Preparation of Multi-Layered Tungsten-Carbon Films by Ion-Beam Sputtering
Abstract
Description de la methode. Observation par microscopie electronique en transmission de la microstructure des couches obtenues
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Cites
Thornton, J. A. (1974) · Journal of Vacuum Science and Technology · doi:10.1116/1.1312732 · Cited by 2,429 · see citing works
UNDERWOOD, J. H., & Barbee, T. W. (1981) · Applied Optics · doi:10.1364/ao.20.003027 · Cited by 373 · see citing works
Microstructure and properties of rf-sputtered amorphous hydrogenated silicon films
Ross, R. C., & Messier, R. F. (1981) · Journal of Applied Physics · doi:10.1063/1.329391 · Cited by 114 · see citing works
Smooth multilayer films suitable for x-ray mirrors
Haelbich, R. ‐., Segmüller, A., & Spiller, E. A. (1979) · Applied Physics Letters · doi:10.1063/1.90743 · Cited by 92 · see citing works
Geometrical factors of argon incorporation in SiO2 films deposited by ion beam sputtering
Motohiro, T., & Taga, Y. (1984) · Thin Solid Films · doi:10.1016/0040-6090(84)90245-1 · Cited by 21 · see citing works
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Extreme ultraviolet lithography
Kazazis, D., Santaclara, J. G., van Schoot, J., Mochi, I., & Ekinci, Y. (2024) · Nature Reviews Methods Primers · doi:10.1038/s43586-024-00361-z · Cited by 149 · see citing works
History of extreme ultraviolet lithography
Kinoshita, H. (2005) · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena · doi:10.1116/1.2127950 · Cited by 25 · see citing works
- Authors
- Takei, K., & Maeda, Y.
- Affiliations
- NTT (Japan) (JP)
- ORCID
- Maeda, Yasushi
- Venue
- Japanese Journal of Applied Physics
- Publisher
- IOP Publishing
- Published
- 1985-10-01
- Volume
- 24
- Issue
- 10R
- Pages
- 1366
- ISSN
- 0021-4922 (ISSN-L)
- 1347-4065
- OpenAlex
- W2016570944
- Cited by
- 9
- References
- 5
- Citations by year
- 2024: 1
- FWCI
- 2.36
- Type
- journal article
- Language
- en
- Open access
- closed
- Licence
- Locations
- Japanese Journal of Applied Physics (publishedVersion)
- Topics
- Physical Sciences › Engineering › Mechanics of Materials › Metal and Thin Film Mechanics
- Physical Sciences › Engineering › Computational Mechanics › Ion-surface interactions and analysis
- Physical Sciences › Materials Science › Materials Chemistry › Advanced Materials and Semiconductor Technologies
- Keywords
- multilayer films, ion beam sputtering, thin film deposition, film microstructure, transmission electron microscopy
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