The DOI matches its Crossref record; 2 of the 2 references it cites were found in a registry or an index.
Negative oxygen vacancies in HfO2 as charge traps in high-k stacks
Open accessAbstract
The optical excitation and thermal ionization energies of oxygen vacancies in m-HfO2 are calculated using a non-local density functional theory with atomic basis sets and periodic supercell. The thermal ionization energies of negatively charged V− and V2− centers are consistent with values obtained by the electrical measurements. The results suggest that negative oxygen vacancies are essentially polaronic in origin. They are likely candidates for intrinsic shallow electron traps in the hafnium based gate stack devices.
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Citations
Cites
A new mixing of Hartree–Fock and local density-functional theories
Becke, A. D. (1993) · The Journal of Chemical Physics · doi:10.1063/1.464304 · Cited by 16,515
Review on high-k dielectrics reliability issues
Ribes, G., Mitard, J., Denais, M., Bruyere, S., Monsieur, F., Parthasarathy, C., Vincent, E., & Ghibaudo, G. (2005) · IEEE Transactions on Device and Materials Reliability · doi:10.1109/tdmr.2005.845236 · Cited by 533
Cited by
Charge-Trapping Phenomena in HfO2-Based FeFET-Type Nonvolatile Memories
Yurchuk, E., Muller, J., Muller, S., Paul, J., Pesic, M., van Bentum, R., Schroeder, U., & Mikolajick, T. (2016) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2016.2588439 · Cited by 369
Complex Internal Bias Fields in Ferroelectric Hafnium Oxide
Schenk, T., Hoffmann, M., Ocker, J., Pešić, M., Mikolajick, T., & Schroeder, U. (2015) · ACS Applied Materials & Interfaces · doi:10.1021/acsami.5b05773 · Cited by 280
Yoon, J. H., Song, S. J., Yoo, I., Seok, J. Y., Yoon, K. J., Kwon, D. E., Park, T. H., & Hwang, C. S. (2014) · Advanced Functional Materials · doi:10.1002/adfm.201400064 · Cited by 277
Metadata
- Authors
- Gavartin, J. L., Muñoz Ramo, D., Shluger, A. L., Bersuker, G., & Lee, B. H.
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 2006-08-21
- Volume
- 89
- Issue
- 8
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W2003124709
- Cited by
- 350
- References
- 2
- FWCI
- 27.33
- Type
- journal article
- Language
- en
- Open access
- green
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- Gavartin, J. L., Muñoz Ramo, D., Shluger, A. L., Bersuker, G., & Lee, B. H. (2006). Negative oxygen vacancies in HfO2 as charge traps in high-k stacks. Applied Physics Letters. https://doi.org/10.1063/1.2236466
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
