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Cited by 758

The DOI matches its Crossref record; 13 of the 13 references it cites were found in a registry or an index.

Amorphous Oxide Semiconductors for High-Performance Flexible Thin-Film Transistors

Open access
Nomura, Kenji, Takagi, Akihiro, Kamiya, Toshio, Ohta, Hiromichi, Hirano, Masahiro, Hosono, Hideo·2006·Japanese Journal of Applied Physics

Abstract

Recently, we have demonstrated the potential of amorphous oxide semiconductors (AOSs) for developing flexible thin-film transistors (TFTs). A material exploration of AOSs desired as the channel layer in TFTs is most important for developing high-performance devices. Here, we report our concept of material exploration for AOSs in high-performance flexible and transparent TFTs from the viewpoints of chemical bonding and electronic structure in oxide semiconductors. We find that amorphous In–Ga–Zn–O (a-IGZO) exhibits good carrier transport properties such as reasonably high Hall mobilities (>10 cm 2 ·V -1 ·s -1 ) and a good controllability of carrier concentration from <10 15 to 10 20 cm -3 . In addition, a-IGZO films have better chemical stabilities in ambient atmosphere and at temperatures up to 500 °C. The flexible and transparent TFT fabricated using a-IGZO channel layer at room temperature operated with excellent performances, such as normally-off characteristics, on/off current ratios (∼10 6 ) and field-effect mobilities (∼10 cm 2 ·V -1 ·s -1 ), which are higher by an order of magnitude than those of amorphous Si:H and organics TFTs.

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Metadata

Authors
Nomura, K., Takagi, A., Kamiya, T., Ohta, H., Hirano, M., & Hosono, H.
Venue
Japanese Journal of Applied Physics
Published
2006-05-01
Volume
45
Issue
5S
Pages
4303
ISSN
  • 0021-4922 (ISSN-L)
  • 1347-4065
OpenAlex
W2030195401
Cited by
758
References
13
FWCI
24.63
Type
journal article
Language
en
Open access
bronze

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CoChat. (2026). Citation check: Amorphous Oxide Semiconductors for High-Performance Flexible Thin-Film Transistors. https://app.cochat.ai/papers/10.1143/jjap.45.4303
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Nomura, K., Takagi, A., Kamiya, T., Ohta, H., Hirano, M., & Hosono, H. (2006). Amorphous Oxide Semiconductors for High-Performance Flexible Thin-Film Transistors. Japanese Journal of Applied Physics. https://doi.org/10.1143/jjap.45.4303

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