Cited by 277Advanced Memory and Neural ComputingFerroelectric and Negative Capacitance DevicesPhase-change materials and chalcogenides

Highly Uniform, Electroforming‐Free, and Self‐Rectifying Resistive Memory in the Pt/Ta2O5/HfO2‐x/TiN Structure

Yoon, Jung Ho, Song, Seul Ji, Yoo, Il‐Hyuk, Seok, Jun Yeong, Yoon, Kyung Jean, Kwon, Dae Eun, Park, Tae Hyung, Hwang, Cheol Seong·2014·Advanced Functional Materials

Abstract

The development of a resistance switching (RS) memory cell that contains rectification functionality in itself, highly reproducible RS performance, and electroforming‐free characteristics is an impending task for the development of resistance switching random access memory. In this work, a two‐layered dielectric structure consisting of HfO 2 and Ta 2 O 5 layers, which are in contact with the TiN and Pt electrode, is presented for achieving these tasks simultaneously in one sample configuration. The HfO 2 layer works as the resistance switching layer by trapping or detrapping of electronic carriers, whereas the Ta 2 O 5 layer remains intact during the whole switching cycle, which provides the rectification. With the optimized structure and operation conditions for the given materials, excellent RS uniformity, electroforming‐free, and self‐rectifying functionality could be simultaneously achieved from the Pt/Ta 2 O 5/HfO 2/TiN structure.

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Crossref · 10.1002/adfm.201400064

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Authors
Yoon, J. H., Song, S. J., Yoo, I., Seok, J. Y., Yoon, K. J., Kwon, D. E., Park, T. H., & Hwang, C. S.
Affiliations
Seoul National University (KR)
Corresponding author
Hwang, Cheol Seong
Venue
Advanced Functional Materials
Publisher
Wiley
Published
2014-05-26
Volume
24
Issue
32
Pages
5086-5095
ISSN
  • 1616-301X (ISSN-L)
  • 1616-3028
OpenAlex
W2167342413
Cited by
277
References
31
Citations by year
2026: 17 · 2025: 34 · 2024: 30 · 2023: 27 · 2022: 21 · 2021: 26 · 2020: 23 · 2019: 23 · 2018: 21 · 2017: 15 · 2016: 22 · 2015: 17 · 2014: 1
FWCI
9.74
Type
journal article
Language
en
Open access
closed
Locations
Advanced Functional Materials (publishedVersion)
Topics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced Memory and Neural Computing
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Ferroelectric and Negative Capacitance Devices
  • Physical Sciences › Materials Science › Materials Chemistry › Phase-change materials and chalcogenides
Keywords
resistive random access memory, electroforming-free switching, hafnium oxide, tantalum pentoxide, TiN electrodes, platinum electrode, carrier trapping and detrapping, random access memory

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