Student or educator? Sign up with your school email and get 6 months of Pro free.
Cited by 451

The DOI matches its Crossref record; 25 of the 25 references it cites were found in a registry or an index.

The intrinsic stress of polycrystalline and epitaxial thin metal films

Koch, R·1994·Journal of Physics: Condensed Matter

Abstract

It is well known that thin films develop large intrinsic stress during their preparation. The intrinsic stress either originates from strained regions within the films (grain boundaries, dislocations, voids, impurities, etc.) or at the film/substrate (lattice mismatch, different thermal expansion, etc) and film/vacuum interfaces (surface stress, adsorption, etc.) or is due to dynamic processes (recrystallization, interdiffusion, etc). Since the magnitude of most of these stress contributions is directly related to film morphology, important structural information can be extracted from measurements of the intrinsic stress. This article presents a thorough discussion of today's understanding of the growth of thin films and reviews the related atomistic mechanisms responsible for intrinsic stress. On the basis of these ideas recent experimental results on the intrinsic stress of UHV deposited polycrystalline and epitaxial thin metal films are discussed. Depending on the respective growth mode of the films-Volmer-Weber, Stranski-Krastanov and Frank-Van der Merwe modes-characteristic stress behaviours are observed. In situ intrinsic stress measurements are therefore a promising new technique to gain additional insight into film growth.

Overview

The claims and statistics of this paper haven’t been checked yet.

Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.

A few free checks a day · papers already verified open instantly · results are public

Integrity signals

Registry

Crossref · 10.1088/0953-8984/6/45/005

Cites

25 of 25 references verified0 citation errors · 0 not checkable

Statistics

Verification

Claims the paper makes

The claims and statistics of this paper haven’t been checked yet.

Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.

A few free checks a day · papers already verified open instantly · results are public

Self-check

Percentages, sums and reported differences re-computed from the paper’s own numbers.

The self-check needs the paper’s full text.

Citations

Cites

Show all 25 references

Cited by

See all 451

Metadata

Authors
Koch, R.
Venue
Journal of Physics: Condensed Matter
Published
1994-11-07
Volume
6
Issue
45
Pages
9519-9550
ISSN
  • 0953-8984 (ISSN-L)
  • 1361-648X
OpenAlex
W1972074028
Cited by
451
References
25
FWCI
12.92
Type
journal article
Language
en
Open access
closed

About these checks

Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.

Statistics and arithmetic are recomputed, not judged.

Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.

What counts as a claim ›How we measure confidence ›How we check this ›

Are you an author, or do you see a problem with this page? Request a review

How to cite

Cite CoChat for the checks on this page, and the paper for its own findings.

This page
CoChat. (2026). Citation check: The intrinsic stress of polycrystalline and epitaxial thin metal films. https://app.cochat.ai/papers/10.1088/0953-8984/6/45/005
The paper
Koch, R. (1994). The intrinsic stress of polycrystalline and epitaxial thin metal films. Journal of Physics: Condensed Matter. https://doi.org/10.1088/0953-8984/6/45/005

Data sources

Bibliographic data: Semantic Scholar, OpenAlex, Crossref.

Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.