Student or educator? Sign up with your school email and get 6 months of Pro free.
Cited by 158

The DOI matches its Crossref record.

Avalanche-Induced Negative Resistance in Thin Oxide Films

Chopra, K. L.·1965·Journal of Applied Physics

Abstract

A current-controlled negative resistance phenomenon, similar to that exhibited by a gas discharge tube, has been observed in suitably prepared thin oxide films of Nb, Ta, and Ti, sandwiched between thin-film metal electrodes, at frequencies up to 1 Mc/sec. The voltage required to sustain the negative resistance in both directions of current is independent of the electrode materials, apparent area and thickness (up to 500 Å) of the oxide film, and is about 0.4, 1.3, and 3.5 V for Ti, Nb, and Ta oxide films, respectively. The corresponding electric fields are approximately 0.8×106, 3×106, 9×106 V/cm. These values increase slightly with decrease of temperature. Experimental evidence supports the interpretation of the phenomenon in terms of avalanche multiplication of carriers in a thin region of the oxide film attended by space-charge-limited flow conditions.

Overview

The claims and statistics of this paper haven’t been checked yet.

Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.

A few free checks a day · papers already verified open instantly · results are public

Integrity signals

Registry

Crossref · 10.1063/1.1713870

Cites

Statistics

Verification

Claims the paper makes

The claims and statistics of this paper haven’t been checked yet.

Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.

A few free checks a day · papers already verified open instantly · results are public

Self-check

Percentages, sums and reported differences re-computed from the paper’s own numbers.

The self-check needs the paper’s full text.

Citations

Cited by

See all 158

Metadata

Authors
Chopra, K. L.
Venue
Journal of Applied Physics
Published
1965-01-01
Volume
36
Issue
1
Pages
184-187
ISSN
  • 0021-8979 (ISSN-L)
  • 1089-7550
OpenAlex
W2018934262
Cited by
158
References
0
FWCI
6.95
Type
journal article
Language
en
Open access
closed

About these checks

Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.

Statistics and arithmetic are recomputed, not judged.

Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.

What counts as a claim ›How we measure confidence ›How we check this ›

Are you an author, or do you see a problem with this page? Request a review

How to cite

Cite CoChat for the checks on this page, and the paper for its own findings.

This page
CoChat. (2026). Citation check: Avalanche-Induced Negative Resistance in Thin Oxide Films. https://app.cochat.ai/papers/10.1063/1.1713870
The paper
Chopra, K. L. (1965). Avalanche-Induced Negative Resistance in Thin Oxide Films. Journal of Applied Physics. https://doi.org/10.1063/1.1713870

Data sources

Bibliographic data: Semantic Scholar, OpenAlex, Crossref.

Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.