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The effect of surface passivation on the microwave characteristics of undoped AlGaN/GaN HEMTs

Green, B.M., Chu, K.K., Chumbes, E.M., Smart, J.A., Shealy, J.R., Eastman, L.F.·2000·IEEE Electron Device Letters

Abstract

Surface passivation of undoped AlGaN/CaN HEMT's reduces or eliminates the surface effects responsible for limiting both the RF current and breakdown voltages of the devices. Power measurements on a 2×125×0.5 μm AlGaN/GaN sapphire based HEMT demonstrate an increase in 4 GHz saturated output power from 1.0 W/mm [36% peak power-added efficiency (PAE)] to 2.0 W/mm (46% peak PAE) with 15 V applied to the drain in each case. Breakdown measurement data show a 25% average increase in breakdown voltage for 0.5 μm gate length HEMT's on the same wafer. Finally, 4 GHz power sweep data for a 2×75×0.4 μm AlGaN/GaN HEMT on sapphire processed using the Si3N4passivation layer produced 4.0 W/mm saturated output power at 41% PAE (25 V drain bias). This result represents the highest reported microwave power density for undoped sapphire substrated AlGaN/GaN HEMT's.

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Metadata

Authors
Green, B. M., Chu, K. K., Chumbes, E. M., Smart, J. A., Shealy, J. R., & Eastman, L. F.
Venue
IEEE Electron Device Letters
Published
2000-06
Volume
21
Issue
6
Pages
268-270
ISSN
  • 0741-3106 (ISSN-L)
  • 1558-0563
OpenAlex
W2103281872
Cited by
744
References
0
FWCI
37.69
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: The effect of surface passivation on the microwave characteristics of undoped AlGaN/GaN HEMTs. https://app.cochat.ai/papers/10.1109/55.843146
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Green, B. M., Chu, K. K., Chumbes, E. M., Smart, J. A., Shealy, J. R., & Eastman, L. F. (2000). The effect of surface passivation on the microwave characteristics of undoped AlGaN/GaN HEMTs. IEEE Electron Device Letters. https://doi.org/10.1109/55.843146

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