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Thermal conduction in metallized silicon-dioxide layers on silicon
Abstract
The vertical thermal conductivities of thermally grown (TG) and chemical vapor deposited (CVD) silicon-dioxide layers 20 to 200 nm thick are measured using a simple, noncontact photothermal technique. The conductivities of TG and CVD layers are less by as much as 18% and 30%, respectively, than the conductivity of bulk fused silicon dioxide. No significant thickness dependence is observed. The thermal boundary resistance between the oxide layers and silicon is shown to be negligibly small. The boundary resistance of gold layers sputtered directly onto TG oxide is considerably larger than that of gold layers evaporated on TG oxide with a 20-nm chromium adhesion layer, and is comparable to internal resistances of the oxide layers.
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Citations
Cites
Thermal resistance at interfaces
Swartz, E. T., & Pohl, R. O. (1987) · Applied Physics Letters · doi:10.1063/1.98939 · Cited by 410
Cited by
Cahill, D. G., Ford, W. K., Goodson, K. E., Mahan, G. D., Majumdar, A., Maris, H. J., Merlin, R., & Phillpot, S. R. (2003) · Journal of Applied Physics · doi:10.1063/1.1524305 · Cited by 2,825
Self-citationHeat transport in thin dielectric films
Lee, S.-M., & Cahill, D. G. (1997) · Journal of Applied Physics · doi:10.1063/1.363923 · Cited by 732
Thermometry and Thermal Transport in Micro/Nanoscale Solid-State Devices and Structures
Cahill, D. G., Goodson, K., & Majumdar, A. (2002) · Journal of Heat Transfer · doi:10.1115/1.1454111 · Cited by 611
Self-citationOptical Measurement of Thermal Conductivity Using Fiber Aligned Frequency Domain Thermoreflectance
Malen, J. A., Baheti, K., Tong, T., Zhao, Y., Hudgings, J. A., & Majumdar, A. (2011) · Journal of Heat Transfer · doi:10.1115/1.4003545 · Cited by 145
Metadata
- Authors
- Käding, O. W., Skurk, H., & Goodson, K. E.
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 1994-09-26
- Volume
- 65
- Issue
- 13
- Pages
- 1629-1631
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W2090797593
- Cited by
- 165
- References
- 1
- FWCI
- 3.02
- Type
- journal article
- Language
- en
- Open access
- closed
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- Käding, O. W., Skurk, H., & Goodson, K. E. (1994). Thermal conduction in metallized silicon-dioxide layers on silicon. Applied Physics Letters. https://doi.org/10.1063/1.112933
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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