The DOI matches its Crossref record.
Imprint Lithography with 25-Nanometer Resolution
Abstract
A high-throughput lithographic method with 25-nanometer resolution and smooth vertical sidewalls is proposed and demonstrated. The technique uses compression molding to create a thickness contrast pattern in a thin resist film carried on a substrate, followed by anisotropic etching to transfer the pattern through the entire resist thickness. Metal patterns with a feature size of 25 nanometers and a period of 70 nanometers were fabricated with the use of resist templates created by imprint lithography in combination with a lift-off process. With further development, imprint lithography should allow fabrication of sub-10-nanometer structures and may become a commercially viable technique for manufacturing integrated circuits and other nanodevices.
Overview
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Integrity signals
Registry
Cites
Statistics
Verification
Claims the paper makes
The claims and statistics of this paper haven’t been checked yet.
Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.
Self-check
Percentages, sums and reported differences re-computed from the paper’s own numbers.
The self-check needs the paper’s full text.
Citations
Cited by
Recent advances in shape memory polymers and composites: a review
Ratna, D., & Karger-Kocsis, J. (2008) · Journal of Materials Science · doi:10.1007/s10853-007-2176-7 · Cited by 942
Memristor−CMOS Hybrid Integrated Circuits for Reconfigurable Logic
Xia, Q., Robinett, W., Cumbie, M. W., Banerjee, N., Cardinali, T. J., Yang, J. J., Wu, W., Li, X., Tong, W. M., Strukov, D. B., et al. (2009) · Nano Letters · doi:10.1021/nl901874j · Cited by 671
Roller nanoimprint lithography
Tan, H., Gilbertson, A., & Chou, S. Y. (1998) · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena · doi:10.1116/1.590438 · Cited by 317
Self-citationHigh‐Resolution Soft Lithography: Enabling Materials for Nanotechnologies
Rolland, J. P., Hagberg, E. C., Denison, G. M., Carter, K. R., & De Simone, J. M. (2004) · Angewandte Chemie International Edition · doi:10.1002/anie.200461122 · Cited by 292
Ultrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters
Zeng, B., Gao, Y., & Bartoli, F. J. (2013) · Scientific Reports · doi:10.1038/srep02840 · Cited by 291
Metadata
- Authors
- Chou, S. Y., Krauss, P. R., & Renstrom, P. J.
- Venue
- Science
- Published
- 1996-04-05
- Volume
- 272
- Issue
- 5258
- Pages
- 85-87
- ISSN
- 0036-8075 (ISSN-L)
- 1095-9203
- OpenAlex
- W2062047511
- Cited by
- 2,277
- References
- 0
- FWCI
- 32.08
- Type
- journal article
- Language
- en
- Open access
- closed
About these checks
Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.
Statistics and arithmetic are recomputed, not judged.
Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.
What counts as a claim ›How we measure confidence ›How we check this ›
Are you an author, or do you see a problem with this page? Request a review
How to cite
Cite CoChat for the checks on this page, and the paper for its own findings.
- This page
- CoChat. (2026). Citation check: Imprint Lithography with 25-Nanometer Resolution. https://app.cochat.ai/papers/10.1126/science.272.5258.85
- The paper
- Chou, S. Y., Krauss, P. R., & Renstrom, P. J. (1996). Imprint Lithography with 25-Nanometer Resolution. Science. https://doi.org/10.1126/science.272.5258.85
Data sources
Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
