Total ionizing dose effect of γ-ray radiation on the switching characteristics and filament stability of HfOx resistive random access memory
Abstract
The total ionizing dose (TID) effect of gamma-ray (γ-ray) irradiation on HfOx based resistive random access memory was investigated by electrical and material characterizations. The memory states can sustain TID level ∼5.2 Mrad (HfO2) without significant change in the functionality or the switching characteristics under pulse cycling. However, the stability of the filament is weakened after irradiation as memory states are more vulnerable to flipping under the electrical stress. X-ray photoelectron spectroscopy was performed to ascertain the physical mechanism of the stability degradation, which is attributed to the Hf-O bond breaking by the high-energy γ-ray exposure.
Integrity signals
Registry
Cites
Statistics
Claims the paper makes
Claims other papers make about this one
Each is checked against this paper’s own text: does it say what the citing paper says it does?
The new mechanism based on ionic/atomic motion indicates that the TRNG may be less vulnerable to environmental variations such as radiation relative to other electron-based TRNGs.
“The new mechanism based on ionic/atomic motion indicates that our TRNG may be less vulnerable to environmental variations such as radiation relative to other electron-based TRNGs36.”
From A novel true random number generator based on a stochastic diffusive memristor (2017) · cites this paper as [36]
Our diffusive memristor TRNG (like all other memristive-switching-based TRNG) could be more resistant to harsh environments than other electron-based TRNGs.
“which suggests that our diffusive memristor TRNG (like all other memristive-switching-based TRNG) could be more resistant to harsh environments than other electron-based TRNGs36.”
From A novel true random number generator based on a stochastic diffusive memristor (2017) · cites this paper as [36]
Cites
Redox‐Based Resistive Switching Memories – Nanoionic Mechanisms, Prospects, and Challenges
Waser, R., Dittmann, R., Staikov, G., & Szot, K. (2009) · Advanced Materials · doi:10.1002/adma.200900375 · Cited by 5,080 · see citing works
Memristive devices for computing
Yang, J. J., Strukov, D. B., & Stewart, D. R. (2013) · Nature Nanotechnology · doi:10.1038/nnano.2012.240 · Cited by 3,885 · see citing works
Wong, H.-S. P., Lee, H.-Y., Yu, S., Chen, Y.-S., Wu, Y., Chen, P.-S., Lee, B., Chen, F. T., & Tsai, M.-J. (2012) · Proceedings of the IEEE · doi:10.1109/jproc.2012.2190369 · Cited by 2,757 · see citing works
Self-citationSystematic XPS studies of metal oxides, hydroxides and peroxides
Dupin, J., Gonbeau, D., Vinatier, P., & Levasseur, A. (2000) · Physical Chemistry Chemical Physics · doi:10.1039/a908800h · Cited by 2,254 · see citing works
Govoreanu, B., Kar, G. S., Chen, Y., Paraschiv, V., Kubicek, S., Fantini, A., Radu, I. P., Goux, L., Clima, S., Degraeve, R., et al. (2011) · Technical digest - International Electron Devices Meeting/Technical digest · doi:10.1109/iedm.2011.6131652 · Cited by 623 · see citing works
Ielmini, D. (2011) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2011.2167513 · Cited by 549 · see citing works
Guan, X., Yu, S., & Wong, H.-S. P. (2012) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2012.2184545 · Cited by 355 · see citing works
