Position Control in Lithographic Equipment [Applications of Control]
Abstract
This article describes the basic optical principles in the lithographic tool, with the resulting positioning accuracy requirements. For three generations of lithographic tools, the mechatronic architecture and control implications are discussed. Then, six degrees of freedom (DOF) stage control is described with the main focus on actuator force decoupling, allowing the use of classical single-input, single-output (SISO) controllers.
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Cites
Cramming More Components onto Integrated Circuits (1965)
Moore, G. E. (2021) · The MIT Press eBooks · doi:10.7551/mitpress/12274.003.0027 · Cited by 6,274 · see citing works
Cramming More Components Onto Integrated Circuits
Moore, G. E. (1998) · Proceedings of the IEEE · doi:10.1109/jproc.1998.658762 · Cited by 5,954 · see citing works
Model-based feedforward for motion systems
Boerlage, M., Steinbuch, M., Lambrechts, P. P., et al. (2004) · IEEE Conference on Control Applications (CCA) · doi:10.1109/cca.2003.1223174 · Cited by 73 · see citing works
Extending optical lithography with immersion
Streefkerk, B., Baselmans, J., Ansem, W. F. G.-V., et al. (2004) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.534009 · Cited by 34 · see citing works
Performance results of a new generation of 300-mm lithography systems
Sluijk, B., Castenmiller, T., de Jongh, R. D. C., et al. (2001) · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · doi:10.1117/12.435752 · Cited by 29 · see citing works
Double patterning lithography: double the trouble or double the fun?
Zimmerman, P. (2009) · SPIE Newsroom · doi:10.1117/2.1200906.1691 · Cited by 27 · see citing works
Scanning stage technology for exposure tools
Butler, H., George, R. T., & Baselmans, J. J. (1999) · TU/e Research Portal · Cited by 3 · see citing works
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Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149 · see citing works
Exposure Tool Development Toward Advanced EUV Lithography: A Journey of 40 Years Driving Moore’s Law
Schoot, J. V. (2024) · IEEE Electron Devices Magazine · doi:10.1109/med.2023.3337129 · Cited by 25 · see citing works
- Authors
- Butler, H.
- Affiliations
- Zhejiang Ocean University (CN)
- Corresponding author
- Hans Butler
- ORCID
- Hans Butler
- Venue
- IEEE Control Systems
- Published
- 2011-10
- Volume
- 31
- Issue
- 5
- Pages
- 28-47
- ISSN
- 1066-033X (ISSN-L)
- 1941-000X
- OpenAlex
- W1974984002
- Cited by
- 423
- References
- 7
- Citations by year
- 2026: 17 · 2025: 35 · 2024: 45 · 2023: 35 · 2022: 25 · 2021: 36 · 2020: 26 · 2019: 35 · 2018: 27 · 2017: 16 · 2016: 39 · 2015: 31 · 2014: 28 · 2013: 16 · 2012: 11
- FWCI
- 28.55
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- IEEE Control Systems (publishedVersion)
- TU/e Research Portal (publishedVersion)
- TU/e Research Portal (submittedVersion)
- Topics
- Physical Sciences › Engineering › Control and Systems Engineering › Piezoelectric Actuators and Control
- Physical Sciences › Engineering › Mechanical Engineering › Advanced Measurement and Metrology Techniques
- Physical Sciences › Engineering › Mechanical Engineering › Control Systems in Engineering
- Keywords
- position control, positioning accuracy, photolithography
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