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Cited by 371

The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.

Characteristics and mechanism of conduction/set process in TiN∕ZnO∕Pt resistance switching random-access memories

Xu, Nuo, Liu, Lifeng, Sun, Xiao, Liu, Xiaoyan, Han, Dedong, Wang, Yi, Han, Ruqi, Kang, Jinfeng, Yu, Bin·2008·Applied Physics Letters

Abstract

The characteristics and mechanism of conduction/set process in TiN∕ZnO∕Pt-based resistance random access memory devices with stable and reproducible nanosecond bipolar switching behavior were studied. The dependencies of memory behavior on cell area, operating temperature, and frequency indicate that the conduction mechanism in low-resistance states is due to electrons hopping through filament paths. We also identify that the set process is essentially equivalent to a soft dielectric breakdown associated with a polarization effect caused by the migration of space charges under a low electric field stress. The generation/recovery of oxygen vacancies and nonlattice oxygen ions play a critical role in resistance switching.

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Metadata

Authors
Xu, N., Liu, L., Sun, X., Liu, X., Han, D., Wang, Y., Han, R., Kang, J., & Yu, B.
Venue
Applied Physics Letters
Published
2008-06-09
Volume
92
Issue
23
ISSN
  • 0003-6951 (ISSN-L)
  • 1077-3118
OpenAlex
W2022250006
Cited by
371
References
1
FWCI
23.31
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Characteristics and mechanism of conduction/set process in TiN∕ZnO∕Pt resistance switching random-access memories. https://app.cochat.ai/papers/10.1063/1.2945278
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Xu, N., Liu, L., Sun, X., Liu, X., Han, D., Wang, Y., Han, R., Kang, J., & Yu, B. (2008). Characteristics and mechanism of conduction/set process in TiN∕ZnO∕Pt resistance switching random-access memories. Applied Physics Letters. https://doi.org/10.1063/1.2945278

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