Self-citationLee, H. Y., Chen, Y. S., Chen, P. S., Gu, P. Y., Hsu, Y. Y., Wang, S. M., Liu, W. H., Tsai, C.-H., Sheu, S. S., Chiang, P. C., et al. (2010) · Technical digest - International Electron Devices Meeting/Technical digest · doi:10.1109/iedm.2010.5703395 · Cited by 264 · see citing works
Self-citationUnified Physical Model of Bipolar Oxide-Based Resistive Switching Memory
Gao, B., Sun, B., Zhang, H., Liu, L., Liu, X., Han, R., Kang, J., & Yu, B. (2009) · IEEE Electron Device Letters · doi:10.1109/led.2009.2032308 · Cited by 178 · see citing works
Radiation Effects in Flash Memories
Gerardin, S., Bagatin, M., Paccagnella, A., Grürmann, K., Gliem, F., Oldham, T. R., Irom, F., & Nguyen, D. N. (2013) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2013.2254497 · Cited by 154 · see citing works
Bi, J., Han, Z., Zhang, E. X., McCurdy, M. W., Reed, R. A., Schrimpf, R. D., Fleetwood, D. M., Alles, M. L., Weller, R. A., Linten, D., et al. (2013) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2013.2289369 · Cited by 105 · see citing works
Lin, Y., Zeng, F., Tang, S., Liu, H. Y., Chen, C., Gao, S., Wang, Y. G., & Pan, F. (2013) · Journal of Applied Physics · doi:10.1063/1.4791695 · Cited by 99 · see citing works
Chang, M., Wu, C.-W., Kuo, C.-C., Shen, S.-J., Lin, K.-F., Yang, S.-M., King, Y., Lin, C.-J., & Chih, Y.-D. (2012) · Digest of technical papers/Digest of technical papers - IEEE International Solid-State Circuits Conference · doi:10.1109/isscc.2012.6177079 · Cited by 86 · see citing works
Highly Stable Radiation-Hardened Resistive-Switching Memory
Wang, Y., Lv, H., Wang, W., Liu, Q., Long, S., Wang, Q., Huo, Z., Zhang, S., Li, Y., Zuo, Q., et al. (2010) · IEEE Electron Device Letters · doi:10.1109/led.2010.2081340 · Cited by 80 · see citing works
Marinella, M. J., Dalton, S. M., Mickel, P. R., Dodd, P. E., Shaneyfelt, M. R., Bielejec, E. S., Vizkelethy, G., & Kotula, P. G. (2012) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2012.2224377 · Cited by 76 · see citing works
Radiation Hardness of ${\rm TiO}_{2}$ Memristive Junctions
Tong, W. M., Yang, J. J., Kuekes, P. J., Stewart, D. R., Williams, R. S., DeIonno, E., King, E. E., Witczak, S. C., Looper, M. D., & Osborn, J. V. (2010) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2010.2045768 · Cited by 74 · see citing works
Proton-based total-dose irradiation effects on Cu/HfO2:Cu/Pt ReRAM devices
Butcher, B., He, X., Huang, M., Wang, Y., Liu, Q., Lv, H., Liu, M., & Wang, W. (2010) · Nanotechnology · doi:10.1088/0957-4484/21/47/475206 · Cited by 56 · see citing works
Yu, S., Wu, Y., Chai, Y., Provine, J., & Wong, H. ‐. P. (2011) · International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) · doi:10.1109/vtsa.2011.5872251 · Cited by 56 · see citing works
Self-citationTotal Ionizing Dose (TID) Effects on $\hbox{TaO}_{x}$ -Based Resistance Change Memory
Zhang, L., Huang, R., Gao, D., Yue, P., Tang, P., Tan, F., Cai, Y., & Wang, Y. (2011) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2011.2148121 · Cited by 55 · see citing works
Impact of Alpha Particles on the Electrical Characteristics of TiO$_{2}$ Memristors
Barnaby, H., Malley, S. T., Land, M., Charnicki, S., Kathuria, A., Wilkens, B. J., DeIonno, E., & Tong, W. M. (2011) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2011.2168827 · Cited by 48 · see citing works
