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An intrinsic stress scaling law for polycrystalline thin films prepared by ion beam sputtering
Abstract
The intrinsic stresses of Al, Ti, Fe, Ta, Mo, W, Ge, Si, AlN, TiN, and Si3N4 films prepared by ion beam sputtering were investigated at low Td/Tm values. The intrinsic stress is compressive and its origin is explained in terms of the ion peening model. Knock-on linear cascade theory of forward sputtering is applied to derive a simple scaling law with the film’s physical properties. The results show that the stress is directly proportional to the elastic energy/mole, given by the quantity Q=EM/(1−ν)D, where E is Young’s modulus, M the atomic mass, D the density, and ν Poisson’s ratio. Stress data taken from the literature for a variety of materials deposited by low-pressure magnetron sputtering, and rf and ion beam sputtering also fit the correlation with Q. Furthermore, the model predicts a square-root dependence on the incident ion energy, suggesting that the stress is momentum rather than energy driven.
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Cites
Sputtering by Particle Bombardment III
(1991) · Topics in Applied Physics · doi:10.1007/3-540-53428-8 · Cited by 2,221
Thornton, J. A. (1977) · Annual Review of Materials Science · doi:10.1146/annurev.ms.07.080177.001323 · Cited by 2,188
Revised structure zone model for thin film physical structure
Messier, R., Giri, A. P., & Roy, R. A. (1984) · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · doi:10.1116/1.572604 · Cited by 968
Calculations of nuclear stopping, ranges, and straggling in the low-energy region
Wilson, W. D., Haggmark, L. G., & Biersack, J. P. (1977) · Physical Review B · doi:10.1103/physrevb.15.2458 · Cited by 816
Grain Growth and Stress Relief in Thin Films
Chaudhari, P. (1972) · Journal of Vacuum Science and Technology · doi:10.1116/1.1316674 · Cited by 317
Aluminum films deposited by rf sputtering
D’Heurle, F. M. (1970) · Metallurgical Transactions · doi:10.1007/bf02811600 · Cited by 277
Internal stresses in Cr, Mo, Ta, and Pt films deposited by sputtering from a planar magnetron source
Hoffman, D. W., & Thornton, J. A. (1982) · Journal of Vacuum Science and Technology · doi:10.1116/1.571463 · Cited by 257
Modification of evaporated chromium by concurrent ion bombardment
Hoffman, D. W., & Gaerttner, M. R. (1980) · Journal of Vacuum Science and Technology · doi:10.1116/1.570473 · Cited by 156
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Hard amorphous (diamond-like) carbons
Robertson, J. (1991) · Progress in Solid State Chemistry · doi:10.1016/0079-6786(91)90002-h · Cited by 787
A Kinetic Model for Stress Generation in Thin Films Grown from Energetic Vapor Fluxes
Chason, E., Karlson, M., Colin, J. J., Magnfält, D., Sarakinos, K., & Abadias, G. (2016) · Journal of Applied Physics · doi:10.1063/1.4946039 · Cited by 90
Optical Properties and Mechanical Stress in SiO2/Nb2O5 Multilayers
Richter, F., Kupfer, H., Schlott, P., Gessner, T., & Kaufmann, C. (2001) · Thin Solid Films · doi:10.1016/s0040-6090(01)00864-1 · Cited by 73
Chen, H.-C., Chang, C.-H., & Chen, K.-H. (2024) · Applied Optics · doi:10.1364/ao.540615 · Cited by 8
Metadata
- Authors
- Windischmann, H.
- Venue
- Journal of Applied Physics
- Publisher
- AIP Publishing
- Published
- 1987-09-01
- Volume
- 62
- Issue
- 5
- Pages
- 1800-1807
- ISSN
- 0021-8979 (ISSN-L)
- 1089-7550
- OpenAlex
- W1992633939
- Cited by
- 403
- References
- 8
- FWCI
- 7.13
- Type
- journal article
- Language
- en
- Open access
- closed
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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