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The DOI matches its Crossref record; 2 of the 2 references it cites were found in a registry or an index.

Scaling carbon nanotube complementary transistors to 5-nm gate lengths

Qiu, Chenguang, Zhang, Zhiyong, Xiao, Mengmeng, Yang, Yingjun, Zhong, Donglai, Peng, Lian-Mao·2017·Science

Abstract

Moving transistors downscale: One option for extending the performance of complementary metal-oxide semiconductor (CMOS) devices based on silicon technology is to use semiconducting carbon nanotubes as the gates. Qiu et al. fabricated top-gated carbon nanotube field-effect transistors with a gate length of 5 nm. Thin graphene contacts helped maintain electrostatic control. A scaling trend study revealed that, compared with silicon CMOS devices, the nanotube-based devices operated much faster and at much lower supply voltage, and they approached the limit of one electron per switching operation. Science , this issue p. 271

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Metadata

Authors
Qiu, C., Zhang, Z., Xiao, M., Yang, Y., Zhong, D., & Peng, L.-M.
Venue
Science
Published
2017-01-20
Volume
355
Issue
6322
Pages
271-276
ISSN
  • 0036-8075 (ISSN-L)
  • 1095-9203
OpenAlex
W2574149780
Cited by
739
References
2
FWCI
32.56
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Scaling carbon nanotube complementary transistors to 5-nm gate lengths. https://app.cochat.ai/papers/10.1126/science.aaj1628
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Qiu, C., Zhang, Z., Xiao, M., Yang, Y., Zhong, D., & Peng, L.-M. (2017). Scaling carbon nanotube complementary transistors to 5-nm gate lengths. Science. https://doi.org/10.1126/science.aaj1628

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.