Self-citationGonzalez-Velo, Y., Barnaby, H., Kozicki, M. N., Dandamudi, P., Chandran, A., Holbert, K. E., Mitkova, M. I., & Ailavajhala, M. S. (2013) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2013.2286318 · Cited by 38 · see citing works
Self-citationDisplacement Damage in TiO $_{2}$ Memristor Devices
DeIonno, E., Looper, M. D., Osborn, J. V., & Palko, J. W. (2013) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2013.2249529 · Cited by 34 · see citing works
Joshi, U. S., Trivedi, S. J., Bhavsar, K. H., Trivedi, U. N., Khan, S. A., & Avasthi, D. K. (2009) · Journal of Applied Physics · doi:10.1063/1.3093683 · Cited by 31 · see citing works
Tan, F., Huang, R., An, X., Cai, Y., Pan, Y., Wu, W., Feng, H., Zhang, X., & Wang, Y. (2013) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2013.2287615 · Cited by 24 · see citing works
Radiation effects studies on thin film TiO2 memristor devices
DeIonno, E., Looper, M. D., Osborn, J. V., Barnaby, H., & Tong, W. M. (2013) · IEEE Aerospace Conference (AERO) · doi:10.1109/aero.2013.6497378 · Cited by 17 · see citing works
Self-citationHeavy ion radiation effects on TiN/HfO2/W resistive random access memory
He, X., & Geer, R. E. (2013) · Proceedings - IEEE Aerospace Conference · doi:10.1109/aero.2013.6497401 · Cited by 11 · see citing works
Flagged first, then by citations
Cited by
Sorted by citations
Emerging Memory Technologies: Recent Trends and Prospects
Yu, S., & Chen, P.-Y. (2016) · IEEE Solid-State Circuits Magazine · doi:10.1109/mssc.2016.2546199 · Cited by 559 · see citing works
Self-citationA novel true random number generator based on a stochastic diffusive memristor
Jiang, H., Belkin, D., Savel’ev, S. E., Lin, S., Wang, Z., Li, Y., Joshi, S., Midya, R., Li, C., Rao, M., et al. (2017) · Nature Communications · doi:10.1038/s41467-017-00869-x · Cited by 459 · see citing works
Low-power electronic technologies for harsh radiation environments
Prinzie, J., Simanjuntak, F. M., Leroux, P., & Prodromakis, T. (2021) · Nature Electronics · doi:10.1038/s41928-021-00562-4 · Cited by 136 · see citing works
Low-Temperature Characteristics of HfOx-Based Resistive Random Access Memory
Fang, R., Chen, W., Gao, L., Yu, W., & Yu, S. (2015) · IEEE Electron Device Letters · doi:10.1109/led.2015.2420665 · Cited by 119 · see citing works
Self-citationKu, B., Abbas, Y., Sokolov, A. S., & Choi, C. (2017) · Journal of Alloys and Compounds · doi:10.1016/j.jallcom.2017.11.267 · Cited by 116 · see citing works
Reconfigurable Memristive Device Technologies
Edwards, A. H., Barnaby, H., Campbell, K. A., Kozicki, M. N., Liu, W., & Marinella, M. J. (2015) · Proceedings of the IEEE · doi:10.1109/jproc.2015.2441752 · Cited by 82 · see citing works
Self-citationRadiation Effects in Advanced and Emerging Nonvolatile Memories
Marinella, M. J. (2021) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2021.3074139 · Cited by 70 · see citing works
Woo, K. S., Wang, Y., Kim, J., Kim, Y., Kwon, Y. J., Yoon, J. H., Kim, W., & Hwang, C. S. (2019) · Advanced Electronic Materials · doi:10.1002/aelm.201800543 · Cited by 64 · see citing works
Review of radiation effects on ReRAM devices and technology
Gonzalez-Velo, Y., Barnaby, H., & Kozicki, M. N. (2017) · Semiconductor Science and Technology · doi:10.1088/1361-6641/aa6124 · Cited by 54 · see citing works
