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Cited by 979

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SU-8: a low-cost negative resist for MEMS

Open access
Lorenz, H, Despont, M, Fahrni, N, LaBianca, N, Renaud, P, Vettiger, P·1997·Journal of Micromechanics and Microengineering

Abstract

This paper describes the characterization of a home-made negative photoresist developed by IBM. This resist, called SU-8, can be produced with commercially available materials. Three blends were prepared for this article and some of its optical and mechanical properties are presented. One of its numerous advantages is the broad range of thicknesses which can be obtained in one spin: from 750 nm to with a conventional spin coater. The resist is exposed with a standard UV aligner and has an outstanding aspect ratio near 15 for lines and 10 for trenches. These ratios combined with the electroplating of copper allow the fabrication of highly integrated electromagnetic coils.

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Metadata

Authors
Lorenz, H., Despont, M., Fahrni, N., LaBianca, N., Renaud, P., & Vettiger, P.
Venue
Journal of Micromechanics and Microengineering
Published
1997-09-01
Volume
7
Issue
3
Pages
121-124
ISSN
  • 0960-1317 (ISSN-L)
  • 1361-6439
OpenAlex
W2082983861
Cited by
979
References
0
FWCI
15.58
Type
journal article
Language
en
Open access
bronze

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CoChat. (2026). Citation check: SU-8: a low-cost negative resist for MEMS. https://app.cochat.ai/papers/10.1088/0960-1317/7/3/010
The paper
Lorenz, H., Despont, M., Fahrni, N., LaBianca, N., Renaud, P., & Vettiger, P. (1997). SU-8: a low-cost negative resist for MEMS. Journal of Micromechanics and Microengineering. https://doi.org/10.1088/0960-1317/7/3/010

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.