The DOI matches its Crossref record; 3 of the 3 references it cites were found in a registry or an index.
Towards the fabrication of phosphorus qubits for a silicon quantum computer
Open accessAbstract
The quest to build a quantum computer has been inspired by the recognition of the formidable computational power such a device could offer. In particular silicon-based proposals, using the nuclear or electron spin of dopants as qubits, are attractive due to the long spin relaxation times involved, their scalability, and the ease of integration with existing silicon technology. Fabrication of such devices, however, requires atomic scale manipulation --- an immense technological challenge. We demonstrate that it is possible to fabricate an atomically precise linear array of single phosphorus bearing molecules on a silicon surface with the required dimensions for the fabrication of a silicon-based quantum computer. We also discuss strategies for the encapsulation of these phosphorus atoms by subsequent silicon crystal growth.
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Citations
Cites
Quantum computation with quantum dots
Loss, D., & DiVincenzo, D. P. (1998) · Physical Review A · doi:10.1103/physreva.57.120 · Cited by 6,840
A silicon-based nuclear spin quantum computer
Kane, B. E. (1998) · Nature · doi:10.1038/30156 · Cited by 3,779
Self-citationExperimental realization of a quantum algorithm
Chuang, I. L., Vandersypen, L. M. K., Zhou, X., Leung, D. W., & Lloyd, S. (1998) · Nature · doi:10.1038/30181 · Cited by 604
Cited by
Ladd, T. D., Jelezko, F., Laflamme, R., Nakamura, Y., Monroe, C., & O’Brien, J. L. (2010) · Nature · doi:10.1038/nature08812 · Cited by 3,592
Self-citationQuantum technology: the second quantum revolution
Dowling, J. P., & Milburn, G. J. (2003) · Philosophical Transactions of the Royal Society of London. Series A: Mathematical, Physical and Engineering Sciences · doi:10.1098/rsta.2003.1227 · Cited by 1,046
Atomically Precise Placement of Single Dopants in Si
Schofield, S. R., Curson, N. J., Simmons, M. Y., Rueß, F. J., Hallam, T., Oberbeck, L., & Clark, R. G. (2003) · Physical Review Letters · doi:10.1103/physrevlett.91.136104 · Cited by 398
Self-citationResistless EUV lithography: Photon-induced oxide patterning on silicon
Tseng, L.-T., Karadan, P., Kazazis, D., Constantinou, P. C., Stock, T. J. Z., Curson, N. J., Schofield, S. R., Muntwiler, M., Aeppli, G., & Ekinci, Y. (2023) · Science Advances · doi:10.1126/sciadv.adf5997 · Cited by 34
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Metadata
- Authors
- O’Brien, J. L., Schofield, S. R., Simmons, M. Y., Clark, R. G., Dzurak, A. S., Curson, N. J., Kane, B. E., McAlpine, N. S., Hawley, M. E., & Brown, G. W.
- Venue
- Physical Review B
- Publisher
- American Physical Society (APS)
- Published
- 2001-09-21
- Volume
- 64
- Issue
- 16
- ISSN
- 0163-1829 (ISSN-L)
- 1095-3795
- OpenAlex
- W1969703266
- Cited by
- 197
- References
- 3
- FWCI
- 12.02
- Type
- journal article
- Language
- en
- Open access
- green
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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