Self-citationSokolov, A., Jeon, Y.-R., Ku, B., & Choi, C. (2020) · Journal of Alloys and Compounds · doi:10.1016/j.jallcom.2019.153625 · Cited by 49 · see citing works
SiO2 based conductive bridging random access memory
Chen, W., Tappertzhofen, S., Barnaby, H., & Kozicki, M. N. (2017) · Journal of Electroceramics · doi:10.1007/s10832-017-0070-5 · Cited by 49 · see citing works
Self-citationHeavy Ion Radiation Effects on Hafnium Oxide-Based Resistive Random Access Memory
Petzold, S., Sharath, S. U., Lemke, J., Hildebrandt, E., Trautmann, C., & Alff, L. (2019) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2019.2908637 · Cited by 42 · see citing works
Total Ionizing Dose Hardened and Mitigation Strategies in Deep Submicrometer CMOS and Beyond
Chatzikyriakou, E., Morgan, K. A., & de Groot, C. H. (2018) · IEEE Transactions on Electron Devices · doi:10.1109/ted.2018.2792305 · Cited by 40 · see citing works
Integrated Crossbar Array With Resistive Synapses and Oscillation Neurons
Woo, J., Wang, P., & Yu, S. (2019) · IEEE Electron Device Letters · doi:10.1109/led.2019.2921656 · Cited by 36 · see citing works
Self-citationSub-10 fJ/bit radiation-hard nanoelectromechanical non-volatile memory
Lee, Y., Kang, M., Choi, P., Kim, S., Kim, T.-S., Lee, S., & Yoon, J. (2023) · Nature Communications · doi:10.1038/s41467-023-36076-0 · Cited by 32 · see citing works
A Study of Gamma-Ray Exposure of Cu–SiO$_2$ Programmable Metallization Cells
Chen, W., Barnaby, H., Kozicki, M. N., Edwards, A. H., Gonzalez-Velo, Y., Fang, R., Holbert, K. E., Yu, S., & Yu, W. (2015) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2015.2478883 · Cited by 27 · see citing works
Self-citationAtomic Layer Deposition Films for Resistive Random‐Access Memories
Hao, C., Peng, J., Zierold, R., & Blick, R. H. (2024) · Advanced Materials Technologies · doi:10.1002/admt.202301762 · Cited by 25 · see citing works
Vogel, T., Kaiser, N., Petzold, S., Piros, E., Guillaume, N., Lefèvre, G., Charpin-Nicolle, C., David, S., Vallée, C., Nowak, E., et al. (2021) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2021.3085962 · Cited by 26 · see citing works
Structural and Electrical Response of Emerging Memories Exposed to Heavy Ion Radiation
Vogel, T., Zintler, A., Kaiser, N., Guillaume, N., Lefèvre, G., Lederer, M., Serra, A., Piros, E., Kim, T., Schreyer, P., et al. (2022) · ACS Nano · doi:10.1021/acsnano.2c04841 · Cited by 24 · see citing works
Evaluation of Radiation Effects in RRAM-Based Neuromorphic Computing System for Inference
Ye, Z., Liu, R., Taggart, J., Barnaby, H., & Yu, S.-M. (2019) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2018.2886793 · Cited by 19 · see citing works
Self-citationSwitching kinetics of SiC resistive memory for harsh environments
Morgan, K. A., Fan, J., Huang, R., Li, Z., Gowers, R. P., Jiang, L., & de Groot, C. H. (2015) · AIP Advances · doi:10.1063/1.4926674 · Cited by 23 · see citing works
Yadav, D., Dwivedi, A. K., Verma, S., & Avasthi, D. K. (2024) · Journal of Science Advanced Materials and Devices · doi:10.1016/j.jsamd.2024.100813 · Cited by 20 · see citing works
Resistive switching behavior in oxygen ion irradiated TiO 2− x films
Barman, A. R., Saini, C. P., Sarkar, P. K., Bhattacharjee, G., Bhattacharya, G., Srivastava, S. B., Satpati, B., Kanjilal, D., Ghosh, S. K., Dhar, S., et al. (2018) · Journal of Physics D Applied Physics · doi:10.1088/1361-6463/aaa559 · Cited by 19 · see citing works
