H., Churchill, H. O. H., Yang, Y., & Jarillo-Herrero, P.
Venue
Nano Letters
Published
2013-08-20
Volume
13
Issue
9
Pages
4212-4216
ISSN
  • 1530-6984 (ISSN-L)
  • 1530-6992
OpenAlex
W2025413591
Cited by
628
References
4
FWCI
30.49
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Intrinsic Electronic Transport Properties of High-Quality Monolayer and Bilayer MoS2. https://app.cochat.ai/papers/10.1021/nl401916s
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Baugher, B. W. H., Churchill, H. O. H., Yang, Y., & Jarillo-Herrero, P. (2013). Intrinsic Electronic Transport Properties of High-Quality Monolayer and Bilayer MoS2. Nano Letters. https://doi.org/10.1021/nl401916s

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