The DOI matches its Crossref record; 13 of the 13 references it cites were found in a registry or an index.
Amorphous Oxide Semiconductors for High-Performance Flexible Thin-Film Transistors
Open accessAbstract
Recently, we have demonstrated the potential of amorphous oxide semiconductors (AOSs) for developing flexible thin-film transistors (TFTs). A material exploration of AOSs desired as the channel layer in TFTs is most important for developing high-performance devices. Here, we report our concept of material exploration for AOSs in high-performance flexible and transparent TFTs from the viewpoints of chemical bonding and electronic structure in oxide semiconductors. We find that amorphous In–Ga–Zn–O (a-IGZO) exhibits good carrier transport properties such as reasonably high Hall mobilities (>10 cm 2 ·V -1 ·s -1 ) and a good controllability of carrier concentration from <10 15 to 10 20 cm -3 . In addition, a-IGZO films have better chemical stabilities in ambient atmosphere and at temperatures up to 500 °C. The flexible and transparent TFT fabricated using a-IGZO channel layer at room temperature operated with excellent performances, such as normally-off characteristics, on/off current ratios (∼10 6 ) and field-effect mobilities (∼10 cm 2 ·V -1 ·s -1 ), which are higher by an order of magnitude than those of amorphous Si:H and organics TFTs.
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Cites
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Inorganic Semiconductors for Flexible Electronics
Sun, Y., & Rogers, J. A. (2007) · Advanced Materials · doi:10.1002/adma.200602223 · Cited by 874
Jeong, S., Ha, Y., Moon, J., Facchetti, A., & Marks, T. J. (2010) · Advanced Materials · doi:10.1002/adma.200902450 · Cited by 548
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From softening polymers to multimaterial based bioelectronic devices
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Metadata
- Authors
- Nomura, K., Takagi, A., Kamiya, T., Ohta, H., Hirano, M., & Hosono, H.
- Venue
- Japanese Journal of Applied Physics
- Publisher
- IOP Publishing
- Published
- 2006-05-01
- Volume
- 45
- Issue
- 5S
- Pages
- 4303
- ISSN
- 0021-4922 (ISSN-L)
- 1347-4065
- OpenAlex
- W2030195401
- Cited by
- 758
- References
- 13
- FWCI
- 24.63
- Type
- journal article
- Language
- en
- Open access
- bronze
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- Nomura, K., Takagi, A., Kamiya, T., Ohta, H., Hirano, M., & Hosono, H. (2006). Amorphous Oxide Semiconductors for High-Performance Flexible Thin-Film Transistors. Japanese Journal of Applied Physics. https://doi.org/10.1143/jjap.45.4303
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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