Gao, L., Holbert, K. E., & Yu, S. (2017) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2017.2700434 · Cited by 18 · see citing works
Self-citationγ-Ray Radiation Effects on an HfO2-Based Resistive Memory Device
Hu, S., Hosaka, S., Liu, Y., Chen, T. P., Guo, Q., Li, Y., Zhang, X., Deng, L. J., Yu, Q., & Yin, Y. (2017) · IEEE Transactions on Nanotechnology · doi:10.1109/tnano.2017.2661818 · Cited by 17 · see citing works
Influence of Total Ionizing Dose on Magnetic Tunnel Junctions With Perpendicular Anisotropy
Zink, B. R., Yang-Scharlotta, J., Mancoff, F. B., Sun, J. J., Han, M., & Wang, J. (2020) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2020.3043422 · Cited by 16 · see citing works
Lederer, M., Vogel, T., Kämpfe, T., Kaiser, N., Piros, E., Olivo, R. R., Ali, T., Petzold, S., Lehninger, D., Trautmann, C., et al. (2022) · Journal of Applied Physics · doi:10.1063/5.0098953 · Cited by 15 · see citing works
Total ionizing dose effects on resistance stability of Pt/HfO2/Al2O3/TiN structure RRAM devices
Luo, H., Liang, Y., Tang, M., Li, G., Xiong, Y., Sun, Y., Liu, Y., Ouyang, S., Xiao, Y., Yan, S., et al. (2020) · Microelectronics Reliability · doi:10.1016/j.microrel.2020.113592 · Cited by 15 · see citing works
A radiation-hardening Ta/Ta2O5-x/Al2O3/InGaZnO4 memristor for harsh electronics
Wang, J., Ren, D., Zhang, Z., Xiang, H., Zhao, J., Zhou, Z., Li, X., Wang, H., Zhang, L., Zhao, M., et al. (2018) · Applied Physics Letters · doi:10.1063/1.5045649 · Cited by 15 · see citing works
Korkian, G., León, D., Franco, F. J., Fabero, J. C., Létiche, M., Morilla, Y., Holgado, P. M., Puchner, H., Mecha, H., & Clemente, J. A. (2022) · IEEE Access · doi:10.1109/access.2022.3217527 · Cited by 14 · see citing works
Chen, W., Fang, R., Barnaby, H., Balaban, M. B., Gonzalez-Velo, Y., Taggart, J., Mahmud, A., Holbert, K. E., Edwards, A. H., & Kozicki, M. N. (2016) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2016.2618359 · Cited by 13 · see citing works
Self-citationTotal ionizing dose and single event effects of 1 Mb HfO2-based resistive-random-access memory
Bi, J., Duan, Y., Xi, K., & Li, B. (2018) · Microelectronics Reliability · doi:10.1016/j.microrel.2018.07.017 · Cited by 13 · see citing works
García, H., González, M. B., Mallol, M. M., Castán, H., Dueñas, S., Campabadal, F., Acero, M. C., Salomone, L. S., & Faigón, A. (2018) · Journal of Electronic Materials · doi:10.1007/s11664-018-6257-y · Cited by 12 · see citing works
Total Dose Hardness of ${\rm TiN}/{\rm HfO}_{\rm x}/{\rm TiN}$ Resistive Random Access Memory
Morgan, K. A., Huang, R., Potter, K., Shaw, C., Redman-White, W., & de Groot, C. H. (2014) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2014.2365058 · Cited by 11 · see citing works
McCrory, D. J., Lenahan, P. M., Nminibapiel, D., Veksler, D. B., Ryan, J. T., & Campbell, J. P. (2018) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2018.2820907 · Cited by 11 · see citing works
Total Ionizing Dose Effects on Multistate HfOₓ-Based RRAM Synaptic Array
Han, X., Privat, A., Holbert, K. E., Seo, J.-S., Yu, S., & Barnaby, H. (2021) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2021.3072285 · Cited by 10 · see citing works
Self-citationLorentz Force-Actuated Bidirectional Nanoelectromechanical Switch with an Ultralow Operation Voltage
