The DOI matches its Crossref record; 3 of the 3 references it cites were found in a registry or an index.
Roller nanoimprint lithography
Abstract
An alternative approach to flat nanoimprint lithography (NIL)—roller nanoimprint lithography (RNIL) is demonstrated. Compared with flat NIL, RNIL has the advantage of better uniformity, less force, and the ability to repeat a mask continuously on a large substrate. Two methods for RNIL are developed: (a) rolling a cylinder mold on a flat, solid substrate; (b) putting a flat mold directly on a substrate and rolling a smooth roller on top of the mold. Using our current roller nanoimprint system, sub-100 nm resolution pattern transfer has been achieved.
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Citations
Cites
Imprint of sub-25 nm vias and trenches in polymers
Chou, S. Y., Krauss, P. R., & Renstrom, P. J. (1995) · Applied Physics Letters · doi:10.1063/1.114851 · Cited by 2,706
Self-citationImprint Lithography with 25-Nanometer Resolution
Chou, S. Y., Krauss, P. R., & Renstrom, P. J. (1996) · Science · doi:10.1126/science.272.5258.85 · Cited by 2,277
Self-citationChou, S. Y., Krauss, P. R., & Renstrom, P. J. (1996) · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena · doi:10.1116/1.588605 · Cited by 1,729
Self-citation
Cited by
Biradar, M. R., Sagdic, G., Yuan, C., Marui, R., & Ober, C. K. (2026) · Chemical Reviews · doi:10.1021/acs.chemrev.5c01043 · Cited by 6
Metadata
- Authors
- Tan, H., Gilbertson, A., & Chou, S. Y.
- Venue
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Publisher
- American Vacuum Society
- Published
- 1998-11-01
- Volume
- 16
- Issue
- 6
- Pages
- 3926-3928
- ISSN
- 1071-1023 (ISSN-L)
- 1520-8567
- OpenAlex
- W1996389496
- Cited by
- 317
- References
- 3
- FWCI
- 2.53
- Type
- journal article
- Language
- en
- Open access
- closed
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- Tan, H., Gilbertson, A., & Chou, S. Y. (1998). Roller nanoimprint lithography. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena. https://doi.org/10.1116/1.590438
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