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Nanoimprint lithography
Abstract
Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated further. Nanoimprint lithography has demonstrated 25 nm feature size, 70 nm pitch, vertical and smooth sidewalls, and nearly 90° corners. Further experimental study indicates that the ultimate resolution of nanoimprint lithography could be sub-10 nm, the imprint process is repeatable, and the mold is durable. In addition, uniformity over a 15 mm by 18 mm area was demonstrated and the uniformity area can be much larger if a better designed press is used. Nanoimprint lithography over a nonflat surface has also been achieved. Finally, nanoimprint lithography has been successfully used for fabricating nanoscale photodetectors, silicon quantum-dot, quantum-wire, and ring transistors.
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Citations
Cited by
Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up
Cheng, J. Y., Ross, C. A., Smith, H. I., & Thomas, E. L. (2006) · Advanced Materials · doi:10.1002/adma.200502651 · Cited by 695
Roller nanoimprint lithography
Tan, H., Gilbertson, A., & Chou, S. Y. (1998) · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena · doi:10.1116/1.590438 · Cited by 317
Self-citationHigh‐Resolution Soft Lithography: Enabling Materials for Nanotechnologies
Rolland, J. P., Hagberg, E. C., Denison, G. M., Carter, K. R., & De Simone, J. M. (2004) · Angewandte Chemie International Edition · doi:10.1002/anie.200461122 · Cited by 292
Extreme ultraviolet lithography reaches 5 nm resolution
Giannopoulos, I., Mochi, I., Vockenhuber, M., Ekinci, Y., & Kazazis, D. (2024) · Nanoscale · doi:10.1039/d4nr01332h · Cited by 69
A review of nanoimprint lithography for high-volume semiconductor device manufacturing
Resnick, D. J., & Choi, J. (2017) · Advanced Optical Technologies · doi:10.1515/aot-2017-0020 · Cited by 17
Metadata
- Authors
- Chou, S. Y., Krauss, P. R., & Renstrom, P. J.
- Venue
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Publisher
- American Vacuum Society
- Published
- 1996-11-01
- Volume
- 14
- Issue
- 6
- Pages
- 4129-4133
- ISSN
- 1071-1023 (ISSN-L)
- 1520-8567
- OpenAlex
- W4234109392
- Cited by
- 1,729
- References
- 0
- FWCI
- 7.31
- Type
- journal article
- Language
- en
- Open access
- closed
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- Chou, S. Y., Krauss, P. R., & Renstrom, P. J. (1996). Nanoimprint lithography. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena. https://doi.org/10.1116/1.588605
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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