Li, D., Jiang, Y., Zhang, Y., Wang, J., & Yu, L. (2024) · Nano Letters · doi:10.1021/acs.nanolett.4c01999 · Cited by 9 · see citing works
Impact of γ-ray irradiation on graphene nano-disc non-volatile memory
Xi, K., Bi, J., Hu, Y., Li, B., Liu, J., Xu, Y., & LIU, M. S. M. Y. (2018) · Applied Physics Letters · doi:10.1063/1.5050054 · Cited by 9 · see citing works
Song, H., Ni, K., Tang, Y. J., Wang, J., Guo, H., & Zhong, X. (2021) · Radiation Physics and Chemistry · doi:10.1016/j.radphyschem.2021.109394 · Cited by 8 · see citing works
Shinde, S. J., Waikar, M. R., Gurav, S. R., Patil, S. L., Ghongade, S. D., Bagwan, A. M., Sonkawade, A. R., Sonker, R. K., Kamat, R. K., Dongale, T. D., et al. (2024) · Materials Science in Semiconductor Processing · doi:10.1016/j.mssp.2024.108298 · Cited by 7 · see citing works
Hughart, D. R., Pacheco, J. L., Lohn, A. J., Mickel, P. R., Bielejec, E. S., Vizkelethy, G., Doyle, B. L., Wolfley, S. L., Dodd, P. E., Shaneyfelt, M. R., et al. (2014) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2014.2365139 · Cited by 7 · see citing works
Lupo, N., Pérez, E., Wenger, C., Maloberti, F., & Bonizzoni, E. (2018) · IEEE Transactions on Circuits and Systems I Regular Papers · doi:10.1109/tcsi.2018.2882993 · Cited by 7 · see citing works
Harmatha, L., Mikolášek, M., Stuchlíková, Ł., Kosa, A., Žiška, M., Hrubčín, L., & Skuratov, V. A. (2015) · Journal of Electrical Engineering · doi:10.2478/jee-2015-0053 · Cited by 6 · see citing works
Overview of the radiation response of anion-based memristive devices
McLain, M. L., & Marinella, M. J. (2015) · IEEE Aerospace Conference (AERO) · doi:10.1109/aero.2015.7119304 · Cited by 5 · see citing works
Xu, Z. G., Liu, J., Dong, D., Yu, Z., Song, J., Liou, J. J., Xu, X., & Yang, X. (2020) · IEEE Electron Device Letters · doi:10.1109/led.2020.3037072 · Cited by 5 · see citing works
Belov, A. I., Mikhaylov, A. N., Korolev, D. S., Guseinov, D. V., Gryaznov, E., Okulich, E., Sergeev, V. A., Antonov, I. N., Kasatkin, A. P., Gorshkov, O. N., et al. (2016) · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · doi:10.1016/j.nimb.2016.02.054 · Cited by 5 · see citing works
Effects of high energy heavy ion irradiation on resistive switches
Guo, X., Liu, J., Wang, Q., & He, D. (2020) · Microelectronic Engineering · doi:10.1016/j.mee.2020.111393 · Cited by 5 · see citing works
Gamma Radiation Effects on HfO2-based RRAM Devices
Maestro-Izquierdo, M., González, M. B., Holgado, P. M., Morilla, Y., & Campabadal, F. (2021) · Spanish Conference on Electron Devices · doi:10.1109/cde52135.2021.9455719 · Cited by 5 · see citing works
The effect of γ -rays irradiation on the electrical properties of WO x film-based memory cells
Duan, W., Wang, J., & Zhong, X. (2017) · Europhysics Letters (EPL) · doi:10.1209/0295-5075/119/27003 · Cited by 5 · see citing works
Comparison of Radiation Effects in Custom and Commercially Fabricated Resistive Memory Devices
Holt, J. S., Alamgir, Z. M., Beckmann, K., Suguitan, N., Russell, S., Iler, E., Bakhru, H., Bielejec, E. S., Jacobs-Gedrim, R. B., Hughart, D. R., et al. (2019) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2019.2950199 · Cited by 5 · see citing works
Multi-Level Programming on Radiation-Hard 1T1R Memristive Devices for In-Memory Computing
Quesada, E. P.-B., Rizzi, T., Gupta, A., Mahadevaiah, M. K., Schubert, A., Pechmann, S., Jia, R., Uhlmann, M., Hagelauer, A., Wenger, C., et al. (2023) · Spanish Conference on Electron Devices · doi:10.1109/cde58627.2023.10339525 · Cited by 4 · see citing works
γ-Ray-Induced Effects in Al:HfO₂-Based Memristor Devices for Memory and Sensor Applications
Prasad, O. K., Chandrasekaran, S., Napari, M., Purnama, I., Nugroho, A., Georgiadou, D. G., Chung, C., Chang, K., & Simanjuntak, F. M. (2024) · IEEE Electron Device Letters · doi:10.1109/led.2024.3454294 · Cited by 4 · see citing works
Okulich, E. V., Koryazhkina, M. N., Korolev, D. S., Belov, A. I., Шенина, М. Е., Mikhaylov, A. N., Tetelbaum, D. I., Antonov, I. N., & Dudin, Y. A. (2019) · Technical Physics Letters · doi:10.1134/s1063785019070253 · Cited by 4 · see citing works
γ-ray irradiation effects on TiN/HfOx/Pt resistive random access memory devices
Yuan, F., Shen, S. C., & Zhang, Z. (2015) · IEEE Aerospace Conference (AERO) · doi:10.1109/aero.2015.7119258 · Cited by 4 · see citing works
Fang, R., Gonzalez-Velo, Y., Chen, W., Holbert, K. E., Kozicki, M. N., Barnaby, H., & Yu, S. (2014) · Applied Physics Letters · doi:10.1063/1.4879844 · Cited by 4 · see citing works
Self-citationTotal ionizing dose radiation effect of HfO2/TaOx-based resistive random-access memories
Duan, X., Qing, Y., Wang, Y., Hong, R., Chen, J., Yang, P., Yin, Y., Zhou, X., Liu, X., & Jiang, B. (2025) · Microelectronics Reliability · doi:10.1016/j.microrel.2025.115590 · Cited by 3 · see citing works
Effect of Gamma Radiation on TaOₓ ECRAM
Faruque, H. M. R., Bennett, C. H., Oh, S., Jalbert, A. J., Zutter, B. T., Siath, M., Neuendank, J., Spear, M. E., Xiao, T. P., Hughart, D. R., et al. (2025) · IEEE Transactions on Nuclear Science · doi:10.1109/tns.2025.3546663 · Cited by 3 · see citing works
Self-citationSchreyer, P., Lehninger, D., Vogel, T., Zhang, T., Kim, T., Piros, E., Li, Y., Duan, Y., Lederer, M., Seidel, K., et al. (2025) · Advanced Electronic Materials · doi:10.1002/aelm.202500631 · Cited by 3 · see citing works
CMOS‐Compatible HfOx‐Based Radiation Hardening Component for Neuromorphic Computing Applications
Chang, Y., Huang, Y., Chung, C., & Chen, Y. (2025) · Advanced Electronic Materials · doi:10.1002/aelm.202400823 · Cited by 3 · see citing works
Gobet, F., Gardelle, J., Versteegen, M., Courtois, L., Leblanc, S., & Méot, V. (2020) · Applied Physics Letters · doi:10.1063/1.5141476 · Cited by 3 · see citing works
Pulsed-laser testing for single event effects in a stand-alone resistive random access memory
Xi, K., Feng, Z., Li, J., Ji, L., Cong, F., Liu, J., Ming, L., & Jinshun, B. (2017) · IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) · doi:10.1109/ipfa.2017.8060178 · Cited by 3 · see citing works
Castellani-Coulié, K., Aziza, H., & Rahajandraibe, W. (2023) · Journal of Electronic Testing · doi:10.1007/s10836-023-06068-5 · Cited by 3 · see citing works
Improved performance of flexible citrus resistive memory device through air plasma
Chang, Y., Jian, J.-C., Hsu, Y. L., Choy, W. C. H., Chang, S.-P., & Chang, S. (2022) · Flexible and Printed Electronics · doi:10.1088/2058-8585/ac4f29 · Cited by 2 · see citing works
Conductive Filament Variation of RRAM and Its Impact on Single Event Upset
Vijay, H. M., & Ramakrishnan, V. N. (2021) · Transactions on Electrical and Electronic Materials · doi:10.1007/s42341-021-00343-y · Cited by 2 · see citing works
Enabling Radiation Hardness in Solid-State NAND Storage Utilizing a Laminated Ferroelectric Stack
Fernandes, L., Wodzro, S. E., Ravindran, P. V., Ravikumar, P. G., Lee, M., Shon, M., Chakraborty, D., Song, T., Kang, S., Soliman, S., et al. (2026) · Nano Letters · doi:10.1021/acs.nanolett.5c05947 · Cited by 1 · see citing works
Self-citationTotal ionizing dose effects on Ag/ amorphous Bi3.15Nd0.85Ti3O12/Pt resistive switching memory
Song, H., Yan, W. Z., Zhong, X. L., Zheng, S., Yang, S., Xue, Y., Wang, G., Guo, H. X., & Wang, J. (2018) · Materials Chemistry and Physics · doi:10.1016/j.matchemphys.2018.08.015 · Cited by 1 · see citing works
Total Ionizing Dose Effects on HfO2-based Memristors
Holgado, P. M., Maestro-Izquierdo, M., González, M. B., Morilla, Y., & Campabadal, F. (2020) · European Conference on Radiation and Its Effects on Components and Systems · doi:10.1109/radecs50773.2020.9857731 · Cited by 1 · see citing works
Defect Induced Aging and Breakdown in High-k Dielectrics
Fang, R. (2018)
Self-citationOkulich, E., Коряжкина, М. Н., Korolev, D. S., Белов, А. И., Шенина, М. Е., Михайлов, А. Н., Tetelbaum, D. I., Antonov, I. N., & Дудин, Ю. А. (2019) · Письма в журнал технической физики · doi:10.21883/pjtf.2019.14.48012.17807
Investigation of Single Event Effects in a Resistive RAM memory array by SPICE level simulation
Castellani-Coulié, K., Aziza, H., & Rahajandraibe, W. (2021) · IEEE Latin American Test Symposium (LATS) · doi:10.1109/lats53581.2021.9651871
SiO2-Based Conductive-Bridging Random Access Memory
Chen, W., Tappertzhofen, S., Barnaby, H., & Kozicki, M. N. (2021) · Kluwer international series in electronic materials: science and technology · doi:10.1007/978-3-030-42424-4_7
Self-citationThe effect of external stimuli on the performance of memristive oxides
Li, Y., Christensen, D. V., Sanna, S., Esposito, V., & Pryds, N. (2022) · Elsevier eBooks · doi:10.1016/b978-0-12-814629-3.00011-8
Radiation-Enhanced Multi-Level Cell Behavior in TaOx/NiO-based Resistive Random Access Memory
Sari, J. K., Huang, C.-Y., & Chung, C. (2023) · European Conference on Radiation and Its Effects on Components and Systems · doi:10.1109/radecs59069.2023.10767028
- Authors
- Fang, R., Gonzalez Velo, Y., Chen, W., Holbert, K. E., Kozicki, M. N., Barnaby, H., & Yu, S.
- Affiliations
- Arizona State University (US)
- Arizona State University 2 School of Electrical, Computer, and Energy Engineering, , Tempe, Arizona 85287, USA
- Venue
- Applied Physics Letters
- Publisher
- AIP Publishing
- Published
- 2014-05-05
- Volume
- 104
- Issue
- 18
- ISSN
- 0003-6951 (ISSN-L)
- 1077-3118
- OpenAlex
- W1985772533
- Cited by
- 74
- References
- 26
- Citations by year
- 2026: 1 · 2025: 4 · 2024: 5 · 2023: 4 · 2022: 5 · 2021: 9 · 2020: 7 · 2019: 5 · 2018: 13 · 2017: 8 · 2016: 3 · 2015: 7 · 2014: 3
- FWCI
- 3.72
- Type
- journal article
- Language
- en
- Update notices
- correction (2014-05-30)
- Open access
- closed
- Locations
- Applied Physics Letters (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Advanced Memory and Neural Computing
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Radiation Effects in Electronics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Ferroelectric and Negative Capacitance Devices
- Keywords
- total ionizing dose, gamma irradiation, filament stability, switching characteristics
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review